Control of Cl2 plasma by electron-beam-excited plasma and...

Vacuum 1998 Vol. 51; Iss. 4

Control of Cl2 plasma by electron-beam-excited plasma and poly-Si etching

Yasuhiro Mikawa, Ryu-ichi Miyano, Jun-ichi Inaguma, Yasunori Shiraki, Futoshi Mutsuga, Motoyuki Fujii, Shunjiro Ikezawa
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Volume:
51
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0042-207x(98)00248-6
File:
PDF, 629 KB
english, 1998
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