Monte Carlo study of high performance resists for SCALPEL...

Monte Carlo study of high performance resists for SCALPEL nanolithography

L.E. Ocola, W-Y. Li, R.J. Kasica, M.I. Blakey, P.A. Orphanos, W.K. Waskiewicz, A.E. Novembre, M. Sato
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Volume:
53
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(00)00350-6
File:
PDF, 912 KB
english, 2000
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