Volume 32; Issue 1-4

Microelectronic Engineering

Volume 32; Issue 1-4
1

The nanoworld: chances and challenges

H. Rohrer
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 2.02 MB
english, 1996
2

Pattern transfer: Self-assembled monolayers as ultrathin resists

Younan Xia, Xiao-Mei Zhao, George M. Whitesides
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 3.43 MB
english, 1996
3

Dry etching and induced damage

E. van der Drift, R. Cheung, T. Zijlstra
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 1.13 MB
english, 1996
4

Surface modification in the optical near field

G. Krausch, J. Mlynek
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 1.14 MB
english, 1996
5

Diffraction optics for X-ray imaging

G. Schmahl, D. Rudolph, G. Schneider, J. Thieme, T. Schliebe, B. Kaulich, M. Hettwer
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 7.31 MB
english, 1996
7

Single-electron devices

Haroon Ahmed, Kazuo Nakazato
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 2.14 MB
english, 1996
9

Downscaling ULSIs by using nanoscale engineering

Shojiro Asai, Yasuo Wada, Eiji Takeda
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 8.52 MB
english, 1996
12

III–V Nanoelectronics

Steven P. Beaumont
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 1.44 MB
english, 1996
13

Electron beam lithography—Resolution limits

A.N. Broers, A.C.F. Hoole, J.M. Ryan
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 2.62 MB
english, 1996
14

Binary optics: A VLSI-based microoptics technology

Margaret B. Stern
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 4.52 MB
english, 1996
15

Quantum wires and dots for optical studies

A. Forchel, P. Ils, K.H. Wang, O. Schilling, R. Steffen, J. Oshinowo
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 2.69 MB
english, 1996
16

Scanning probe microscopy for nanometer inspections and industrial applications

W. Gutmannsbauer, H.J. Hug, E. Meyer
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 8.17 MB
english, 1996
17

Extraction, deposition, and displacement of atoms by STM

T. Nakayama, D.-H. Huang, M. Aono
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 3.25 MB
english, 1996
18

Potential nanoelectronic integrated circuit technologies

John Randall, Gary Frazier, Alan Seabaugh, Tom Broekaert
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 3.24 MB
english, 1996
19

Nanofabrication by FIB

Kenji Gamo
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 4.32 MB
english, 1996
20

Nanosensors and molecular recognition

Wolfgang Göpel
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 6.73 MB
english, 1996
21

Proximal probe lithography and surface modification

C.R.K. Marrian, E.S. Snow
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 4.16 MB
english, 1996
22

SCREAM MicroElectroMechanical Systems

Noel C. MacDonald
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 6.68 MB
english, 1996
23

Scaling silicon MOS devices to their limits

S.J. Wind, D.J. Frank, H.-S. Wong
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 2.76 MB
english, 1996
25

Editorial Board

Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 69 KB
english, 1996
26

Preface

Peter Vettiger, Urs Staufer, Dieter P. Kern
Journal:
Microelectronic Engineering
Year:
1996
Language:
english
File:
PDF, 142 KB
english, 1996