Volume 6; Issue 3

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IEEE Transactions on Semiconductor Manufacturing
Volume 6; Issue 3

IEEE Transactions on Semiconductor Manufacturing

Volume 6; Issue 3

1

Model identification in rapid thermal processing systems

Cho, Y.M., Kailath, T.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 1.22 MB

english, 1993

2

An automated loading and unloading system for a maglev wafer transport path

Wang, W., Lamb, M., Busch-Vishniac, I.J.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 444 KB

english, 1993

3

Model-based emissivity correction in pyrometer temperature control of rapid thermal processing systems

Sorrell, F.Y., Gyurcsik, R.S.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 431 KB

english, 1993

4

Particle removal from silicon wafer surface in wet cleaning process

Itano, M., Kern, F.W., Miyashita, M., Ohmi, T.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 919 KB

english, 1993

5

Comments, with reply, on "Dose perturbation by wafer charging during ion implantation" by Y. Sato et al

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 111 KB

english, 1993

6

Optimizing gettering conditions for VLSI chips using simple yield model

Kishino, S., Yoshida, H., Niu, H.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 651 KB

english, 1993

7

Integrating expert systems with a relational database in semiconductor manufacturing

Perez, R.A., Koh, S.W.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 864 KB

english, 1993

8

A novel laser direct write technique for fabrication of thin film MICs

Harish, C.M., Kumar, V., Prabhakar, A.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 418 KB

english, 1993

9

Reactor characterization for a process to etch Si/sub 3/N/sub 4/ formed on thin SiO/sub 2/

Riley, P.E., Defonseka, B.N., Sum, J.C., Figueredo, D.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 282 KB

english, 1993

10

ExPro-an expert system based process management system

Rastogi, P., Kozicki, M.N., Golshani, F.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 1.26 MB

english, 1993

11

Trends and limits in monolithic integration by increasing the die area

Warwick, C.A., Ourmazd, A.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 625 KB

english, 1993

12

Differentiation of source/drain breakdown mechanisms by a single ring transistor measurment

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 284 KB

english, 1993

13

An improved methodology for real-time production decisions at batch-process work stations

Weng, W.W., Leachman, R.C.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 641 KB

english, 1993

14

Advanced development process for ultrafine photoresist patterns

Shimada, H., Onodera, M., Nonaka, T., Hirose, K., Ohmi, T.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 536 KB

english, 1993

15

Temperature distribution in semiconductor wafers heated in a vertical diffusion furnace

Hirasawa, S., Kieda, S., Watanabe, T., Torii, T., Takagaki, T., Uchino, T.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 670 KB

english, 1993

16

PELOX integrated PBL

Roth, S.S., Cooper, K.J., Kirsch, H.C., Ray, W., Hendrix, L., Simon, G.

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

1993

Language:

english

File:

PDF, 368 KB

english, 1993