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Volume 87; Issue 10
Main
Microelectronic Engineering
Volume 87; Issue 10
Microelectronic Engineering
Volume 87; Issue 10
1
Relationship between wafer fracture reduction and controlling during the edge manufacturing process
Po-Ying Chen
,
Ming-Hsing Tsai
,
Wen-Kuan Yeh
,
Ming-Haw Jing
,
Yukon Chang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 896 KB
Your tags:
english, 2010
2
Selection of rare earth silicates for highly scaled gate dielectrics
K. Kakushima
,
K. Okamoto
,
T. Koyanagi
,
M. Kouda
,
K. Tachi
,
T. Kawanago
,
J. Song
,
P. Ahmet
,
K. Tsutsui
,
N. Sugii
,
T. Hattori
,
H. Iwai
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 306 KB
Your tags:
english, 2010
3
Interface control of conventional n-type silicon/metal by n-channel organic semiconductor
Fahrettin Yakuphanoglu
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 388 KB
Your tags:
english, 2010
4
A printing technology combining screen-printing with a wet-etching process for the gate electrodes of organic thin film transistors on a plastic substrate
Mi-Young Lee
,
Myung-Won Lee
,
Ji-Eun Park
,
Jong-Seung Park
,
Chung-Kun Song
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 583 KB
Your tags:
english, 2010
5
Thermally-aware modeling and performance evaluation for single-walled carbon nanotube-based interconnects for future high performance integrated circuits
Amir Hosseini
,
Vahid Shabro
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 578 KB
Your tags:
english, 2010
6
Effect of a surface pre-treatment on graphene growth using a SiC substrate
Jun-Ho Seo
,
Byung-Jin Kang
,
Jeong Hun Mun
,
Sung-Kyu Lim
,
Byung Jin Cho
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 853 KB
Your tags:
english, 2010
7
Vector two-tone measurements for validation of non-linear microwave FinFET model
Giovanni Crupi
,
Gustavo Avolio
,
Dominique M.M.-P. Schreurs
,
Guillaume Pailloncy
,
Alina Caddemi
,
Bart Nauwelaers
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 556 KB
Your tags:
english, 2010
8
Molecular dynamics study on compressive strength of monocrystalline, nanocrystalline and amorphous Si mold for nanoimprint lithography
Kazuhiro Tada
,
Shuhei Horimoto
,
Yoshihisa Kimoto
,
Masaaki Yasuda
,
Hiroaki Kawata
,
Yoshihiko Hirai
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 694 KB
Your tags:
english, 2010
9
Ruthenium oxide metal nanocrystal capacitors with high-κ dielectric tunneling barriers for nanoscale nonvolatile memory device applications
Atanu Das
,
S. Maikap
,
C.-H. Lin
,
P.-J. Tzeng
,
T.-C. Tien
,
T.-Y. Wang
,
L.-B. Chang
,
J.-R. Yang
,
M.-J. Tsai
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 770 KB
Your tags:
english, 2010
10
Structure and property of magnetron sputtered ternary cobalt–nickel silicide films
Zhou Xia
,
Shihua Huang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 502 KB
Your tags:
english, 2010
11
CMOS optoelectronic components for clock distribution
Robert Pownall
,
Charles Thangaraj
,
Guangwei Yuan
,
Phil Nikkel
,
Tom W. Chen
,
Kevin L. Lear
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 619 KB
Your tags:
english, 2010
12
Characterization and analysis of two-dimensional GaAs-based photonic crystal nanocavities at room temperature
Y.S. Peng
,
B. Xu
,
X.L. Ye
,
J.B. Niu
,
R. Jia
,
Z.G. Wang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 303 KB
Your tags:
english, 2010
13
Stress analysis of 3-dimensional IC package as function of structural design parameters
Leila J. Ladani
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 1.00 MB
Your tags:
english, 2010
14
Nanoimprint lithography fabrication of waveguide-integrated optical gratings with inexpensive stamps
Sonia Grego
,
Alan Huffman
,
Matthew Lueck
,
Brian R. Stoner
,
John Lannon
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 493 KB
Your tags:
english, 2010
15
Flexible embedded circuitry: A novel process for high density, cost effective electronics
Jeroen van den Brand
,
Roel Kusters
,
Marco Barink
,
Andreas Dietzel
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 1.63 MB
Your tags:
english, 2010
16
Study of polycrystalline-Si thin-film transistors with different channel layer thickness at low bias voltage
Miin-Horng Juang
,
C.W. Chang
,
J.L. Wang
,
D.C. Shye
,
C.C. Hwang
,
S.L. Jang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 898 KB
Your tags:
english, 2010
17
Electrodepositing amorphous Ni-W alloys for MEMS
Hong Wang
,
Rui Liu
,
FengJi Cheng
,
Ying Cao
,
GuiFu Ding
,
XiaoLin Zhao
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 860 KB
Your tags:
english, 2010
18
Texture of atomic layer deposited ruthenium
J. Musschoot
,
Q. Xie
,
D. Deduytsche
,
K. De Keyser
,
D. Longrie
,
J. Haemers
,
S. Van den Berghe
,
R.L. Van Meirhaeghe
,
J. D’Haen
,
C. Detavernier
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 502 KB
Your tags:
english, 2010
19
A single layer hydrogen silsesquioxane (HSQ) based lift-off process for germanium and platinum
Vikram Passi
,
Aurelie Lecestre
,
Christophe Krzeminski
,
Guilhem Larrieu
,
Emmanuel Dubois
,
Jean-Pierre Raskin
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 1.74 MB
Your tags:
english, 2010
20
Damage predictions in a chip resistor solder joint on flexible circuit board
M.J. Rizvi
,
C. Bailey
,
H. Lu
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 747 KB
Your tags:
english, 2010
21
Simulation of TaNx deposition by Reactive PVD
H. Wolf
,
R. Streiter
,
M. Friedemann
,
P. Belsky
,
O. Bakaeva
,
T. Letz
,
T. Gessner
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 585 KB
Your tags:
english, 2010
22
Fabrication of surface plasmon waveguides and integrated components on Cytop
Richard Daviau
,
Asad Khan
,
Ewa Lisicka-Skrzek
,
R. Niall Tait
,
Pierre Berini
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 942 KB
Your tags:
english, 2010
23
Application of VUV irradiation to promote the wet etch resistance of PSZ-SOG film inside the gap
Chia-Ming Chen
,
Ming-Hsin Yeh
,
Hung-Ju Chien
,
Jhen-Jhih Fan
,
Chin-Rung Yan
,
Hiroshi Matsuo
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 786 KB
Your tags:
english, 2010
24
Distributed transmission line phase shifter using parallel-plate ferroelectric thin film varactors
Su Sheng
,
C.K. Ong
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 646 KB
Your tags:
english, 2010
25
Characterization of reactive ion etching of benzocyclobutente in SF6/O2 plasmas
Qianwen Chen
,
Zheyao Wang
,
Zhiming Tan
,
Litian Liu
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 500 KB
Your tags:
english, 2010
26
Effect of series resistance on the electrical characteristics and interface state energy distributions of Sn/p-Si (MS) Schottky diodes
Şükrü Karataş
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 385 KB
Your tags:
english, 2010
27
Fabrication of periodic square arrays by angle-resolved nanosphere lithography
Kwang Hong Lee
,
Qiu Ling Chen
,
Chan Hoe Yip
,
Qingfeng Yan
,
Chee Cheong Wong
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 584 KB
Your tags:
english, 2010
28
A novel fabrication of polymer film with tapered sub-wavelength structures for anti-reflection
Jing-Tang Wu
,
Sen-Yeu Yang
,
Wei-Chih Deng
,
Wei-Yi Chang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 619 KB
Your tags:
english, 2010
29
Implications of fin width scaling on variability and reliability of high-k metal gate FinFETs
S. Chabukswar
,
D. Maji
,
C.R. Manoj
,
K.G. Anil
,
V. Ramgopal Rao
,
F. Crupi
,
P. Magnone
,
G. Giusi
,
C. Pace
,
N. Collaert
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 716 KB
Your tags:
english, 2010
30
Temperature treatment of nano-scaled barium titanate filler to improve the dielectric properties of high-k polymer based composites
Benedikt Schumacher
,
Holger Geßwein
,
Jürgen Haußelt
,
Thomas Hanemann
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 760 KB
Your tags:
english, 2010
31
Characterization of developing source/drain current of carbon nanotube field-effect transistors with n-doping by polyethylene imine
Shiang-Kuo Chang-Jian
,
Jeng-Rong Ho
,
J.-W. John Cheng
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 745 KB
Your tags:
english, 2010
32
Chemo-rheological characteristics of a self-assembling anisotropic conductive adhesive system containing a low-melting point solder
Ji-Won Baek
,
Keon-Soo Jang
,
Yong-Sung Eom
,
Jong-Tae Moon
,
Jong-Min Kim
,
Jae-Do Nam
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 728 KB
Your tags:
english, 2010
33
Inkjetting dielectric layer for electronic applications
Kimmo Kaija
,
Ville Pekkanen
,
Matti Mäntysalo
,
Santtu Koskinen
,
Juha Niittynen
,
Eerik Halonen
,
Pauliina Mansikkamäki
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 914 KB
Your tags:
english, 2010
34
Double channel field effect transistors (DCT) and demonstration of static single transistor bit cell
Frank Wirbeleit
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 367 KB
Your tags:
english, 2010
35
Frequency and temperature dependence of the dielectric and AC electrical conductivity in (Ni/Au)/AlGaN/AlN/GaN heterostructures
Engin Arslan
,
Yasemin Şafak
,
İlke Taşçıoğlu
,
Habibe Uslu
,
Ekmel Özbay
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 434 KB
Your tags:
english, 2010
36
Influence of the channel layer thickness on electrical properties of indium zinc oxide thin-film transistor
Ai Hua Chen
,
Hong Tao Cao
,
Hai Zhong Zhang
,
Ling Yan Liang
,
Zhi Min Liu
,
Zheng Yu
,
Qing Wan
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 751 KB
Your tags:
english, 2010
37
Effects of nitrogen incorporation by plasma immersion ion implantation on electrical characteristics of high-k gated MOS devices
Chung-Hao Fu
,
Kuei-Shu Chang-Liao
,
Tien-Ko Wang
,
W.F. Tsai
,
C.F. Ai
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 515 KB
Your tags:
english, 2010
38
Erratum to “Morphological influence of the beam overlap in focused ion beam induced deposition using raster scan” [Microelectron. Eng. 87 (5–8) (2010) 972–976]
Chung-Soo Kim
,
Hyung-Jung Kim
,
Sung-Hoon Ahn
,
Dong-Young Jang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 88 KB
Your tags:
english, 2010
39
Inside Front Cover - Editorial Board
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 28 KB
Your tags:
english, 2010
40
Contents continued
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 26 KB
Your tags:
english, 2010
41
Publisher’s note
Journal:
Microelectronic Engineering
Year:
2010
File:
PDF, 77 KB
Your tags:
2010
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