Volume 100; Issue 3

Thin Solid Films

Volume 100; Issue 3
1

Electron diffraction study of CdInGaS4 thin films

A.G. Abdullayev, M.G. Kyasimov
Journal:
Thin Solid Films
Year:
1983
Language:
english
File:
PDF, 277 KB
english, 1983
2

R.F. diode sputtering in permanent-match mode

Orla Christensen, Ole H. Olsen, Niels Erik Holm, Jens Sørensen
Journal:
Thin Solid Films
Year:
1983
Language:
english
File:
PDF, 689 KB
english, 1983
4

Cd2SnO4 thin films obtained by d.c. reactive sputtering of Cd-Sn alloys

E. Leja, K. Budzyńska, T. Pisarkiewicz, T. Stapiński
Journal:
Thin Solid Films
Year:
1983
Language:
english
File:
PDF, 324 KB
english, 1983
5

Universal chemical vapour deposition system for metallurgical coatings

M. Stolz, K. Hieber, C. Wieczorek
Journal:
Thin Solid Films
Year:
1983
Language:
english
File:
PDF, 791 KB
english, 1983
6

Structural studies of chemically vapour-deposited tin oxide films

N.Srinivasa Murty, S.R. Jawalekar
Journal:
Thin Solid Films
Year:
1983
Language:
english
File:
PDF, 273 KB
english, 1983
8

Diffusion characteristics of boron and phosphorus in polycrystalline silicon

A.D. Buonaquisti, W. Carter, P.H. Holloway
Journal:
Thin Solid Films
Year:
1983
Language:
english
File:
PDF, 613 KB
english, 1983
10

Some properties of r.f. reactively sputtered magnetic Fe-C films

B. Goranchev, K. Reichelt, J. Chevallier, P. Grünberg, W. Vach
Journal:
Thin Solid Films
Year:
1983
Language:
english
File:
PDF, 681 KB
english, 1983
11

The formation of buried Si3N4 layers in silicon by high dose nitrogen ion implantation

U. Kreissig, W. Skorupa, E. Hensel
Journal:
Thin Solid Films
Year:
1983
Language:
english
File:
PDF, 177 KB
english, 1983