Volume 93; Issue 3-4

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Thin Solid Films
Volume 93; Issue 3-4

Thin Solid Films

Volume 93; Issue 3-4

1

Analysis of surface structural defects by low energy electron diffraction

D.G. Welkie, M.G. Lagally

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 930 KB

english, 1982

2

Radioactive Ni∗ tracer study of the nickel silicide growth mechanism

J.E.E. Baglin, H.A. Atwater, D. Gupta, F.M. D'Heurle

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 561 KB

english, 1982

3

Comparison of the three classes (rare earth, refractory and near-noble) of silicide contacts

R.D. Thompson, K.N. Tu

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 683 KB

english, 1982

4

Formation and growth of voids and/or gas bubbles in thin films

J.R. Lloyd, S. Nakahara

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 395 KB

english, 1982

5

Structure and performance of polycrystalline thin film solar cells

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 688 KB

english, 1982

6

Magnetron-sputtered metal-amorphous silicon interfaces

W.W. Anderson, J.L. Crowley, A.D. Jonath, H.F. Macmillan, W.G. Opyd, J.A. Thornton

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 305 KB

english, 1982

7

Studies of interface states of silicon metal-oxide-semiconductor devices by dynamic conductance and noise measurements and effects of bias-temperature stresses

K.L. Ngai, S.T. Liu

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 610 KB

english, 1982

8

Effects of interface structure on the electrical characteristics of PtSi-Si Schottky barrier contacts

B.-Y. Tsaur, D.J. Silversmith, R.W. Mountain, C.H. Anderson Jr.

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 694 KB

english, 1982

9

New developments in the defect structure of implanted furnace-annealed silicon on sapphire

Eliezer Dovid Richmond, Alvin R. Knudson, Tom J. Magee

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 855 KB

english, 1982

10

The role of metal and passivation defects in electromigration-induced damage in thin film conductors

J.R. Lloyd, P.M. Smith, G.S. Prokop

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 866 KB

english, 1982

11

Applications of TiN thin films in silicon device technology

M. Wittmer, H. Melchior

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 487 KB

english, 1982

12

Reduction in the effective barrier height in PtSi-p-Si Schottky diodes by using low energy ion implantation

C.-Y. Wei, W. Tantraporn, W. Katz, G. Smith

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 273 KB

english, 1982

13

Oxide barriers to the formation of refractory silicides

D.J. Silversmith, D.D. Rathman, R.W. Mountain

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 376 KB

english, 1982

14

Author index

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 36 KB

english, 1982

15

Contents of volume 93

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 112 KB

english, 1982

16

Flash-evaporated Cr-SiO resistive elements

E. Schabowska, Z. Porada

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 177 KB

english, 1982

17

Quantifying delineation errors in thin film resistors I: Evaluation of linewidth errors from resistance measurements

A. Peled, M. Haspel

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 197 KB

english, 1982

18

The direct observation of atomic surface structure and inclined planar defects in Au(111) films

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 1.73 MB

english, 1982

19

Differences between the growth kinetics of thin film and bulk diffusion couples

U. Gösele, K.N. Tu

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 30 KB

english, 1982

20

Formation of intermetallics and grain boundary diffusion in Cu-Al and Au-Al thin film couples

J.M. Vandenberg, F.J.A. Den Broeder, R.A. Hamm

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 182 KB

english, 1982

21

Electron beam study of silicide Schottky diodes

H.-C.W. Huang, C.F. Aliotta, P.S. Ho

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 703 KB

english, 1982

22

Effects of grain boundaries on the resistivity of co-sputtered WSi2 films

D.R. Campbell, S. Mader, W.K. Chu

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 288 KB

english, 1982

23

Silicide applications in microelectronics

Billy L. Crowder

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 41 KB

english, 1982

24

Metallization for very-large-scale integrated circuits

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 2.00 MB

english, 1982