An efficient wet-cleaning of SiGe virtual substrates and of thick, pure Ge layers on Si(0 0 1) after a chemical mechanical planarization step
A. Abbadie, J.M. Hartmann, C. Di Nardo, T. Billon, Y. Campidelli, P. BessonVolume:
83
Year:
2006
Language:
english
Pages:
8
DOI:
10.1016/j.mee.2006.02.018
File:
PDF, 313 KB
english, 2006