Low temperature crystallized Ta2O5/Nb2O5 bi-layers...

Microelectronic Engineering 2005 Vol. 80; Iss. none

Low temperature crystallized Ta2O5/Nb2O5 bi-layers integrated into RIR capacitor for 60 nm generation and beyond

Kyuho Cho, Jinil Lee, Jae-Soon Lim, Hanjin Lim, Junghyun Lee, Sungho Park, Cha-Young Yoo, Sung-Tae Kim, U-In Chung, Joo-Tae Moon
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Volume:
80
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2005.04.032
File:
PDF, 350 KB
english, 2005
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