Volume 36; Issue 2

IBM Journal of Research and Development

Volume 36; Issue 2

1

Stress-induced dislocations in silicon integrated circuits

Fahey, P. M., Mader, S. R., Stiffler, S. R., Mohler, R. L., Mis, J. D., Slinkman, J. A.

Journal:

IBM Journal of Research and Development

Year:

1992

Language:

english

File:

PDF, 2.25 MB

english, 1992

2

Application of electron and ion beam analysis techniques to microelectronics

Kuan, T. S., Batson, P. E., Feenstra, R. M., Slavin, A. J., Tromp, R. M.

Journal:

IBM Journal of Research and Development

Year:

1992

Language:

english

File:

PDF, 2.40 MB

english, 1992

3

Plasma-based dry etching techniques in the silicon integrated circuit technology

Oehrlein, G. S., Rembetski, J. F.

Journal:

IBM Journal of Research and Development

Year:

1992

Language:

english

File:

PDF, 1.45 MB

english, 1992

4

Recent publications by IBM authors

Jewell, R. G., Faus, H. T.

Journal:

IBM Journal of Research and Development

Year:

1992

Language:

english

File:

PDF, 3.69 MB

english, 1992

5

Numerical modeling of advanced semiconductor devices

Lee, W., Laux, S. E., Fischetti, M. V., Baccarani, G., Gnudi, A., Stork, J. M. C., Mandelman, J. A., Crabbe, E. F., Wordeman, M. R., Odeh, F.

Journal:

IBM Journal of Research and Development

Year:

1992

Language:

english

File:

PDF, 2.17 MB

english, 1992

6

Preface

Lipari, Nunzio O.

Journal:

IBM Journal of Research and Development

Year:

1992

Language:

english

File:

PDF, 163 KB

english, 1992

7

Integrated processing for microelectronics science and technology

Rubloff, G. W., Bordonaro, D. T.

Journal:

IBM Journal of Research and Development

Year:

1992

Language:

english

File:

PDF, 3.84 MB

english, 1992