Volume 3; Issue 5

Chemical Vapor Deposition

Volume 3; Issue 5

1

Masthead

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 61 KB

english, 1997

2

Plasma-assisted CVD of cubic boron nitride

Dr. Igor Konyashin, Dr. Joachim Bill, Prof. Fritz Aldinger

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 2.71 MB

english, 1997

3

Boron Carbonitride Thin Films by PACVD of Single-Source Precursors

Dirk Hegemann, Prof. Ralf Riedel, Dr. Wolfgang Dreßler, Dr. Christian Oehr, Dr. Bernd Schindler, Prof. Herwig Brunner

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 556 KB

english, 1997

4

Origins of Texture in TTF-TCNQ Thin Films Grown by Organic CVD from TTF and TCNQ Precursors

Jaume Caro, Dr. Jordi Fraxedas, Dr. Albert Figueras

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 1.09 MB

english, 1997

5

Structural and Electrical Changes in Polycrystalline Silicon Thin Films That Are Heavily In Situ Boron-Doped and Thermally Oxidized with Dry Oxygen

Dr. Messaoud Boukezzata, Dr. Boubekeur Birouk, Dr. Farida Mansour, Dr. Daniéle Bielle-Daspet

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 1.19 MB

english, 1997

6

Palladium thin films grown by CVD from (1,1,1,5,5,5-hexafluoro-2,4-pentanedionato) palladium(II)

Vijay Bhaskaran, Prof. Mark J. Hampden-Smith, Prof. Toivo T. Kodas

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 1.14 MB

english, 1997

7

Semiconductors — processed and packaged. Materials for electronic packaging. Edited by Deborah D. L. Cung, Butterworth-Heinemann, Oxford 1995, xiv, 368 pp., hardcover, ISBN 0-7506-9314-2

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 128 KB

english, 1997

8

Semiconductors — basic data, 2nd ed. Edited by O. Madelung, Springer, Berlin 1996, viii, 317 pp., hardcover, DM 88.00, ISBN 3-540-60883-4

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 228 KB

english, 1997

9

Processing of semiconductors. Edited by K. A. Jackson, Volume 16 of Materials Science and Technology — A comprehensive Treatment, edited by R. W. Cah, P. Haasen, and E. J. Kramer, VCH, Weinheim 1996, XV, 689 pp., hardcover, DM 498.00, ISBN 3-527-26829-4

Journal:

Chemical Vapor Deposition

Year:

1997

Language:

english

File:

PDF, 115 KB

english, 1997