Long term noise measurements and median time to failure...

Microelectronics Reliability 1999 Vol. 39; Iss. 11

Long term noise measurements and median time to failure test for the characterization of electromigration in metal lines

C. Ciofi, V. Dattilo, B. Neri, S. Foley, A. Mathewson
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
39
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0026-2714(99)00174-2
File:
PDF, 153 KB
english, 1999
Conversion to is in progress
Conversion to is failed