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Estimation of defect generation probability in thin Si surface damaged layer during plasma processing
Koji Eriguchi, Akira Ohno, Daisuke Hamada, Masayuki Kamei, Kouichi OnoVolume:
516
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2007.11.035
File:
PDF, 335 KB
english, 2008