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Volume 88; Issue 3
Main
Microelectronic Engineering
Volume 88; Issue 3
Microelectronic Engineering
Volume 88; Issue 3
1
Back channel etch chemistry of advanced a-Si:H TFTs
A. Kuo
,
T.K. Won
,
J. Kanicki
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 659 KB
Your tags:
english, 2011
2
Preliminary characterization of a metal–gas-semiconductor field-effect transistor (MGSFET) proposed
Yoichi Ashida
,
Kiyoshi Okuyama
,
Hideo Sunami
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 1.16 MB
Your tags:
english, 2011
3
Development of a dual-axis micromachined convective accelerometer with an effective heater geometry
Usung Park
,
Byoungkyoo Park
,
Il-Kwon Moon
,
Dongsik Kim
,
Joonwon Kim
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 1.55 MB
Your tags:
english, 2011
4
Electrical characteristics and inhomogeneous barrier analysis of Al/NPB/p-Si Schottky diodes
Wen-Chang Huang
,
Chien-Chou Chen
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 740 KB
Your tags:
english, 2011
5
High volume nanoimprint lithography on III/V substrates: Imprint fidelity and stamp lifetime
Torbjörn Eriksson
,
Shoko Yamada
,
Prasanna Venkatesh Krishnan
,
Sankar Ramasamy
,
Babak Heidari
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 1.89 MB
Your tags:
english, 2011
6
DNA analysis by single molecule stretching in nanofluidic biochips
E. Abad
,
A. Juarros
,
A. Retolaza
,
S. Merino
,
R. Marie
,
A. Kristensen
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 709 KB
Your tags:
english, 2011
7
Low-loss CaxBa1−xNb2O6 ridge waveguide for electro-optic devices
Ebrahim Mortazy
,
Irina Stateikina
,
Amirhossein Tehranchi
,
Sébastien Delprat
,
Mohamed Chaker
,
Ke Wu
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 493 KB
Your tags:
english, 2011
8
Deep reactive ion etching of thermally co-evaporated Te–Ge films for IR integrated optics components
Caroline Vigreux
,
Séverine De Sousa
,
Véronique Foucan
,
Eléonore Barthélémy
,
Annie Pradel
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 928 KB
Your tags:
english, 2011
9
Impact of SOI thickness on device performance and gate oxide reliability of Ni fully silicide metal-gate strained SOI MOSFET
Cheng-Li Lin
,
Wen-Kuan Yeh
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 1.16 MB
Your tags:
english, 2011
10
Analysis of the effective reflectance of digital micromirror devices and process parameters for maskless photolithography
Hoonchul Ryoo
,
Dong Won Kang
,
Jae W. Hahn
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 567 KB
Your tags:
english, 2011
11
Imprint lithography enabling ultra-low loss coaxial interconnects
Venmathy Rajarathinam
,
Nathan Fritz
,
Sue Ann Bidstrup Allen
,
Paul A. Kohl
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 790 KB
Your tags:
english, 2011
12
RF-MEMS load sensors with enhanced Q-factor and sensitivity in a suspended architecture
Rohat Melik
,
Emre Unal
,
Nihan Kosku Perkgoz
,
Christian Puttlitz
,
Hilmi Volkan Demir
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 1.43 MB
Your tags:
english, 2011
13
High performance n+/p and p+/n germanium diodes at low-temperature activation annealing
V. Ioannou-Sougleridis
,
S.F. Galata
,
E. Golias
,
T. Speliotis
,
A. Dimoulas
,
D. Giubertoni
,
S. Gennaro
,
M. Barozzi
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 1.56 MB
Your tags:
english, 2011
14
Schottky barrier SOI-MOSFETs with high-k La2O3/ZrO2 gate dielectrics
C. Henkel
,
S. Abermann
,
O. Bethge
,
G. Pozzovivo
,
P. Klang
,
M. Stöger-Pollach
,
E. Bertagnolli
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 725 KB
Your tags:
english, 2011
15
Comparison of AuNi5 films deposited by laser ablation and sputtering for RF MEMS switch contacts
Noha Sameh Farghal
,
Amr Shaarawi
,
Philippe Soussan
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 1013 KB
Your tags:
english, 2011
16
Improvement of interface quality by post-annealing on silicon nanowire MOSFET devices with multi-wire channels
Seonghyun Kim
,
Minseok Jo
,
Seungjae Jung
,
Hyejung Choi
,
Joonmyoung Lee
,
Man Chang
,
Chunhum Cho
,
Hyunsang Hwang
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 534 KB
Your tags:
english, 2011
17
Influence of post deposition annealing on Y2O3-gated GaAs MOS capacitors and their reliability issues
P.S. Das
,
A. Biswas
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 545 KB
Your tags:
english, 2011
18
Hf-doped Ta2O5 stacks under constant voltage stress
I. Manić
,
E. Atanassova
,
N. Stojadinović
,
D. Spassov
,
A. Paskaleva
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 924 KB
Your tags:
english, 2011
19
CaF2 surface passivation of lead selenide grown on BaF2
Shaibal Mukherjee
,
D. Li
,
G. Bi
,
J. Ma
,
S.L. Elizondo
,
A. Gautam
,
Z. Shi
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 424 KB
Your tags:
english, 2011
20
Low-energy pulsed laser treatment of silver nanoparticles for interconnects fabrication by ink-jet method
R. Lesyuk
,
W. Jillek
,
Y. Bobitski
,
B. Kotlyarchuk
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 708 KB
Your tags:
english, 2011
21
Inside Front Cover - Editorial Board
Journal:
Microelectronic Engineering
Year:
2011
Language:
english
File:
PDF, 26 KB
Your tags:
english, 2011
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