57

Deposition of CoPtP films from citric electrolyte

Year:
2007
Language:
english
File:
PDF, 885 KB
english, 2007
59

MOS isolation technology

Year:
1985
Language:
english
File:
PDF, 784 KB
english, 1985
65

All-wet fabrication process for ULSI interconnect technologies

Year:
2005
Language:
english
File:
PDF, 242 KB
english, 2005
80

Electroless-deposited Ag–W films for microelectronics applications

Year:
2001
Language:
english
File:
PDF, 574 KB
english, 2001
81

Material properties of very thin electroless silver–tungsten films

Year:
2003
Language:
english
File:
PDF, 1.40 MB
english, 2003
82

Electroless Co(Mo,P) films for Cu interconnect application

Year:
2002
Language:
english
File:
PDF, 197 KB
english, 2002
83

Electroless deposition of novel Ag–W thin films

Year:
2003
Language:
english
File:
PDF, 440 KB
english, 2003
84

Electroless deposition of Co(W) thin films

Year:
2003
Language:
english
File:
PDF, 574 KB
english, 2003
91

Stability of the electrodeposition process for CoPt alloy formation

Year:
2008
Language:
english
File:
PDF, 570 KB
english, 2008
100

Electroless processes for micro- and nanoelectronics

Year:
2003
Language:
english
File:
PDF, 482 KB
english, 2003