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Interdiffusion at Si/SiGe interface analyzed by high-resolution X-ray diffraction
Shuqi Zheng, M. Kawashima, M. Mori, T. Tambo, C. TatsuyamaVolume:
508
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.08.416
File:
PDF, 528 KB
english, 2006