![](/img/cover-not-exists.png)
Impact of seed layer on material quality of epitaxial germanium on silicon deposited by low pressure chemical vapor deposition
Oluwamuyiwa O. Olubuyide, David T. Danielson, Lionel C. Kimerling, Judy L. HoytVolume:
508
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2005.06.120
File:
PDF, 1.63 MB
english, 2006