Study of plasma mechanisms of hybrid a-SiOC:H low-k film deposition from decamethylcyclopentasiloxane and cyclohexene oxide
A. Castex, L. Favennec, V. Jousseaume, J. Bruat, J. Deval, B. Remiat, G. Passemard, M. PonsVolume:
82
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2005.07.025
File:
PDF, 150 KB
english, 2005