51

Electrical properties of electroless NiP thin films

Year:
1986
Language:
english
File:
PDF, 269 KB
english, 1986
52

Pore formation during the breakdown process in anodic Ta2O5 films

Year:
1987
Language:
english
File:
PDF, 358 KB
english, 1987
56

Scintillation in anodic Ta2O5 films

Year:
1979
Language:
english
File:
PDF, 301 KB
english, 1979
57

Optical properties of reactively sputtered silicon nitride films

Year:
1987
Language:
english
File:
PDF, 233 KB
english, 1987
59

Metallization technologies for ULSI

Year:
1989
Language:
english
File:
PDF, 809 KB
english, 1989
60

Study of boron nitride deposition process from diborane and ammonia gas mixtures

Year:
1994
Language:
english
File:
PDF, 222 KB
english, 1994
63

Transformation of silicon nitride in oxygen plasma

Year:
1991
Language:
english
File:
PDF, 430 KB
english, 1991
64

Reactive sputtered Ta2O5 antireflection coatings

Year:
1983
Language:
english
File:
PDF, 299 KB
english, 1983
80

TixSiyN nanocomposites by cathodic arc plasma deposition

Year:
2009
Language:
english
File:
PDF, 301 KB
english, 2009
81

Boron–carbon–nitrogen compounds grown by ion beam assisted evaporation

Year:
2000
Language:
english
File:
PDF, 332 KB
english, 2000
83

Influence of oxygen on the nucleation and growth of diamond films

Year:
1997
Language:
english
File:
PDF, 444 KB
english, 1997
86

Different stages during CVD deposition on porous substrates

Year:
2002
Language:
english
File:
PDF, 389 KB
english, 2002
90

Dielectric properties of thin Ta2O5 films

Year:
1974
Language:
english
File:
PDF, 308 KB
english, 1974
95

Growth of anodic oxides on reactively sputtered TiNx films

Year:
1993
Language:
english
File:
PDF, 491 KB
english, 1993