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Volume 83; Issue 2
Main
Microelectronic Engineering
Volume 83; Issue 2
Microelectronic Engineering
Volume 83; Issue 2
1
High-temperature wire sweep characteristics of semiconductor package for variable loop-height wirebonding technology
Huang-Kuang Kung
,
Bo-Wun Huang
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 289 KB
Your tags:
english, 2006
2
Fabrication of a low resistivity tantalum nitride thin film
Hong Shen
,
Ravi Ramanathan
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 318 KB
Your tags:
english, 2006
3
Thermal analysis for step and flash imprint lithography during UV curing process
Eui Kyoon Kim
,
C. Grant Willson
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 195 KB
Your tags:
english, 2006
4
Behavior of (1 1 1) grains during the thermal treatment of copper film studied in situ by electron back-scatter diffraction
Kabir-kumar Mirpuri
,
Horst Wendrock
,
Klaus Wetzig
,
Jerzy Szpunar
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 1.02 MB
Your tags:
english, 2006
5
Improvement of TEOS-chemical mechanical polishing performance by control of slurry temperature
Nam-Hoon Kim
,
Pil-Ju Ko
,
Yong-Jin Seo
,
Woo-Sun Lee
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 360 KB
Your tags:
english, 2006
6
Nitridation of hafnium oxide by reactive sputtering
K.Y. Tong
,
Emil V. Jelenkovic
,
W. Liu
,
J.Y. Dai
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 131 KB
Your tags:
english, 2006
7
Inkjet printed silver source/drain electrodes for low-cost polymer thin film transistors
Fengliang Xue
,
Zhengchun Liu
,
Yi Su
,
Kody Varahramyan
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 253 KB
Your tags:
english, 2006
8
Temperature effects of pad conditioning process on oxide CMP: Polishing pad, slurry characteristics, and surface reactions
Nam-Hoon Kim
,
Yong-Jin Seo
,
Woo-Sun Lee
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 649 KB
Your tags:
english, 2006
9
Effect of doping concentration on the grain boundary trap density and threshold voltage of polycrystalline SOI MOSFETs
R. Joseph Daniel
,
K.N. Bhat
,
Enakshi Bhattacharya
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 210 KB
Your tags:
english, 2006
10
Effects of active area and gate doping method on program threshold voltage in an EEPROM cell
Youn-Jang Kim
,
Yong-Cheol Jeong
,
Junghwan Lee
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 290 KB
Your tags:
english, 2006
11
Influence of temperature on the etching rate of SiO2 in CF4 + O2 plasma
R. Knizikevičius
,
V. Kopustinskas
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 137 KB
Your tags:
english, 2006
12
Enhanced breakdown voltage and reduced self-heating effects in thin-film lateral bipolar transistors: Design and analysis using 2-D simulation
Sukhendu Deb Roy
,
M. Jagadesh Kumar
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 554 KB
Your tags:
english, 2006
13
Extraction of the floating-gate capacitive couplings for drain turn-on estimation in discrete-trap memories
Christian Monzio Compagnoni
,
Daniele Ielmini
,
Alessandro S. Spinelli
,
Andrea L. Lacaita
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 169 KB
Your tags:
english, 2006
14
Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas
S.W. Na
,
M.H. Shin
,
Y.M. Chung
,
J.G. Han
,
S.H. Jeung
,
J.H. Boo
,
N.-E. Lee
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 566 KB
Your tags:
english, 2006
15
Integrity of copper–hafnium, hafnium nitride and multilayered amorphous-like hafnium nitride metallization under various thickness
Keng-Liang Ou
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 475 KB
Your tags:
english, 2006
16
Analysis of three-dimensional proximity effect in electron-beam lithography
S.-Y. Lee
,
Kasi Anbumony
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 314 KB
Your tags:
english, 2006
17
The improvement of thermal stability of nickel silicide by adding a thin Zr interlayer
Wei Huang
,
Li-Chun Zhang
,
Yu-Zhi Gao
,
Han-Yan Jin
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 183 KB
Your tags:
english, 2006
18
Optically variable micro-mirror arrays fabricated by graytone lithography
Patrick W. Leech
,
Robert A. Lee
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 595 KB
Your tags:
english, 2006
19
Effect of RuO2 electrode on laser-MBE prepared HfO2 gate dielectrics
Y.K. Lu
,
W. Zhu
,
X.F. Chen
,
R. Gopalkrishnan
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 125 KB
Your tags:
english, 2006
20
Effect of the spatial distribution of SiO2 thickness on the switching behavior of bistable MOS tunnel structures
S.E. Tyaginov
,
M.I. Vexler
,
A.F. Shulekin
,
I.V. Grekhov
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 319 KB
Your tags:
english, 2006
21
Analysis of HSG-7000 silsesquioxane-based low-k dielectric hot plate curing using Raman spectroscopy
C. Doux
,
K.C. Aw
,
M. Niewoudt
,
W. Gao
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 176 KB
Your tags:
english, 2006
22
CHF3–O2 reactive ion etching of 4H-SiC and the role of oxygen
J.H. Xia
,
Rusli
,
S.F. Choy
,
R. Gopalakrishan
,
C.C. Tin
,
S.F. Yoon
,
J. Ahn
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 290 KB
Your tags:
english, 2006
23
IFC: Editorial Board
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 31 KB
Your tags:
english, 2006
24
Impact of molecular weight of polymers and shear rate effects for nanoimprint lithography
H. Schulz
,
M. Wissen
,
N. Bogdanski
,
H.-C. Scheer
,
K. Mattes
,
Ch. Friedrich
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 1.14 MB
Your tags:
english, 2006
25
A new method to extract gate coupling ratio and oxide trapped charge in flash memory cell
Jermyn M.Z. Tseng
,
Thierry Pedron
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 158 KB
Your tags:
english, 2006
26
Simulation of nanoscale MOSFETs using modified drift-diffusion and hydrodynamic models and comparison with Monte Carlo results
R. Granzner
,
V.M. Polyakov
,
F. Schwierz
,
M. Kittler
,
R.J. Luyken
,
W. Rösner
,
M. Städele
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 186 KB
Your tags:
english, 2006
27
Study of ultrathin vanadium nitride as diffusion barrier for copper interconnect
Xin-Ping Qu
,
Mi Zhou
,
Tao Chen
,
Qi Xie
,
Guo-Ping Ru
,
Bing-Zong Li
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 259 KB
Your tags:
english, 2006
28
Dielectric spectroscopy studies on (PVP + PVA) polyblend film
Ch.V. Subba Reddy
,
Xia Han
,
Quan-Yao Zhu
,
Li-Qiang Mai
,
Wen Chen
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 359 KB
Your tags:
english, 2006
29
Fabrication of nano-sized resist patterns on flexible plastic film using thermal curing nano-imprint lithography
Heon Lee
,
Sunghoon Hong
,
Kiyeon Yang
,
Kyungwoo Choi
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 320 KB
Your tags:
english, 2006
30
Determination of swing curve “shifts” as a function of illumination conditions: Impact on the CD uniformity
Luigi Di Dio
Journal:
Microelectronic Engineering
Year:
2006
Language:
english
File:
PDF, 131 KB
Your tags:
english, 2006
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