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Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography
A.C. Cefalas, E. Sarantopoulou, E. Gogolides, P. ArgitisVolume:
53
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(00)00278-1
File:
PDF, 288 KB
english, 2000