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Volume 3; Issue 5
Main
Chemical Vapor Deposition
Volume 3; Issue 5
Chemical Vapor Deposition
Volume 3; Issue 5
1
Masthead
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 61 KB
Your tags:
english, 1997
2
Plasma-assisted CVD of cubic boron nitride
Dr. Igor Konyashin
,
Dr. Joachim Bill
,
Prof. Fritz Aldinger
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 2.71 MB
Your tags:
english, 1997
3
Boron Carbonitride Thin Films by PACVD of Single-Source Precursors
Dirk Hegemann
,
Prof. Ralf Riedel
,
Dr. Wolfgang Dreßler
,
Dr. Christian Oehr
,
Dr. Bernd Schindler
,
Prof. Herwig Brunner
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 556 KB
Your tags:
english, 1997
4
Origins of Texture in TTF-TCNQ Thin Films Grown by Organic CVD from TTF and TCNQ Precursors
Jaume Caro
,
Dr. Jordi Fraxedas
,
Dr. Albert Figueras
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 1.09 MB
Your tags:
english, 1997
5
Structural and Electrical Changes in Polycrystalline Silicon Thin Films That Are Heavily In Situ Boron-Doped and Thermally Oxidized with Dry Oxygen
Dr. Messaoud Boukezzata
,
Dr. Boubekeur Birouk
,
Dr. Farida Mansour
,
Dr. Daniéle Bielle-Daspet
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 1.19 MB
Your tags:
english, 1997
6
Palladium thin films grown by CVD from (1,1,1,5,5,5-hexafluoro-2,4-pentanedionato) palladium(II)
Vijay Bhaskaran
,
Prof. Mark J. Hampden-Smith
,
Prof. Toivo T. Kodas
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 1.14 MB
Your tags:
english, 1997
7
Semiconductors — processed and packaged. Materials for electronic packaging. Edited by Deborah D. L. Cung, Butterworth-Heinemann, Oxford 1995, xiv, 368 pp., hardcover, ISBN 0-7506-9314-2
Toshio Sudo
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 128 KB
Your tags:
english, 1997
8
Semiconductors — basic data, 2nd ed. Edited by O. Madelung, Springer, Berlin 1996, viii, 317 pp., hardcover, DM 88.00, ISBN 3-540-60883-4
Mason Thomas
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 228 KB
Your tags:
english, 1997
9
Processing of semiconductors. Edited by K. A. Jackson, Volume 16 of Materials Science and Technology — A comprehensive Treatment, edited by R. W. Cah, P. Haasen, and E. J. Kramer, VCH, Weinheim 1996, XV, 689 pp., hardcover, DM 498.00, ISBN 3-527-26829-4
P. J. Wright
Journal:
Chemical Vapor Deposition
Year:
1997
Language:
english
File:
PDF, 115 KB
Your tags:
english, 1997
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