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Si nanocrystals by ultra-low energy ion implantation for non-volatile memory applications
H. Coffin, C. Bonafos, S. Schamm, M. Carrada, N. Cherkashin, G. Ben Assayag, P. Dimitrakis, P. Normand, M. Respaud, A. ClaverieVolume:
124-125
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mseb.2005.08.129
File:
PDF, 165 KB
english, 2005