Solid-phase epitaxy of amorphous silicon films by in situ...

Solid-State Electronics 2011 Vol. 60; Iss. 1

Solid-phase epitaxy of amorphous silicon films by in situ postannealing using RPCVD

Oliver Skibitzki, Yuji Yamamoto, Markus Andreas Schubert, Günter Weidner, Bernd Tillack
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Volume:
60
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.sse.2011.01.026
File:
PDF, 1.00 MB
english, 2011
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