Volume 140-142

Materials Science Forum

Volume 140-142

1

High-Rate Sputtering with Electron Cyclotron Resonance and Electric-Mirror Excitation

Matsuoka, Masaya

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.57 MB

english, 1993

2

Effects of ECR-Plasma Excitation in GaAs MBE Growth

Shibata, T., Yamamoto, N., Kondo, Naoki, Nanishi, Y., Fujimoto, M.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 933 KB

english, 1993

3

Radical Kinetics in Processing Plasmas: Optical Diagnostics of Gas Phase and Surface Reactions

Booth, J.P., Hancock, G.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 867 KB

english, 1993

4

Growth Processes and Defect Densities in Hydrogenated Amorphous Silicon Alloys

Journal:

Materials Science Forum

Year:

1993

File:

PDF, 322 KB

1993

5

Plasma-Enhanced Chemical Vapour Deposition of Coatings in the System Ti-B-N

Laimer, J., Karner, H., Störi, H., Rödhammer, P.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.20 MB

english, 1993

6

Ion Energy Distributions and Sidewall Profiles in Reactive Ion Etching

May, P.W., Field, David P., Klemperer, D.F., Song, Y.P.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 595 KB

english, 1993

7

Negatively Charged Particles in Fluorocarbon RF Etch Plasmas: Density Measurements Using Microwave Resonance and the Photodetachment Effect

Haverlag, M., Kono, Akihiro, Kroesen, G.M.W., de Hoog, F.J.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.08 MB

english, 1993

8

Anisotropic ECR Plasma Etching with Low-Energy Ions

Tobinaga, Y., Miyano, T., Fujimoto, K., Fujito, M., Fujiwara, H.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 825 KB

english, 1993

9

Ion Assisted Thin Film Growth in Dual Microwave/Radio Frequency Plasmas

Martinu, L., Wertheimer, Michael R.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 849 KB

english, 1993

10

High Powered Pulsed Plasma Enhanced Deposition of Thin Film Semiconductor and Optical Materials

Llewellyn, I.P., Sheach, K.J.A., Heinecke, R.A.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 913 KB

english, 1993

11

Modified ECR Plasma Deposition

Nakamura, S., Akahori, Toshikazu, Nakayama, Satoshi

Journal:

Materials Science Forum

Year:

1993

File:

PDF, 515 KB

1993

12

Doped Glasses for ULSI-Technology: Integration of Molecular Engineering and Plasma-CVD

Treichel, H., v. Tomkewitsch, J., Spindler, O.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.02 MB

english, 1993

13

Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film

Ebihara, Kenji, Ikegami, Tomoaki

Journal:

Materials Science Forum

Year:

1993

File:

PDF, 516 KB

1993

14

Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

Shufflebotham, P., Weise, M., Pirkle, D., Denison, D.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 950 KB

english, 1993

15

Low Pressure and Low Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD

Wei, J., Kawarada, H., Hiraki, Akio

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 723 KB

english, 1993

16

Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 841 KB

english, 1993

17

Advanced Simulation of Dry Etching Process Technology

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 800 KB

english, 1993

18

Theoretical Characterization of Electron Energy Distribution Function in RF Plasmas

Capitelli, M., Capriati, G., Dilonardo, M., Gorse, C., Longo, S.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 589 KB

english, 1993

19

Bonding Configuration and Defects in Glow-Discharge Amorphous SiNx:H Films Deposited at 300°C and 500°C

Hasegawa, Shin, Amano, Y., He, L., Inokuma, T., Kurata, Y.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.24 MB

english, 1993

20

ECR Plasma Etching Technology for ULSI

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 821 KB

english, 1993

21

PECVD of Silicon Dioxide from TEOS/Oxygen Mixtures

Cale, T.S., Raupp, G.B.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.05 MB

english, 1993

22

Microwave Plasma Oxidation of Silicon

Kimura, Shigeru

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 891 KB

english, 1993

23

Plasma Etching of Patterned Tungsten

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.06 MB

english, 1993

24

Preparation and Properties of PECVD Silicon Nitride Films from SiH4 + NH3 and/or NF3 and SiF4+ NH3 Gas Mixtures

Gómez-Aleixandre, C., Sanchez, O., Albella, J.M.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 755 KB

english, 1993

25

Dissipative Structures and Nonequilibrium Phenomena in Plasma-Surface Interaction

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.05 MB

english, 1993

26

Practical Applications of In-Situ Plasma-Etching Diagnostic Techniques

Thomas, D.J., Southworth, P., Flowers, M.C., Dartnell, N.J., Greef, R., Liu, Y.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 999 KB

english, 1993

27

Analysis and Design of Plasma Chemical Reactions Based on Quantum Chemical Methods

Journal:

Materials Science Forum

Year:

1993

File:

PDF, 351 KB

1993

28

Source of Atomic Oxygen and its Application to Material Oxidation

Pointu, A.M., Touzeau, M., Guymont, O.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 449 KB

english, 1993

29

Thermal Plasma Chemical Vapor Deposition

Heberlein, J.V.R., Pfender, E.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.20 MB

english, 1993

30

Damage Assessment of Dry Etched III-V Semiconductors for Nanoelectronics

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.08 MB

english, 1993

31

Plasma Treatment of Polymers for Improved Adhesion Properties

Nowak, S., Küttel, O.M.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 970 KB

english, 1993

32

Evaluation of Substrate Degradation in Plasma Etch Processes Using Thermal Wave Analysis

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.11 MB

english, 1993

33

Laser-Aided Diagnostics of Processing Plasmas

Muraoka, K., Maeda, M.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.13 MB

english, 1993

34

Thermally Sprayed Coatings for Electrical and Electronic Applications

Pawlowski, L., Fauchais, Pierre

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.24 MB

english, 1993

35

Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology

Shokrani, M., Kapoor, V.J.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 786 KB

english, 1993

36

Study of Dry Development in Terms of Resist and Development Method

Abe, N., Motoyama, T.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 734 KB

english, 1993

37

DC Saddle-Field Plasma-Enhanced Vapour Deposition

Kruzelecky, R.V., Zukotynski, S.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.17 MB

english, 1993

38

TEOS-Based Oxides: Deposition Dependent Properties

Saran, M., Emesh, I.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 667 KB

english, 1993

39

Reactive Ion Beam Etching for Microcavity Surface Emitting Laser Fabrication: Technology and Damage Characterization

Matsutani, A., Tadokoro, T., Koyama, F., Iga, K.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 931 KB

english, 1993

40

Hydrogen Interaction with Disordered Silicon

Ashok, S., Srikanth, K.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 874 KB

english, 1993

41

Alkane Plasma Etching of Gallium Arsenide

Law, V.J., Tewordt, M., Ingram, S.G., Jones, G.A.C.

Journal:

Materials Science Forum

Year:

1993

Language:

english

File:

PDF, 1.35 MB

english, 1993

42

Sputter Deposition of Thin Films for High Mobility Poly-Si TFT Fabrication

Journal:

Materials Science Forum

Year:

1993

File:

PDF, 958 KB

1993

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