Volume 199; Issue 1

Thin Solid Films

Volume 199; Issue 1
1

Editorial Board

Year:
1991
File:
PDF, 28 KB
1991
2

Publisher's note

Year:
1991
Language:
english
File:
PDF, 46 KB
english, 1991
3

Editorial

Year:
1991
Language:
english
File:
PDF, 67 KB
english, 1991
5

Electrical properties of flash-evaporated tin selenide films

Year:
1991
Language:
english
File:
PDF, 188 KB
english, 1991
6

Characterization of fluorine-doped tin oxide produced by the pyrosol method

Year:
1991
Language:
english
File:
PDF, 422 KB
english, 1991
7

Rapid thermal annealing of W-Sm bilayers on p-type silicon

Year:
1991
Language:
english
File:
PDF, 277 KB
english, 1991
10

Plasma-emission-controlled d.c. magnetron sputtering of TiO2-x thin films

Year:
1991
Language:
english
File:
PDF, 656 KB
english, 1991
11

Compositional changes during magnetron sputtering of alloys

Year:
1991
Language:
english
File:
PDF, 672 KB
english, 1991
15

Silicide formation by solid state reaction of Mo-Ni and Mo-Co films with Si(100)

Year:
1991
Language:
english
File:
PDF, 314 KB
english, 1991
18

ZnS:Eu thin film electroluminescent devices prepared by r.f. magnetron sputtering

Year:
1991
Language:
english
File:
PDF, 471 KB
english, 1991