Volume 18; Issue 1

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IEEE Transactions on Semiconductor Manufacturing
Volume 18; Issue 1

IEEE Transactions on Semiconductor Manufacturing

Volume 18; Issue 1

1

Dynamic Load Balancing Among Multiple Fabrication Lines Through Estimation of Minimum Inter-Operation Time

Toba, H., Izumi, H., Hatada, H., Chikushima, T.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.02 MB

english, 2005

2

Yield Enhancement in Photolithography Through Model-Based Process Control: Average Mode Control

Grosman, B., Lachman-Shalem, S., Swissa, R., Lewin, D.R.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 476 KB

english, 2005

3

Optimal Automatic Control of Multistage Production Processes

Fenner, J.S., Jeong, M.K., Lu, J.-C.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 542 KB

english, 2005

4

Equipment Effectiveness: OEE Revisited

A. Deron, J. Rooda

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 289 KB

english, 2005

5

Investigation of Gross Die Per Wafer Formulas

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 191 KB

english, 2005

6

The Origin of Extended Dislocations Induced by High-Dose Ion Implantation

Tsuchiya, N., Fujii, O., Umezawa, K., Iwase, M., Ushiku, Y.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.89 MB

english, 2005

7

Enhancement of CMOS Performance by Process-Induced Stress

Luo, Y., Nayak, D.K.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 360 KB

english, 2005

8

Wafer-Grown Heat Flux Sensor Arrays for Plasma Etch Processes

Freed, M., Kruger, M.V.P., Poolla, K., Spanos, C.J.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.44 MB

english, 2005

9

Robustness of a Selective Epitaxial-Growth Process of Silicon and Its Application to the Fabrication of a High-Quality Hybrid SOI Wafer

Nagano, H., Miyano, K., Yamada, T., Mizushima, I.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 487 KB

english, 2005

10

Materials' Impact on Interconnect Process Technology and Reliability

Hussein, M.A., He, J.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 4.09 MB

english, 2005

11

Reactive Ion Etching and Characterization of p-Silk Ultra Low-k Film

Murthy, B.R., Mukherjee-Roy, M.M., Krishnamoorthy, A., Frye, D.C.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 2.92 MB

english, 2005

12

Study of the step coverage and contact resistance by using two-step TiN barrier and evolve simulation

Sidhwa, A., Spinner, C., Gandy, T., Goulding, M., Brown, W., Naseem, H., Ulrich, R., Ang, S., Charlton, S., Prasad, V., Cale, T.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 3.98 MB

english, 2005

13

Guest Editorial Special Section on Materials-Related Manufacturing Issues in the Nanochip Era

Singh, R., Tyagi, S., Shimazaki, A., Claeys, C.L., Chen, S.-H., Thakur, R.P.S.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 626 KB

english, 2005

14

Development of a Web-Services-Based e-Diagnostics Framework for Semiconductor Manufacturing Industry

Hung, M.-H., Cheng, F.-T., Yeh, S.-C.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.90 MB

english, 2005

15

In Search of “Forever,” Continued Transistor Scaling One New Material at a Time

Thompson, S.E., Chau, R.S., Ghani, T., Mistry, K., Tyagi, S., Bohr, M.T.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.73 MB

english, 2005

16

Sample-Size Determination for Achieving Asymptotic Stability of a Double EWMA Control Scheme

Tseng, S.-T., Hsu, N.-J.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 360 KB

english, 2005

17

Manufacturing Benefits of Disilane as a Precursor for Polycrystalline Silicon Films for the Advanced CMOS Gate Electrode

Chen, Y., Bu, H., Butler, S.W., Cunningham, K.L., Wang, S., Spicer, B.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.67 MB

english, 2005

18

Manufacturability of 20-nm Ultrathin Body Fully Depleted SOI Devices With FUSI Metal Gates

Krivokapic, Z., Maszara, W.P., Lin, M.-R.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.65 MB

english, 2005

19

Effect of UV/VUV Enhanced RTP on Process Variation and Device Performance of Metal Gate/High-<tex>$kappa$</tex>Gate Stacks for the Sub-90-nm CMOS Regime

Damjanovic, D., Bolla, H.K., Singh, R., Poole, K.F., Senter, H.F., Narayan, J.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.28 MB

english, 2005

20

Self-Aligning Planarization and Passivation for Integration Applications in III–V Semiconductor Devices

Demir, H.V., Zheng, J.-F., Sabnis, V.A., Fidaner, O., Hanberg, J., Harris, J.S., Miller, D.A.B.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.97 MB

english, 2005

21

Factory Throughput Improvements Through Intelligent Integrated Delivery in Semiconductor Fabrication Facilities

Li, B., Wu, J., Carriker, W., Giddings, R.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 620 KB

english, 2005

22

An Evaluation of Deadlock-Handling Strategies in Semiconductor Cluster Tools

Venkatesh, S., Smith, J.S.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 203 KB

english, 2005

23

An Examination of Variability and Its Basic Properties for a Factory

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 263 KB

english, 2005

24

Embedded Ferroelectric Memory Technology With Completely Encapsulated Hydrogen Barrier Structure

Nagano, Y., Mikawa, T., Kutsunai, T., Natsume, S., Tatsunari, T., Ito, T., Noma, A., Nasu, T., Hayashi, S., Hirano, H., Gohou, Y., Judai, Y., Fujii, E.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 1.06 MB

english, 2005

25

Process Extensions in Optical Lithography Enabling 45-nm Technologies

Zandbergen, P., VanSteenwinckel, D., Lammers, J.H., Kwinten, H., Juffermans, C.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2005

Language:

english

File:

PDF, 611 KB

english, 2005