Monte Carlo study of high performance resists for SCALPEL nanolithography
L.E. Ocola, W-Y. Li, R.J. Kasica, M.I. Blakey, P.A. Orphanos, W.K. Waskiewicz, A.E. Novembre, M. SatoVolume:
53
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(00)00350-6
File:
PDF, 912 KB
english, 2000