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101

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Developing an uncertainty analysis for optical scatterometry

Germer, Thomas A., Patrick, Heather J., Silver, Richard M., Bunday, Benjamin, Allgair, John A., Raymond, Christopher J.

Year:

2009

Language:

english

File:

PDF, 223 KB

english, 2009

102

A closed form solution for the G/M/r machine interference model

BUNDAY, BRIAN D., KHORRAM, ESMAILE

Journal:

International Journal of Production Research

Year:

1988

Language:

english

File:

PDF, 260 KB

english, 1988

103

Selective Effects of Baclofen on Use-Dependent Modulation of GABAB Inhibition after Tetraplegia

Barry, M. D., Bunday, K. L., Chen, R., Perez, M. A.

Journal:

Journal of Neuroscience

Year:

2013

Language:

english

File:

PDF, 1.96 MB

english, 2013

104

Efficiency of Bi-Directionally Traversed Machines

Bunday, B. D., Mack, C.

Journal:

Journal of the Royal Statistical Society: Series C (Applied Statistics)

Year:

1973

Language:

english

File:

PDF, 626 KB

english, 1973

105

Games and Programs: Mathematics for Modellingby Robert R. Singleton; William F. Tyndall

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Year:

1975

Language:

english

File:

PDF, 206 KB

english, 1975

106

The maintenance of bidirectionally patrolled machines

BUNDAY, BRAIN D., SZTRIK, JANOS, TAPSIR, RUZELA B.

Journal:

IMA Journal of Management Mathematics

Year:

1991

Language:

english

File:

PDF, 404 KB

english, 1991

107

[AIP CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007 International Conference on Frontiers of Characterization and Metrology - Gaithersburg, MD (27-29 March 2007)] AIP Conference Proceedings - Line Edge Roughness and Cross Sectional Characterization of Sub-50 nm Structures Using Critical Dimension Small Angle X-ray Scattering

Wang, Chengqing, Jones, Ronald L., Lin, Eric K., Wu, Wen-li, Ho, Derek L., Villarrubia, John S., Choi, Kwang-Woo, Clarke, James S., Roberts, Jeanette, Bristol, Robert, Bunday, Benjamin, Seiler, David

Year:

2007

Language:

english

File:

PDF, 1.05 MB

english, 2007

108

[IEEE 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2015.5.3-2015.5.6)] 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Enabling future generation high-speed inspection through a massively parallel e-beam approach

Malloy, Matt, Bunday, Benjamin, Wurm, Stefan, Thiel, Brad, Kemen, Thomas, Zeidler, Dirk, Eberle, Anna Lena, Garbowski, Tomasz, Dellemann, Gregor, Peters, Jan Hendrik

Year:

2015

Language:

english

File:

PDF, 990 KB

english, 2015

109

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - TSOM method for semiconductor metrology

Attota, Ravikiran, Dixson, Ronald G., Kramar, John A., Potzick, James E., Vladár, András E., Bunday, Benjamin, Novak, Erik, Rudack, Andrew, Raymond, Christopher J.

Year:

2011

Language:

english

File:

PDF, 3.17 MB

english, 2011

110

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Solecky, Eric, Patterson, Oliver D., Stamper, Andrew, McLellan, Erin, Buengener, Ralf, Vaid, Alok, Hartig, Carsten, Bunday, Benjamin, Arceo, Abraham, Cepler, Aron, Starikov, Alexander, Cain, Jason P.

Year:

2013

Language:

english

File:

PDF, 934 KB

english, 2013

111

Locomotor adaptation is modulated by observing the actions of others

M. Patel, R. E. Roberts, M. U. Riyaz, M. Ahmed, D. Buckwell, K. Bunday, H. Ahmad, D. Kaski, Q. Arshad, A. M. Bronstein

Year:

2015

Language:

english

File:

PDF, 907 KB

english, 2015

112

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Quantitative nanomechanical measurement of electron beam surface modification

Cain, Jason P., Sanchez, Martha I., Cordes, Aaron, Bunday, Benjamin, Montgomery, Cecilia, Osborne, Jason, Hand, Sean

Year:

2015

Language:

english

File:

PDF, 748 KB

english, 2015

113

Some Thoughts on a Coin-Tossing Problem

Journal:

The Mathematical Gazette

Year:

1976

Language:

english

File:

PDF, 623 KB

english, 1976

114

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Novel metrology methods for fast 3D characterization of directed self-assembly (DSA) patterns for high volume manufacturing

Cain, Jason P., Sanchez, Martha I., Sarma, Chandra, Bunday, Benjamin, Cepler, Aron, Dziura, Ted, Kim, JiHoon, Lin, Guanyang, Yin, Jian

Year:

2014

Language:

english

File:

PDF, 715 KB

english, 2014

115

Sampling Inspection and Quality Controlby G. Barrie Wetherill

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Year:

1978

Language:

english

File:

PDF, 223 KB

english, 1978

116

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Small feature accuracy challenge for CD-SEM metrology physical model solution

Bunday, Benjamin, Allgair, John, Adan, Ofer, Tam, Aviram, Latinski, Sergey, Eytan, Guy, Archie, Chas N.

Year:

2006

Language:

english

File:

PDF, 1.48 MB

english, 2006

117

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - CD-SEM measurement line-edge roughness test patterns for 193-nm lithography

Bunday, Benjamin D., Bishop, Michael, Villarrubia, John S., Vladar, Andras E., Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 733 KB

english, 2003

118

The Theory of Stochastic Processesby D. R. Cox; H. D. Miller

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Year:

1977

Language:

english

File:

PDF, 473 KB

english, 1977

119

Introduction to Probability and Statistics: Concepts and Principlesby Harry Frank

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Year:

1974

Language:

english

File:

PDF, 216 KB

english, 1974

120

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Critical dimension small angle X-ray scattering measurements of FinFET and 3D memory structures

Settens, Charles, Bunday, Benjamin, Thiel, Brad, Kline, R. Joseph, Sunday, Daniel, Wang, Chengqing, Wu, Wen-li, Matyi, Richard, Starikov, Alexander, Cain, Jason P.

Year:

2013

Language:

english

File:

PDF, 528 KB

english, 2013

121

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - TEM calibration methods for critical dimension standards

Orji, Ndubuisi G., Dixson, Ronald G., Garcia-Gutierrez, Domingo I., Bunday, Benjamin D., Bishop, Michael, Cresswell, Michael W., Allen, Richard A., Allgair, John A., Archie, Chas N.

Year:

2007

Language:

english

File:

PDF, 677 KB

english, 2007

122

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Improving optical measurement accuracy using multi-technique nested uncertainties

Silver, R. M., Zhang, N. F., Barnes, B. M., Zhou, H., Heckert, A., Dixson, R., Germer, T. A., Bunday, B., Allgair, John A., Raymond, Christopher J.

Year:

2009

Language:

english

File:

PDF, 1.32 MB

english, 2009

123

Statistical Mathematicsby Robert Loveday

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Year:

1973

Language:

english

File:

PDF, 206 KB

english, 1973

124

To Stop or Not to Stopby Björn Leonardz

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Year:

1975

Language:

english

File:

PDF, 480 KB

english, 1975

125

[IEEE 2015 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2015.3.15-2015.3.16)] 2015 China Semiconductor Technology International Conference - Novel three dimensional (3D) CD-SEM profile measurements

Yoshikawa, Makoto, Bunday, Benjamin, Longhai Liu,, Ito, Wataru, Shida, Soichi, Matsumoto, Jun, Nakamura, Takayuki

Year:

2015

Language:

english

File:

PDF, 920 KB

english, 2015

126

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Analytical linescan model for SEM metrology

Cain, Jason P., Sanchez, Martha I., Mack, Chris A., Bunday, Benjamin D.

Year:

2015

Language:

english

File:

PDF, 7.44 MB

english, 2015

127

Likelihood and Bayesian Estimation Methods for Poisson Process Models in Software Reliability

Bunday, B.D., Al‐Ayoubi, I.D.

Journal:

International Journal of Quality & Reliability Management

Year:

1990

Language:

english

File:

PDF, 291 KB

english, 1990

128

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Towards development of a sidewall roughness standard

Cordes, Aaron, Bunday, Ben, Hand, Sean, Osborne, Jason, Porter, Hugh, Starikov, Alexander, Cain, Jason P.

Year:

2013

Language:

english

File:

PDF, 661 KB

english, 2013

129

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Novel three dimensional (3D) CD-SEM profile measurements

Cain, Jason P., Sanchez, Martha I., Ito, Wataru, Bunday, Benjamin, Harada, Sumito, Cordes, Aaron, Murakawa, Tsutomu, Arceo, Abraham, Yoshikawa, Makoto, Hara, Toshihiko, Arai, Takehito, Shida, Soichi,

Year:

2014

Language:

english

File:

PDF, 764 KB

english, 2014

130

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Influence of metrology error in measurement of line edge roughness power spectral density

Cain, Jason P., Sanchez, Martha I., Bunday, Benjamin D., Mack, Chris A.

Year:

2014

Language:

english

File:

PDF, 1.17 MB

english, 2014

131

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Probe microscopy for metrology of next-generation devices

Sanchez, Martha I., Ukraintsev, Vladimir A., Humphris, Andrew D. L., Zhao, Bin, Bastard, David, Bunday, Benjamin

Year:

2016

Language:

english

File:

PDF, 1.18 MB

english, 2016

132

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Improvements to the analytical linescan model for SEM metrology

Sanchez, Martha I., Ukraintsev, Vladimir A., Mack, Chris A., Bunday, Benjamin D.

Year:

2016

Language:

english

File:

PDF, 3.06 MB

english, 2016

133

The Reliability of Artificial Heart Valves ‐ A Case Study for the Proportional Hazards Model

Bunday, Brian D., Kiri, Victor A., Stoodley, Keith D.C.

Journal:

International Journal of Quality & Reliability Management

Year:

1992

Language:

english

File:

PDF, 535 KB

english, 1992

134

The availability of uni‐directionally patrolled stations

Bunday, Brian D., Tapsir, Ruzela B.

Journal:

International Journal of Quality & Reliability Management

Year:

1995

Language:

english

File:

PDF, 45 KB

english, 1995

135

Mathematical Methods in the Social and Managerial Sciencesby Patrick Hayes

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Year:

1976

Language:

english

File:

PDF, 334 KB

english, 1976

136

The Efficiency of a Textile Winding Process

B. D. Bunday and R. A. Lee

Journal:

Journal of the Royal Statistical Society: Series C (Applied Statistics)

Year:

1978

Language:

english

File:

PDF, 449 KB

english, 1978

137

The Gain in Efficiency of an Autoconer from Adding a Second Knotter

Bunday, B. D., Khorram, E.

Journal:

Journal of the Textile Institute

Year:

1988

Language:

english

File:

PDF, 815 KB

english, 1988

138

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Nonplanar high-k dielectric thickness measurements using CD-SAXS

Wang, Chengqing, Allgair, John A., Raymond, Christopher J., Choi, Kwang-Woo, Chen, Yi-Ching, Price, Jimmy, Ho, Derek L., Jones, Ronald L., Soles, Christopher, Lin, Erik K., Wu, Wen-Li, Bunday, Benjami

Year:

2009

Language:

english

File:

PDF, 1.21 MB

english, 2009

139

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Characterization of CD-SEM metrology for iArF photoresist materials

Bunday, Benjamin, Allgair, John A., Raymond, Christopher J., Cordes, Aaron, Orji, N. G., Piscani, Emil, Cochran, Dan, Byers, Jeff, Allgair, John, Rice, Bryan J., Avitan, Yohanan, Peltinov, Ram, Bar-zv

Year:

2008

Language:

english

File:

PDF, 521 KB

english, 2008

140

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Phenomenology of electron-beam-induced photoresist shrinkage trends

Bunday, Benjamin, Allgair, John A., Raymond, Christopher J., Cordes, Aaron, Allgair, John, Tileli, Vasiliki, Avitan, Yohanan, Peltinov, Ram, Bar-zvi, Maayan, Adan, Ofer, Cottrell, Eric, Hand, Sean

Year:

2009

Language:

english

File:

PDF, 582 KB

english, 2009

141

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Benchmarking of advanced CD-SEMs at the 130-nm CMOS technology node

Bunday, Benjamin D., Bishop, Michael, Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 1.62 MB

english, 2002

142

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Bias reduction in roughness measurement through SEM noise removal

Katz, R., Archie, Chas N., Chase, C. D., Kris, R., Peltinov, R., Villarrubia, J., Bunday, B.

Year:

2006

Language:

english

File:

PDF, 514 KB

english, 2006

143

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Toward accurate feature shape metrology

Orji, Ndubuisi G., Allgair, John A., Raymond, Christopher J., Dixson, Ronald G., Bunday, Benjamin D., Allgair, John A.

Year:

2008

Language:

english

File:

PDF, 369 KB

english, 2008

144

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Scanning electron microscopy imaging of ultra-high aspect ratio hole features

Cepler, Aron J., Bunday, Benjamin, Thiel, Bradley L., Villarrubia, John S., Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 2.04 MB

english, 2012

145

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - CD-SEM parameter influence on image resolution and measurement accuracy

Bunday, Benjamin, Allgair, John A., Raymond, Christopher J., Kramer, Uwe

Year:

2009

Language:

english

File:

PDF, 1.24 MB

english, 2009

146

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - The coming of age of tilt CD-SEM

Bunday, B., Archie, Chas N., Allgair, J., Solecky, E., Archie, C., Orji, N. G., Beach, J., Adan, O., Peltinov, R., Bar-zvi, M., Swyers, J.

Year:

2007

Language:

english

File:

PDF, 976 KB

english, 2007

147

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Implementation of Reference Measurement System using CD-AFM

Dixson, Ronald G., Guerry, Angela, Bennett, Marylyn H., Vorburger, Theodore V., Bunday, Benjamin D., Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 167 KB

english, 2003

148

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - CD SEM metrology macro CD technology: beyond the average

Bunday, Benjamin D., Silver, Richard M., Michelson, Di K., Allgair, John A., Tam, Aviram, Chase-Colin, David, Dajczman, Asaf, Adan, Ofer, Har-Zvi, Michael

Year:

2005

Language:

english

File:

PDF, 795 KB

english, 2005

149

SPIE Proceedings [SPIE Scanning Microscopy 2010 - Monterey, California (Monday 17 May 2010)] Scanning Microscopy 2010 - NEW scanning electron microscope magnification calibration reference material (RM) 8820

Postek, Michael T., Postek, Michael T., Newbury, Dale E., Vladár, András E., Keery, William, Platek, S. Frank, Joy, David C., Bishop, Michael, Bunday, Benjamin, Allgair, John

Year:

2010

Language:

english

File:

PDF, 3.58 MB

english, 2010

150

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control

Bunday, Benjamin D., Bishop, Michael, Bennett, Marylyn H., Swyers, John R., Haberman-Golan, Zipora, Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 1.77 MB

english, 2002