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Volume 66; Issue 3-4
Main
Vacuum
Volume 66; Issue 3-4
Vacuum
Volume 66; Issue 3-4
1
Effective electromechanical coupling coefficient (kt2) for fundamental mode of thickness extensional mode thin film bulk acoustic wave resonator fabricated by ZnO thin film
Masaki Takeuchi
,
Hajime Yamada
,
Yukio Yoshino
,
Takahiro Makino
,
Seiichi Arai
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 150 KB
Your tags:
english, 2002
2
Control of temperature coefficient of frequency in zinc oxide thin film bulk acoustic wave resonators at various frequency ranges
Y Yoshino
,
M Takeuchi
,
K Inoue
,
T Makino
,
S Arai
,
T Hata
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 248 KB
Your tags:
english, 2002
3
Characterization of RF-sputtered self-polarized PZT thin films for IR sensor arrays
G Suchaneck
,
W.-M Lin
,
R Koehler
,
T Sandner
,
G Gerlach
,
R Krawietz
,
W Pompe
,
A Deineka
,
L Jastrabik
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 136 KB
Your tags:
english, 2002
4
Etching characteristics of magnetic materials (Co, Fe, Ni) using CO/NH3 gas plasma for hardening mask etching
N Matsui
,
K Mashimo
,
A Egami
,
A Konishi
,
O Okada
,
T Tsukada
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 298 KB
Your tags:
english, 2002
5
ECR-plasma parameters and properties of thin DLC films
H. Inaba
,
S. Fujimaki
,
K. Furusawa
,
S. Todoroki
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 257 KB
Your tags:
english, 2002
6
Multilayer Fresnel zone plate for high-energy X-ray by DC sputtering deposition
Shigeharu Tamura
,
Masato Yasumoto
,
Toshiyuki Mihara
,
Nagao Kamijo
,
Yoshio Suzuki
,
Mitsuhiro Awaji
,
Akihisa Takeuchi
,
Hidekazu Takano
,
Katsumi Handa
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 145 KB
Your tags:
english, 2002
7
Optical and electrical properties of pure Ag and Ag-based alloy thin films prepared by RF magnetron sputtering
T Suzuki
,
Y Abe
,
M Kawamura
,
K Sasaki
,
T Shouzu
,
K Kawamata
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 173 KB
Your tags:
english, 2002
8
Amorphous ZnO–In2O3 transparent conductive films by simultaneous sputtering method of ZnO and In2O3 targets
K. Tominaga
,
T. Takao
,
A. Fukushima
,
T. Moriga
,
I. Nakabayashi
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 220 KB
Your tags:
english, 2002
9
Film properties of ZnO:Al films deposited by co-sputtering of ZnO:Al and contaminated Zn targets with Co, Mn and Cr
K Tominaga
,
T Takao
,
A Fukushima
,
T Moriga
,
I Nakabayashi
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 206 KB
Your tags:
english, 2002
10
Relationship between composition and work function of gold–samarium alloy thin films
N Kiwa
,
Y Gotoh
,
H Tsuji
,
J Ishikawa
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 108 KB
Your tags:
english, 2002
11
Characterization of solid oxide fuel cell device having a three-layer film structure grown by RF magnetron sputtering
A Nagata
,
H Okayama
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 431 KB
Your tags:
english, 2002
12
In situ monitoring of plasma parameters in the afterglow region of ECR sputtering system for tribological coatings
C.P Lungu
,
K Iwasaki
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 251 KB
Your tags:
english, 2002
13
Surface molecular dynamics of Si/SiO2 reactive ion etching
S. Hamaguchi
,
H. Ohta
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 208 KB
Your tags:
english, 2002
14
Large area electron-beam-excited plasma of meter size for industrial applications
H Homyara
,
S Ahmad
,
S Ikezawa
,
K Baba
,
T Yoshioka
,
Y Ninomiya
,
K Nakamura
,
T Famakinwa
,
H Oda
,
K Yoshimura
,
H Taoda
,
S Fujii
,
T Hara
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 193 KB
Your tags:
english, 2002
15
Numerical investigation of the production mechanism of a low-temperature electron cyclotron resonance plasma
Hiroshi Muta
,
Naho Itagaki
,
Yoshinobu Kawai
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 120 KB
Your tags:
english, 2002
16
Numerical simulation of electron orbits in a magnetized plasma excited by a surface wave
Y. Yoshida
,
Y. Okazaki
,
K. Sakiyama
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 293 KB
Your tags:
english, 2002
17
Fine particles in dusty plasmas
Lin I
,
Ying-Ju Lai
,
Wen-Tau Juan
,
Ming-Hua Chang
,
Hong-Yu Chue
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 274 KB
Your tags:
english, 2002
18
What is the difference between catalytic CVD and plasma-enhanced CVD? Gas-phase kinetics and film properties
Atsushi Masuda
,
Akira Izumi
,
Hironobu Umemoto
,
Hideki Matsumura
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 109 KB
Your tags:
english, 2002
19
Plasma-enhanced chemical vapor deposition of silicon nitride below 250°C
Yue Kuo
,
Hyun Ho Lee
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 114 KB
Your tags:
english, 2002
20
Sum-frequency vibrational spectroscopy of oxygen-ion and oxygen-radical treated poly(ethylene terephthalate) and oxide/poly(ethylene terephthalate) interface
Takayuki Miyamae
,
Yasumi Yamada
,
Haruo Uyama
,
Hisakazu Nozoye
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 152 KB
Your tags:
english, 2002
21
Preparation of silicon oxide with bubble layer by helium plasma irradiation followed by oxidation
T Hino
,
S Miho
,
Y Yamauchi
,
Y Hirohata
,
M Nishikawa
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 166 KB
Your tags:
english, 2002
22
High-quality SiO2 film deposition using active reaction by oxygen radical
A Kumagai
,
K Ishibashi
,
Ge Xu
,
M Tanaka
,
H Nogami
,
O Okada
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 114 KB
Your tags:
english, 2002
23
Production of low-electron-temperature electron cyclotron resonance plasma with large area using 915 MHz microwave
N Itagaki
,
S Kawakami
,
N Ishii
,
Y Kawai
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 204 KB
Your tags:
english, 2002
24
Ion temperature and fluctuation in a large-diameter electron–cyclotron-resonance plasma
Mayuko Koga
,
Takenori Yoshizawa
,
Yoko Ueda
,
Akira Yonesu
,
Yoshinobu Kawai
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 171 KB
Your tags:
english, 2002
25
Deposition of carbon films by plasma-based ion implantation using glow discharge plasma ignited by high voltage pulses applied to substrates
H Shinno
,
K Ishioka
,
M Kitajima
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 126 KB
Your tags:
english, 2002
26
Characterization of low temperature growth carbon nanofibers synthesized by using plasma enhanced chemical vapor deposition
T. Ikuno
,
J.-T. Ryu
,
T. Oyama
,
S. Ohkura
,
Y.-G. Baek
,
S. Honda
,
M. Katayama
,
T. Hirao
,
K. Oura
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 251 KB
Your tags:
english, 2002
27
Low temperature deposition of TiO2 films with high refractive indices by oxygen-radical beam-assisted evaporation combined with ion beam
Yasumi Yamada
,
Haruo Uyama
,
Takanori Murata
,
Hisakazu Nozoye
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 196 KB
Your tags:
english, 2002
28
Gas barrier properties of silicon oxide films prepared by plasma-enhanced CVD using tetramethoxysilane
K Teshima
,
Y Inoue
,
H Sugimura
,
O Takai
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 399 KB
Your tags:
english, 2002
29
Production of a large-area argon microwave plasma by a ring slot antenna
Kouhei Shimatani
,
Tetsu Okamoto
,
Yukio Okamoto
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 128 KB
Your tags:
english, 2002
30
Effect of tin oxide dispersion on nodule formation in ITO sputtering
K Nakashima
,
Y Kumahara
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 290 KB
Your tags:
english, 2002
31
CrN films deposited by rf reactive sputtering using a plasma emission monitoring control
Shozo Inoue
,
Futami Okada
,
Keiji Koterazawa
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 186 KB
Your tags:
english, 2002
32
GaN films deposited by planar magnetron sputtering
T Kikuma
,
K Tominaga
,
K Furutani
,
Kazuya Kusaka
,
Takao Hanabusa
,
Takashi Mukai
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 148 KB
Your tags:
english, 2002
33
Study of electron field emission and structural properties of nanostructured carbon thin films deposited by hot-filament-assisted reactive sputtering using methane gas
K.-Y Lee
,
K Fujimoto
,
S Ohkura
,
S Honda
,
M Katayama
,
T Hirao
,
K Oura
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 192 KB
Your tags:
english, 2002
34
Preparation of boron–carbon–nitrogen thin films by magnetron sputtering
H Yokomichi
,
T Funakawa
,
A Masuda
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 166 KB
Your tags:
english, 2002
35
Characteristics of Fe–N films deposited by a reactive ion beam sputtering using adsorptive and ionized nitrogen
S Iwatsubo
,
M Naoe
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 195 KB
Your tags:
english, 2002
36
Effects of ion flux on the properties of dc magnetron-sputtered stainless steel films
Shozo Inoue
,
Toshiaki Saeki
,
Hitoshi Uchida
,
Keiji Koterazawa
,
Mikio Iwasa
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 151 KB
Your tags:
english, 2002
37
Preparation of TiO2 thin films by sputtering applying electron cyclotron resonance plasma produced in arched magnetic mirrors
E Honbo
,
M Miyata
,
T Ueno
,
Y Kato
,
S Ishii
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 99 KB
Your tags:
english, 2002
38
Effects of oxygen gettering and target mode change in the formation process of reactively RF sputtered WOx thin films
A Yamamoto
,
Y Abe
,
M Kawamura
,
K Sasaki
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 181 KB
Your tags:
english, 2002
39
Development of a cylindrical DC magnetron sputtering apparatus assisted by microwave plasma
Akira Yonesu
,
Hiroki Takemoto
,
Makoto Hirata
,
Yasumasa Yamashiro
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 186 KB
Your tags:
english, 2002
40
Energetic oxygen ions in ZrO2 deposition by reactive sputtering of Zr
Kikuo Tominaga
,
Takuya Kikuma
,
Kazuya Kusaka
,
Takao Hanabusa
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 149 KB
Your tags:
english, 2002
41
Electrical and mechanical properties of SnO2:Nb films for touch screens
N Kikuchi
,
E Kusano
,
E Kishio
,
A Kinbara
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 194 KB
Your tags:
english, 2002
42
Crystallinity and stoichiometry of InNx films deposited by reactive dc magnetron sputtering
P.K Song
,
D Sato
,
M Kon
,
Y Shigesato
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 182 KB
Your tags:
english, 2002
43
Water-repellency of a-C:H films deposited by rf plasma-enhanced CVD
Je-Deok Kim
,
Hiroyuki Sugimura
,
Osamu Takai
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 158 KB
Your tags:
english, 2002
44
Influence of surface morphology on the tribological properties of silver–graphite overlays
C.P Lungu
,
K Iwasaki
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 273 KB
Your tags:
english, 2002
45
Characterization of CNx films prepared by reactive magnetron sputtering
Yuki Togashi
,
Yuko Hirohata
,
Tomoaki Hino
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 178 KB
Your tags:
english, 2002
46
Dependence of dielectric and ferroelectric behaviors on growth orientation in epitaxial BaTiO3/SrTiO3 superlattices
O Nakagawara
,
T Shimuta
,
T Makino
,
S Arai
,
H Tabata
,
T Kawai
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 124 KB
Your tags:
english, 2002
47
Limited reaction growth of YSZ (ZrO2:Y2O3) thin films for gate insulator
Kimihiro Sasaki
,
Tatsuhiro Hasu
,
Kenji Sasaki
,
Tomonobu Hata
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 310 KB
Your tags:
english, 2002
48
Dependence on substrate temperature of the film structure of μc-Si:H prepared by RF magnetron sputtering
J. Kondo
,
A. Tabata
,
T. Kawamura
,
T. Mizutani
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 170 KB
Your tags:
english, 2002
49
Blue shift of photoluminescence spectrum of porous silicon by helium ion irradiation
Y Yamauchi
,
T Sakurai
,
Y Hirohata
,
T Hino
,
M Nishikawa
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 146 KB
Your tags:
english, 2002
50
Frontier of transparent conductive oxide thin films
H Hosono
,
H Ohta
,
M Orita
,
K Ueda
,
M Hirano
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 403 KB
Your tags:
english, 2002
51
Ferroelectric properties of epitaxial Bi4Ti3O12 films deposited on epitaxial (1 0 0) Ir and (1 0 0) Pt films on Si by sputtering
S Horita
,
S Sasaki
,
O Kitagawa
,
S Horii
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 218 KB
Your tags:
english, 2002
52
The structure of TiN films deposited by arc ion plating
Tatsuya Matsue
,
Takao Hanabusa
,
Yasukazu Ikeuchi
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 157 KB
Your tags:
english, 2002
53
Effect of sputtering gas pressure and nitrogen concentration on crystal orientation and residual stress in sputtered AlN films
K Kusaka
,
D Taniguchi
,
T Hanabusa
,
K Tominaga
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 154 KB
Your tags:
english, 2002
54
Structural and electrical properties of Cu films deposited on glass by DC magnetron sputtering
Hong Qiu
,
Fengping Wang
,
Ping Wu
,
Liqing Pan
,
Yue Tian
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 201 KB
Your tags:
english, 2002
55
Effects of argon and hydrogen plasmas on the surface of silicon
I Umezu
,
K Kohno
,
K Aoki
,
Y Kohama
,
A Sugimura
,
M Inada
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 81 KB
Your tags:
english, 2002
56
Fabrication of Silicon/Germanium superlattice by ion-beam sputtering
K Sasaki
,
Y Takahashi
,
T Ikeda
,
T Hata
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 362 KB
Your tags:
english, 2002
57
Volume Contents for Volume 66
Journal:
Vacuum
Year:
2002
Language:
english
File:
PDF, 117 KB
Your tags:
english, 2002
58
Author Index for Volume 66
Journal:
Vacuum
Year:
2002
File:
PDF, 48 KB
Your tags:
2002
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