Volume 5; Issue 1-4

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Microelectronic Engineering
Volume 5; Issue 1-4

Microelectronic Engineering

Volume 5; Issue 1-4

1

Editorial Board

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 59 KB

english, 1986

2

Preface

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 38 KB

english, 1986

3

X-ray lithography

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 2.79 MB

english, 1986

4

Stability of SiC-masks for high resolution synchrotron X-ray lithography

H. Lüthje, U. Mackens, U. Mescheder, B. Mathhieβen

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 42 KB

english, 1986

5

Silicon X-ray masks: Pattern placement and overlay accuracy

H. Betz, H.-L. Huber, S. Pongratz, W. Rohrmoser, W. Windbracke, U. Mescheder

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 323 KB

english, 1986

6

Ion-implant compensation of tensile stress in Tungsten absorber for low distortion X-ray masks

I. Plotnik, M.E. Porter, M. Toth, S. Akhtar, Henry I. Smith

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 323 KB

english, 1986

7

Influence of thin film thickness variations on pattern fidelity of X-ray masks

W.H. Brünger, H. Betz, A. Heuberger, J. Hersener

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 141 KB

english, 1986

8

Determination of the average stress and its adjustment in thin silicon membranes used in various lithographies

B.A. Anderer, U.F.W. Behringer

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 168 KB

english, 1986

9

Highly-sensitive novolak-based positive X-ray resist

K.-F. Dössel, H.L. Huber, H. Oertel

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 389 KB

english, 1986

10

A MOSFET, manufactured with synchrotron X-ray lithography

J. Hersener, G. Lässing

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 534 KB

english, 1986

11

Electron beam / optical mixed lithography at half-micron ground rules

P. Coane, P. Rudeck, L.K. Wang, F. Hohn

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 413 KB

english, 1986

12

Progress on the Delft ion beam pattern generator

H.N. Slingerland, J.H. Bohlander, K.D. v.d. Mast, E. Koets

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 507 KB

english, 1986

13

Maskless ion beam assisted deposition of W and Ta films

Kenji Gamo, Daisuke Takehara, Yutaka Hamamura, Mitsuo Tomita, Susumu Namba

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 287 KB

english, 1986

14

Metallurgy and microfabrication applications of gold-silicon-beryllium liquid-metal field-ion sources

D.F. Reich, D.J. Fray, A.F. Evason, J.R.A. Cleaver, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 484 KB

english, 1986

15

Simulation of graded-base bipolar transistor characteristics fabricated with a focused ion beam

A.J. Steckl, C.-M. Lin, S.-D. Chu, J.C. Corelli

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 410 KB

english, 1986

16

Ion projection lithography in (in)organic resist layers

R. Fischer, E. Hammel, H. Löschner, G. Stengl, P. Wolf, H. Kraus, G. Stangl

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 416 KB

english, 1986

17

Quantum transport in microstructures

Daniel E. Prober

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 748 KB

english, 1986

18

Submicron MOS devices

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 1.05 MB

english, 1986

19

Synchrotron lithography for sub-half-micron T-Gates in GAAS-FET

K.H. Mueller, Th. Stelter, F. Ponse, H. Weidlich

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 457 KB

english, 1986

20

Nonometer-scale lithography for Aharonov-Bohm magnetoconductance oscillation studies

E. van der Drift, K. Kerkhof, J. Romijn, T.M. Klapwijk

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 602 KB

english, 1986

21

Direct fabrication of nanometre-scale structures in semiconductors with 500 keV lithography

G.A.C. Jones, S. Blythe, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 535 KB

english, 1986

22

Application of titanium RIE to the fabrication of nm-scale structures

P. Unger, V. Bögli, H. Beneking

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 869 KB

english, 1986

23

Fabrication of low-capacitance Josephson-junctions

A.J.G. Schellingerhout, C.A.v.d. Jeugd, J. Romijn, J.E. Mooij

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 87 KB

english, 1986

24

Effects of silylation parameters on the lithographic performance of the desire system

F. Coopmans, B. Roland, R. Lombaerts

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 282 KB

english, 1986

25

Diazopolysiloxanes: Unique imageable barrier layers

E. Babich, J. Shaw, M. Hatzakis, J. Paraszczak, D. Witman, B.J. Grenon

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 647 KB

english, 1986

26

Commercial dyes for novolak based multilayer systems

P. Paniez, G. Amblard

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 345 KB

english, 1986

27

Fabrication of thin-film warm carrier infrared laser detectors using nitrocellulose self-developing resist

Y. Yasuoka, K. Harakawa, K. Gamo, S. Namba

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 333 KB

english, 1986

28

Characterization of UV hardening process

E.B. Vázsonyi, S. Holly, Z. Vértesy

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 552 KB

english, 1986

29

Ion energy and anisotropy in microwave plasma etching of polymers

J.E. Heidenreich, J.R. Paraszczak, M. Moisan, G. Sauve

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 559 KB

english, 1986

30

Mechanism of microwave plasma etching of polyimides in O2 and CF4 gas mixtures

N.J. Chou, J. Parazsczak, E. Babich, Y.S. Chaug, R. Goldblatt

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 494 KB

english, 1986

31

Periodic Si-hole-masks in the μm and sub-μm range for electron-multibeamwriting

J. Olschimke, H. Koops, T. Tschudi

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 494 KB

english, 1986

32

Advantages of using Spin-On-Glass layer in interconnection dielectric planarization

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 528 KB

english, 1986

33

Electron beam decomposition of carbonyls on silicon

Volker Scheuer, Hans Koops, Theo Tschudi

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 311 KB

english, 1986

34

Laser-induced chemical processing at interfaces

Dieter Bäuerle

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 27 KB

english, 1986

35

Electronic materials surface processing with excimer lasers

David J. Elliott, Bernhard P. Piwczyk

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 490 KB

english, 1986

36

Excimer lasers as deep UV sources for photolithographic system

F Goodall, RA Lawes, PH Sharp

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 1023 KB

english, 1986

37

Silicon Micro Mechanics (SIMM): Si-beams with rectangular cross-section for atomic force sensing by means of STM

O. Wolter, J. Greschner, U. Dürig

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 26 KB

english, 1986

38

Simulation of focused ion beam milling

K.P. Müller, U. Weigmann, H. Burghause

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 355 KB

english, 1986

39

Scanning tunneling microscopy

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 547 KB

english, 1986

40

Scanning thermal profiler

C.C. Williams, H.K. Wickramasinghe

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 224 KB

english, 1986

41

A high frequency logic-state tracing method

H.-D. Brust, F. Fox

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 504 KB

english, 1986

42

A dynamic real time 3-D measurement technique for IC inspection

B.C. Breton, J.T.L. Thong, W.C. Nixon

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 320 KB

english, 1986

43

Fully-automated optical inspection for VLSI production

H. Ehm, R. Laubmeier

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 550 KB

english, 1986

44

Extension of the M.A.L.T. concept to thick layers with emphasis on focusing conditions

M.E. Guillaume, N. Alcouffe-Noailly, J.L. Buevoz

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 343 KB

english, 1986

45

Confocal laser microscope for submicron structure measurement

Th. Zapf, R.W. Wijnaendts-van-Resandt

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 493 KB

english, 1986

46

Recent developments in X-ray lithography systems

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 26 KB

english, 1986

47

Author index volume 5 (1986)

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 274 KB

english, 1986

48

Contents

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 155 KB

english, 1986

49

Crirical dimension control in X-ray masks with electroplated gold absorbers

W. Windbracke, H. Betz, H.-L. Huber, W. Pilz, S. Pongratz

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 759 KB

english, 1986

50

Simple method for the defect control in X-ray mask fabrication

A. Kluwe, K.-H. Müller

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 352 KB

english, 1986

51

Automatic mask alignment for X-ray microlithography

Günter Doemens, H. Eigenstetter, P. Mengel

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 545 KB

english, 1986

52

A flexible beamshaper

K.D. van der Mast, F.J. Pijper, J.E. Barth

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 409 KB

english, 1986

53

Electron optical column for high speed nanometric lithography

N. Saitou, S. Hosoki, M. Okumura, T. Matsuzaka, G. Matsuoka, M. Ohyama

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 717 KB

english, 1986

54

Determination of the proximity parameters in electron beam lithography using doughnut-structures

L. Stevens, R. Jonckheere, E. Froyen, S. Decoutere, D. Lanneer

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 367 KB

english, 1986

55

The study of the electron-electron interaction in electron gun

Wu yajun, Wei maoxin

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 57 KB

english, 1986

56

Mask and circuit repair applications of focused ion beam deposition

D.C. Shaver, L.A. Stern, N.P. Economou

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 29 KB

english, 1986

57

Ultrasmall device fabrication using dry etching of gaas

Stephen Thoms, Steven P Beaumont, Chris DW Wilkinson, Jonathon Frost, Colin R Stanley

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 357 KB

english, 1986

58

Fabrication of grating gates for lateral surface superlattice devices using E-beam lithography

J. Caro, E.W.J.M. van der Drift, K.L. Hagemans, S. Radelaar

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 306 KB

english, 1986

59

Poly-4-bromostyrene, a high performance negative electron resist

F. Schué, B. Holil, R. Sagnes, C. Montginoul, L. Giral, F. Buiguez, B. Serre, Ch. Rosilio

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 239 KB

english, 1986

60

Investigation of structure profiles in negative resists

V.V. Aristov, T.B. Borsenko, V.A. Kudryashov, A.A. Svintsov

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 432 KB

english, 1986

61

Radiation damage in dry etching

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 498 KB

english, 1986

62

Secondary effects of single crystalline silicon deep- trench etching in a chlorine-containing plasma for 3- dimensional capacitor cells

I.W. Rangelow, P. Thoren, K. Maβeli, R. Kassing, M. Engelhardt, S. Schwarzl

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 666 KB

english, 1986

63

High-temperature-stable Si3N4 dummy T-gate and lift-off mask

P. Buchmann, V. Graf, Th.O. Mohr, P. Vettiger

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 347 KB

english, 1986

64

Mini-trench isolation: Trench etching oxidation and refiling planarization

M. Pons, P. Delpech, A. Schiltz, A. Inard, R.A. Moore

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 77 KB

english, 1986

65

ArF laser induced lift-off process

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 406 KB

english, 1986

66

Micromachining of polyimide films with focused ion beams

A.J. Steckl, S. Balakrishnan, H.-S. Jin, J.C. Corelli

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 104 KB

english, 1986

67

Mask making for synchrotron radiation lithography

W. Ehrfeld, W. Glashauser, D. Münchmeyer, W. Schelb

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 359 KB

english, 1986

68

The potential of mechanical microlithography for submicron patterning

J. Gobrecht, J.B. Pethica

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 301 KB

english, 1986

69

An image fidelity approach to measuring the point spread function in electron and ion beam lithographies

Michael E. Haslam, John F. McDonald

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 531 KB

english, 1986

70

Some aspects concerning design for e-beam testability

K.D. Herrmann, E. Kubalek

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 416 KB

english, 1986

71

E-beam testing of high-speed electronic devices

Reinhold Schmitt, Dieter Winkler, Lischke Burkhard

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 391 KB

english, 1986

72

Energy and time-resolved photoemission in a promising new approach for contactless integrated-circuit testing

H.K. Seitz, A. Blacha, R. Clauberg, H. Beha

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 259 KB

english, 1986

73

The SEM as inspection and testing tool in the IC industry

C. Tollkamp-Schierjott, J. Windsor-Martin

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 473 KB

english, 1986

74

A practical submicron lithography system using a conventional source X-ray stepper

B. Fay, J. Labrie, S. Bijawat

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 442 KB

english, 1986