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Single atom Si nanoelectronics using controlled single-ion implantation
M. Mitic, S.E. Andresen, C. Yang, T. Hopf, V. Chan, E. Gauja, F.E. Hudson, T.M. Buehler, R. Brenner, A.J. Ferguson, C.I. Pakes, S.M. Hearne, G. Tamanyan, D.J. Reilly, A.R. Hamilton, D.N. Jamieson, A.SVolume:
78-79
Year:
2005
Language:
english
Pages:
8
DOI:
10.1016/j.mee.2004.12.096
File:
PDF, 555 KB
english, 2005