Utilizing self-assembled multilayers in lithographic...

Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogaps

M.E. Anderson, Charan Srinivasan, Raviprakesh Jayaraman, P.S. Weiss, M.W. Horn
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Volume:
78-79
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2005.01.003
File:
PDF, 190 KB
english, 2005
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