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Volume 5; Issue 1-4
Main
Microelectronic Engineering
Volume 5; Issue 1-4
Microelectronic Engineering
Volume 5; Issue 1-4
1
Editorial Board
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 59 KB
Your tags:
english, 1986
2
Preface
H.W. Lehmann
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 38 KB
Your tags:
english, 1986
3
X-ray lithography
A. Heuberger
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 2.79 MB
Your tags:
english, 1986
4
Stability of SiC-masks for high resolution synchrotron X-ray lithography
H. Lüthje
,
U. Mackens
,
U. Mescheder
,
B. Mathhieβen
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 42 KB
Your tags:
english, 1986
5
Silicon X-ray masks: Pattern placement and overlay accuracy
H. Betz
,
H.-L. Huber
,
S. Pongratz
,
W. Rohrmoser
,
W. Windbracke
,
U. Mescheder
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 323 KB
Your tags:
english, 1986
6
Ion-implant compensation of tensile stress in Tungsten absorber for low distortion X-ray masks
I. Plotnik
,
M.E. Porter
,
M. Toth
,
S. Akhtar
,
Henry I. Smith
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 323 KB
Your tags:
english, 1986
7
Influence of thin film thickness variations on pattern fidelity of X-ray masks
W.H. Brünger
,
H. Betz
,
A. Heuberger
,
J. Hersener
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 141 KB
Your tags:
english, 1986
8
Determination of the average stress and its adjustment in thin silicon membranes used in various lithographies
B.A. Anderer
,
U.F.W. Behringer
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 168 KB
Your tags:
english, 1986
9
Highly-sensitive novolak-based positive X-ray resist
K.-F. Dössel
,
H.L. Huber
,
H. Oertel
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 389 KB
Your tags:
english, 1986
10
A MOSFET, manufactured with synchrotron X-ray lithography
J. Hersener
,
G. Lässing
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 534 KB
Your tags:
english, 1986
11
Electron beam / optical mixed lithography at half-micron ground rules
P. Coane
,
P. Rudeck
,
L.K. Wang
,
F. Hohn
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 413 KB
Your tags:
english, 1986
12
Progress on the Delft ion beam pattern generator
H.N. Slingerland
,
J.H. Bohlander
,
K.D. v.d. Mast
,
E. Koets
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 507 KB
Your tags:
english, 1986
13
Maskless ion beam assisted deposition of W and Ta films
Kenji Gamo
,
Daisuke Takehara
,
Yutaka Hamamura
,
Mitsuo Tomita
,
Susumu Namba
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 287 KB
Your tags:
english, 1986
14
Metallurgy and microfabrication applications of gold-silicon-beryllium liquid-metal field-ion sources
D.F. Reich
,
D.J. Fray
,
A.F. Evason
,
J.R.A. Cleaver
,
H. Ahmed
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 484 KB
Your tags:
english, 1986
15
Simulation of graded-base bipolar transistor characteristics fabricated with a focused ion beam
A.J. Steckl
,
C.-M. Lin
,
S.-D. Chu
,
J.C. Corelli
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 410 KB
Your tags:
english, 1986
16
Ion projection lithography in (in)organic resist layers
R. Fischer
,
E. Hammel
,
H. Löschner
,
G. Stengl
,
P. Wolf
,
H. Kraus
,
G. Stangl
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 416 KB
Your tags:
english, 1986
17
Quantum transport in microstructures
Daniel E. Prober
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 748 KB
Your tags:
english, 1986
18
Submicron MOS devices
W. Fichtner
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 1.05 MB
Your tags:
english, 1986
19
Synchrotron lithography for sub-half-micron T-Gates in GAAS-FET
K.H. Mueller
,
Th. Stelter
,
F. Ponse
,
H. Weidlich
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 457 KB
Your tags:
english, 1986
20
Nonometer-scale lithography for Aharonov-Bohm magnetoconductance oscillation studies
E. van der Drift
,
K. Kerkhof
,
J. Romijn
,
T.M. Klapwijk
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 602 KB
Your tags:
english, 1986
21
Direct fabrication of nanometre-scale structures in semiconductors with 500 keV lithography
G.A.C. Jones
,
S. Blythe
,
H. Ahmed
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 535 KB
Your tags:
english, 1986
22
Application of titanium RIE to the fabrication of nm-scale structures
P. Unger
,
V. Bögli
,
H. Beneking
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 869 KB
Your tags:
english, 1986
23
Fabrication of low-capacitance Josephson-junctions
A.J.G. Schellingerhout
,
C.A.v.d. Jeugd
,
J. Romijn
,
J.E. Mooij
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 87 KB
Your tags:
english, 1986
24
Effects of silylation parameters on the lithographic performance of the desire system
F. Coopmans
,
B. Roland
,
R. Lombaerts
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 282 KB
Your tags:
english, 1986
25
Diazopolysiloxanes: Unique imageable barrier layers
E. Babich
,
J. Shaw
,
M. Hatzakis
,
J. Paraszczak
,
D. Witman
,
B.J. Grenon
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 647 KB
Your tags:
english, 1986
26
Commercial dyes for novolak based multilayer systems
P. Paniez
,
G. Amblard
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 345 KB
Your tags:
english, 1986
27
Fabrication of thin-film warm carrier infrared laser detectors using nitrocellulose self-developing resist
Y. Yasuoka
,
K. Harakawa
,
K. Gamo
,
S. Namba
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 333 KB
Your tags:
english, 1986
28
Characterization of UV hardening process
E.B. Vázsonyi
,
S. Holly
,
Z. Vértesy
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 552 KB
Your tags:
english, 1986
29
Ion energy and anisotropy in microwave plasma etching of polymers
J.E. Heidenreich
,
J.R. Paraszczak
,
M. Moisan
,
G. Sauve
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 559 KB
Your tags:
english, 1986
30
Mechanism of microwave plasma etching of polyimides in O2 and CF4 gas mixtures
N.J. Chou
,
J. Parazsczak
,
E. Babich
,
Y.S. Chaug
,
R. Goldblatt
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 494 KB
Your tags:
english, 1986
31
Periodic Si-hole-masks in the μm and sub-μm range for electron-multibeamwriting
J. Olschimke
,
H. Koops
,
T. Tschudi
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 494 KB
Your tags:
english, 1986
32
Advantages of using Spin-On-Glass layer in interconnection dielectric planarization
A. Schiltz
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 528 KB
Your tags:
english, 1986
33
Electron beam decomposition of carbonyls on silicon
Volker Scheuer
,
Hans Koops
,
Theo Tschudi
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 311 KB
Your tags:
english, 1986
34
Laser-induced chemical processing at interfaces
Dieter Bäuerle
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 27 KB
Your tags:
english, 1986
35
Electronic materials surface processing with excimer lasers
David J. Elliott
,
Bernhard P. Piwczyk
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 490 KB
Your tags:
english, 1986
36
Excimer lasers as deep UV sources for photolithographic system
F Goodall
,
RA Lawes
,
PH Sharp
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 1023 KB
Your tags:
english, 1986
37
Silicon Micro Mechanics (SIMM): Si-beams with rectangular cross-section for atomic force sensing by means of STM
O. Wolter
,
J. Greschner
,
U. Dürig
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 26 KB
Your tags:
english, 1986
38
Simulation of focused ion beam milling
K.P. Müller
,
U. Weigmann
,
H. Burghause
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 355 KB
Your tags:
english, 1986
39
Scanning tunneling microscopy
H. Salemink
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 547 KB
Your tags:
english, 1986
40
Scanning thermal profiler
C.C. Williams
,
H.K. Wickramasinghe
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 224 KB
Your tags:
english, 1986
41
A high frequency logic-state tracing method
H.-D. Brust
,
F. Fox
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 504 KB
Your tags:
english, 1986
42
A dynamic real time 3-D measurement technique for IC inspection
B.C. Breton
,
J.T.L. Thong
,
W.C. Nixon
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 320 KB
Your tags:
english, 1986
43
Fully-automated optical inspection for VLSI production
H. Ehm
,
R. Laubmeier
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 550 KB
Your tags:
english, 1986
44
Extension of the M.A.L.T. concept to thick layers with emphasis on focusing conditions
M.E. Guillaume
,
N. Alcouffe-Noailly
,
J.L. Buevoz
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 343 KB
Your tags:
english, 1986
45
Confocal laser microscope for submicron structure measurement
Th. Zapf
,
R.W. Wijnaendts-van-Resandt
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 493 KB
Your tags:
english, 1986
46
Recent developments in X-ray lithography systems
C.R. Fencil
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 26 KB
Your tags:
english, 1986
47
Author index volume 5 (1986)
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 274 KB
Your tags:
english, 1986
48
Contents
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 155 KB
Your tags:
english, 1986
49
Crirical dimension control in X-ray masks with electroplated gold absorbers
W. Windbracke
,
H. Betz
,
H.-L. Huber
,
W. Pilz
,
S. Pongratz
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 759 KB
Your tags:
english, 1986
50
Simple method for the defect control in X-ray mask fabrication
A. Kluwe
,
K.-H. Müller
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 352 KB
Your tags:
english, 1986
51
Automatic mask alignment for X-ray microlithography
Günter Doemens
,
H. Eigenstetter
,
P. Mengel
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 545 KB
Your tags:
english, 1986
52
A flexible beamshaper
K.D. van der Mast
,
F.J. Pijper
,
J.E. Barth
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 409 KB
Your tags:
english, 1986
53
Electron optical column for high speed nanometric lithography
N. Saitou
,
S. Hosoki
,
M. Okumura
,
T. Matsuzaka
,
G. Matsuoka
,
M. Ohyama
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 717 KB
Your tags:
english, 1986
54
Determination of the proximity parameters in electron beam lithography using doughnut-structures
L. Stevens
,
R. Jonckheere
,
E. Froyen
,
S. Decoutere
,
D. Lanneer
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 367 KB
Your tags:
english, 1986
55
The study of the electron-electron interaction in electron gun
Wu yajun
,
Wei maoxin
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 57 KB
Your tags:
english, 1986
56
Mask and circuit repair applications of focused ion beam deposition
D.C. Shaver
,
L.A. Stern
,
N.P. Economou
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 29 KB
Your tags:
english, 1986
57
Ultrasmall device fabrication using dry etching of gaas
Stephen Thoms
,
Steven P Beaumont
,
Chris DW Wilkinson
,
Jonathon Frost
,
Colin R Stanley
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 357 KB
Your tags:
english, 1986
58
Fabrication of grating gates for lateral surface superlattice devices using E-beam lithography
J. Caro
,
E.W.J.M. van der Drift
,
K.L. Hagemans
,
S. Radelaar
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 306 KB
Your tags:
english, 1986
59
Poly-4-bromostyrene, a high performance negative electron resist
F. Schué
,
B. Holil
,
R. Sagnes
,
C. Montginoul
,
L. Giral
,
F. Buiguez
,
B. Serre
,
Ch. Rosilio
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 239 KB
Your tags:
english, 1986
60
Investigation of structure profiles in negative resists
V.V. Aristov
,
T.B. Borsenko
,
V.A. Kudryashov
,
A.A. Svintsov
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 432 KB
Your tags:
english, 1986
61
Radiation damage in dry etching
S.W. Pang
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 498 KB
Your tags:
english, 1986
62
Secondary effects of single crystalline silicon deep- trench etching in a chlorine-containing plasma for 3- dimensional capacitor cells
I.W. Rangelow
,
P. Thoren
,
K. Maβeli
,
R. Kassing
,
M. Engelhardt
,
S. Schwarzl
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 666 KB
Your tags:
english, 1986
63
High-temperature-stable Si3N4 dummy T-gate and lift-off mask
P. Buchmann
,
V. Graf
,
Th.O. Mohr
,
P. Vettiger
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 347 KB
Your tags:
english, 1986
64
Mini-trench isolation: Trench etching oxidation and refiling planarization
M. Pons
,
P. Delpech
,
A. Schiltz
,
A. Inard
,
R.A. Moore
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 77 KB
Your tags:
english, 1986
65
ArF laser induced lift-off process
Ludwig Moerl
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 406 KB
Your tags:
english, 1986
66
Micromachining of polyimide films with focused ion beams
A.J. Steckl
,
S. Balakrishnan
,
H.-S. Jin
,
J.C. Corelli
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 104 KB
Your tags:
english, 1986
67
Mask making for synchrotron radiation lithography
W. Ehrfeld
,
W. Glashauser
,
D. Münchmeyer
,
W. Schelb
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 359 KB
Your tags:
english, 1986
68
The potential of mechanical microlithography for submicron patterning
J. Gobrecht
,
J.B. Pethica
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 301 KB
Your tags:
english, 1986
69
An image fidelity approach to measuring the point spread function in electron and ion beam lithographies
Michael E. Haslam
,
John F. McDonald
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 531 KB
Your tags:
english, 1986
70
Some aspects concerning design for e-beam testability
K.D. Herrmann
,
E. Kubalek
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 416 KB
Your tags:
english, 1986
71
E-beam testing of high-speed electronic devices
Reinhold Schmitt
,
Dieter Winkler
,
Lischke Burkhard
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 391 KB
Your tags:
english, 1986
72
Energy and time-resolved photoemission in a promising new approach for contactless integrated-circuit testing
H.K. Seitz
,
A. Blacha
,
R. Clauberg
,
H. Beha
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 259 KB
Your tags:
english, 1986
73
The SEM as inspection and testing tool in the IC industry
C. Tollkamp-Schierjott
,
J. Windsor-Martin
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 473 KB
Your tags:
english, 1986
74
A practical submicron lithography system using a conventional source X-ray stepper
B. Fay
,
J. Labrie
,
S. Bijawat
Journal:
Microelectronic Engineering
Year:
1986
Language:
english
File:
PDF, 442 KB
Your tags:
english, 1986
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