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Volume 8; Issue 4

Chemical Vapor Deposition

Volume 8; Issue 4

1

Contents: Chem. Vap. Deposition 4/2002

Journal:

Chemical Vapor Deposition

Year:

2002

Language:

english

File:

PDF, 78 KB

english, 2002

2

Fluidization, Spouting, and Metal–Organic CVD of Platinum Group Metals on Powders

C. Vahlas, F. Juarez, R. Feurer, P. Serp, B. Caussat

Journal:

Chemical Vapor Deposition

Year:

2002

Language:

english

File:

PDF, 1.12 MB

english, 2002

3

A New Chromium-Based Molecular Magnet Grown as a Thin Film by CVD

H. Casellas, D. de Caro, L. Valade, P. Cassoux

Journal:

Chemical Vapor Deposition

Year:

2002

Language:

english

File:

PDF, 175 KB

english, 2002

4

Diffusion Barrier Deposition on a Copper Surface by Atomic Layer Deposition

K.-E. Elers, V. Saanila, P. J. Soininen, W.-M. Li, J. T. Kostamo, S. Haukka, J. Juhanoja, W. F. A. Besling

Journal:

Chemical Vapor Deposition

Year:

2002

Language:

english

File:

PDF, 247 KB

english, 2002

5

In-Situ Mass Spectrometry Analyses of the Fragmentation of Linear and Cyclic Siloxanes in a Glow Discharge Compared with Ex-Situ FTIR Analyses of the Deposits

V. Rouessac, S. Roualdes, J. Durand

Journal:

Chemical Vapor Deposition

Year:

2002

Language:

english

File:

PDF, 339 KB

english, 2002

6

Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films

P. A. Williams, J. L. Roberts, A. C. Jones, P. R. Chalker, N. L. Tobin, J. F. Bickley, H. O. Davies, L. M. Smith, T. J. Leedham

Journal:

Chemical Vapor Deposition

Year:

2002

Language:

english

File:

PDF, 404 KB

english, 2002

7

New Single-Source Precursors for the MOCVD of High-κ Dielectric Zirconium Silicates to Replace SiO2 in Semiconducting Devices

S. Zürcher, M. Morstein, N. D. Spencer, M. Lemberger, A. Bauer

Journal:

Chemical Vapor Deposition

Year:

2002

Language:

english

File:

PDF, 592 KB

english, 2002