Heat transport in masks for deep X-ray lithography during...

Microelectronics Journal 1997 Vol. 28; Iss. 3

Heat transport in masks for deep X-ray lithography during the irradiation process

M. Neumann, F.J. Pantenburg, M. Rohde, M. Sesterhenn
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Volume:
28
Year:
1997
Language:
english
Pages:
7
DOI:
10.1016/s0026-2692(96)00038-9
File:
PDF, 610 KB
english, 1997
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