Full-chip leakage analysis for 65 nm CMOS...

Integration, the VLSI Journal 2010 Vol. 43; Iss. 4

Full-chip leakage analysis for 65 nm CMOS technology and beyond

Jiying Xue, Tao Li, Yangdong Deng, Zhiping Yu
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Volume:
43
Year:
2010
Language:
english
Pages:
12
DOI:
10.1016/j.vlsi.2010.05.002
File:
PDF, 1.16 MB
english, 2010
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