Investigations of the interface stability in HfO2–metal...

Microelectronic Engineering 2003 Vol. 70; Iss. 2-4

Investigations of the interface stability in HfO2–metal electrodes

F. Fillot, B. Chenevier, S. Maı&amp, #x0302, trejean, M. Audier, P. Chaudouët, B. Bochu, J.P. Sénateur, A. Pisch, T. Mourier, H. Monchoix, B. Guillaumot, G. Passemard
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Volume:
70
Year:
2003
Language:
english
Pages:
8
DOI:
10.1016/s0167-9317(03)00428-3
File:
PDF, 1000 KB
english, 2003
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