Characterization of various insulators for possible use as low-k dielectrics deposited at temperatures below 200 °C
M. Vasilopoulou, A.M. Douvas, D. Kouvatsos, P. Argitis, D. DavazoglouVolume:
45
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.microrel.2004.11.009
File:
PDF, 194 KB
english, 2005