Volume 66; Issue 3-4

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Vacuum
Volume 66; Issue 3-4

Vacuum

Volume 66; Issue 3-4

1

Effective electromechanical coupling coefficient (kt2) for fundamental mode of thickness extensional mode thin film bulk acoustic wave resonator fabricated by ZnO thin film

Masaki Takeuchi, Hajime Yamada, Yukio Yoshino, Takahiro Makino, Seiichi Arai

Journal:

Year:

2002

Language:

english

File:

PDF, 150 KB

english, 2002

2

Control of temperature coefficient of frequency in zinc oxide thin film bulk acoustic wave resonators at various frequency ranges

Y Yoshino, M Takeuchi, K Inoue, T Makino, S Arai, T Hata

Journal:

Year:

2002

Language:

english

File:

PDF, 248 KB

english, 2002

3

Characterization of RF-sputtered self-polarized PZT thin films for IR sensor arrays

G Suchaneck, W.-M Lin, R Koehler, T Sandner, G Gerlach, R Krawietz, W Pompe, A Deineka, L Jastrabik

Journal:

Year:

2002

Language:

english

File:

PDF, 136 KB

english, 2002

4

Etching characteristics of magnetic materials (Co, Fe, Ni) using CO/NH3 gas plasma for hardening mask etching

N Matsui, K Mashimo, A Egami, A Konishi, O Okada, T Tsukada

Journal:

Year:

2002

Language:

english

File:

PDF, 298 KB

english, 2002

5

ECR-plasma parameters and properties of thin DLC films

H. Inaba, S. Fujimaki, K. Furusawa, S. Todoroki

Journal:

Year:

2002

Language:

english

File:

PDF, 257 KB

english, 2002

6

Multilayer Fresnel zone plate for high-energy X-ray by DC sputtering deposition

Shigeharu Tamura, Masato Yasumoto, Toshiyuki Mihara, Nagao Kamijo, Yoshio Suzuki, Mitsuhiro Awaji, Akihisa Takeuchi, Hidekazu Takano, Katsumi Handa

Journal:

Year:

2002

Language:

english

File:

PDF, 145 KB

english, 2002

7

Optical and electrical properties of pure Ag and Ag-based alloy thin films prepared by RF magnetron sputtering

T Suzuki, Y Abe, M Kawamura, K Sasaki, T Shouzu, K Kawamata

Journal:

Year:

2002

Language:

english

File:

PDF, 173 KB

english, 2002

8

Amorphous ZnO–In2O3 transparent conductive films by simultaneous sputtering method of ZnO and In2O3 targets

K. Tominaga, T. Takao, A. Fukushima, T. Moriga, I. Nakabayashi

Journal:

Year:

2002

Language:

english

File:

PDF, 220 KB

english, 2002

9

Film properties of ZnO:Al films deposited by co-sputtering of ZnO:Al and contaminated Zn targets with Co, Mn and Cr

K Tominaga, T Takao, A Fukushima, T Moriga, I Nakabayashi

Journal:

Year:

2002

Language:

english

File:

PDF, 206 KB

english, 2002

10

Relationship between composition and work function of gold–samarium alloy thin films

N Kiwa, Y Gotoh, H Tsuji, J Ishikawa

Journal:

Year:

2002

Language:

english

File:

PDF, 108 KB

english, 2002

11

Characterization of solid oxide fuel cell device having a three-layer film structure grown by RF magnetron sputtering

A Nagata, H Okayama

Journal:

Year:

2002

Language:

english

File:

PDF, 431 KB

english, 2002

12

In situ monitoring of plasma parameters in the afterglow region of ECR sputtering system for tribological coatings

C.P Lungu, K Iwasaki

Journal:

Year:

2002

Language:

english

File:

PDF, 251 KB

english, 2002

13

Surface molecular dynamics of Si/SiO2 reactive ion etching

S. Hamaguchi, H. Ohta

Journal:

Year:

2002

Language:

english

File:

PDF, 208 KB

english, 2002

14

Large area electron-beam-excited plasma of meter size for industrial applications

H Homyara, S Ahmad, S Ikezawa, K Baba, T Yoshioka, Y Ninomiya, K Nakamura, T Famakinwa, H Oda, K Yoshimura, H Taoda, S Fujii, T Hara

Journal:

Year:

2002

Language:

english

File:

PDF, 193 KB

english, 2002

15

Numerical investigation of the production mechanism of a low-temperature electron cyclotron resonance plasma

Hiroshi Muta, Naho Itagaki, Yoshinobu Kawai

Journal:

Year:

2002

Language:

english

File:

PDF, 120 KB

english, 2002

16

Numerical simulation of electron orbits in a magnetized plasma excited by a surface wave

Y. Yoshida, Y. Okazaki, K. Sakiyama

Journal:

Year:

2002

Language:

english

File:

PDF, 293 KB

english, 2002

17

Fine particles in dusty plasmas

Lin I, Ying-Ju Lai, Wen-Tau Juan, Ming-Hua Chang, Hong-Yu Chue

Journal:

Year:

2002

Language:

english

File:

PDF, 274 KB

english, 2002

18

What is the difference between catalytic CVD and plasma-enhanced CVD? Gas-phase kinetics and film properties

Atsushi Masuda, Akira Izumi, Hironobu Umemoto, Hideki Matsumura

Journal:

Year:

2002

Language:

english

File:

PDF, 109 KB

english, 2002

19

Plasma-enhanced chemical vapor deposition of silicon nitride below 250°C

Yue Kuo, Hyun Ho Lee

Journal:

Year:

2002

Language:

english

File:

PDF, 114 KB

english, 2002

20

Sum-frequency vibrational spectroscopy of oxygen-ion and oxygen-radical treated poly(ethylene terephthalate) and oxide/poly(ethylene terephthalate) interface

Takayuki Miyamae, Yasumi Yamada, Haruo Uyama, Hisakazu Nozoye

Journal:

Year:

2002

Language:

english

File:

PDF, 152 KB

english, 2002

21

Preparation of silicon oxide with bubble layer by helium plasma irradiation followed by oxidation

T Hino, S Miho, Y Yamauchi, Y Hirohata, M Nishikawa

Journal:

Year:

2002

Language:

english

File:

PDF, 166 KB

english, 2002

22

High-quality SiO2 film deposition using active reaction by oxygen radical

A Kumagai, K Ishibashi, Ge Xu, M Tanaka, H Nogami, O Okada

Journal:

Year:

2002

Language:

english

File:

PDF, 114 KB

english, 2002

23

Production of low-electron-temperature electron cyclotron resonance plasma with large area using 915 MHz microwave

N Itagaki, S Kawakami, N Ishii, Y Kawai

Journal:

Year:

2002

Language:

english

File:

PDF, 204 KB

english, 2002

24

Ion temperature and fluctuation in a large-diameter electron–cyclotron-resonance plasma

Mayuko Koga, Takenori Yoshizawa, Yoko Ueda, Akira Yonesu, Yoshinobu Kawai

Journal:

Year:

2002

Language:

english

File:

PDF, 171 KB

english, 2002

25

Deposition of carbon films by plasma-based ion implantation using glow discharge plasma ignited by high voltage pulses applied to substrates

H Shinno, K Ishioka, M Kitajima

Journal:

Year:

2002

Language:

english

File:

PDF, 126 KB

english, 2002

26

Characterization of low temperature growth carbon nanofibers synthesized by using plasma enhanced chemical vapor deposition

T. Ikuno, J.-T. Ryu, T. Oyama, S. Ohkura, Y.-G. Baek, S. Honda, M. Katayama, T. Hirao, K. Oura

Journal:

Year:

2002

Language:

english

File:

PDF, 251 KB

english, 2002

27

Low temperature deposition of TiO2 films with high refractive indices by oxygen-radical beam-assisted evaporation combined with ion beam

Yasumi Yamada, Haruo Uyama, Takanori Murata, Hisakazu Nozoye

Journal:

Year:

2002

Language:

english

File:

PDF, 196 KB

english, 2002

28

Gas barrier properties of silicon oxide films prepared by plasma-enhanced CVD using tetramethoxysilane

K Teshima, Y Inoue, H Sugimura, O Takai

Journal:

Year:

2002

Language:

english

File:

PDF, 399 KB

english, 2002

29

Production of a large-area argon microwave plasma by a ring slot antenna

Kouhei Shimatani, Tetsu Okamoto, Yukio Okamoto

Journal:

Year:

2002

Language:

english

File:

PDF, 128 KB

english, 2002

30

Effect of tin oxide dispersion on nodule formation in ITO sputtering

K Nakashima, Y Kumahara

Journal:

Year:

2002

Language:

english

File:

PDF, 290 KB

english, 2002

31

CrN films deposited by rf reactive sputtering using a plasma emission monitoring control

Shozo Inoue, Futami Okada, Keiji Koterazawa

Journal:

Year:

2002

Language:

english

File:

PDF, 186 KB

english, 2002

32

GaN films deposited by planar magnetron sputtering

T Kikuma, K Tominaga, K Furutani, Kazuya Kusaka, Takao Hanabusa, Takashi Mukai

Journal:

Year:

2002

Language:

english

File:

PDF, 148 KB

english, 2002

33

Study of electron field emission and structural properties of nanostructured carbon thin films deposited by hot-filament-assisted reactive sputtering using methane gas

K.-Y Lee, K Fujimoto, S Ohkura, S Honda, M Katayama, T Hirao, K Oura

Journal:

Year:

2002

Language:

english

File:

PDF, 192 KB

english, 2002

34

Preparation of boron–carbon–nitrogen thin films by magnetron sputtering

H Yokomichi, T Funakawa, A Masuda

Journal:

Year:

2002

Language:

english

File:

PDF, 166 KB

english, 2002

35

Characteristics of Fe–N films deposited by a reactive ion beam sputtering using adsorptive and ionized nitrogen

S Iwatsubo, M Naoe

Journal:

Year:

2002

Language:

english

File:

PDF, 195 KB

english, 2002

36

Effects of ion flux on the properties of dc magnetron-sputtered stainless steel films

Shozo Inoue, Toshiaki Saeki, Hitoshi Uchida, Keiji Koterazawa, Mikio Iwasa

Journal:

Year:

2002

Language:

english

File:

PDF, 151 KB

english, 2002

37

Preparation of TiO2 thin films by sputtering applying electron cyclotron resonance plasma produced in arched magnetic mirrors

E Honbo, M Miyata, T Ueno, Y Kato, S Ishii

Journal:

Year:

2002

Language:

english

File:

PDF, 99 KB

english, 2002

38

Effects of oxygen gettering and target mode change in the formation process of reactively RF sputtered WOx thin films

A Yamamoto, Y Abe, M Kawamura, K Sasaki

Journal:

Year:

2002

Language:

english

File:

PDF, 181 KB

english, 2002

39

Development of a cylindrical DC magnetron sputtering apparatus assisted by microwave plasma

Akira Yonesu, Hiroki Takemoto, Makoto Hirata, Yasumasa Yamashiro

Journal:

Year:

2002

Language:

english

File:

PDF, 186 KB

english, 2002

40

Energetic oxygen ions in ZrO2 deposition by reactive sputtering of Zr

Kikuo Tominaga, Takuya Kikuma, Kazuya Kusaka, Takao Hanabusa

Journal:

Year:

2002

Language:

english

File:

PDF, 149 KB

english, 2002

41

Electrical and mechanical properties of SnO2:Nb films for touch screens

N Kikuchi, E Kusano, E Kishio, A Kinbara

Journal:

Year:

2002

Language:

english

File:

PDF, 194 KB

english, 2002

42

Crystallinity and stoichiometry of InNx films deposited by reactive dc magnetron sputtering

P.K Song, D Sato, M Kon, Y Shigesato

Journal:

Year:

2002

Language:

english

File:

PDF, 182 KB

english, 2002

43

Water-repellency of a-C:H films deposited by rf plasma-enhanced CVD

Je-Deok Kim, Hiroyuki Sugimura, Osamu Takai

Journal:

Year:

2002

Language:

english

File:

PDF, 158 KB

english, 2002

44

Influence of surface morphology on the tribological properties of silver–graphite overlays

C.P Lungu, K Iwasaki

Journal:

Year:

2002

Language:

english

File:

PDF, 273 KB

english, 2002

45

Characterization of CNx films prepared by reactive magnetron sputtering

Yuki Togashi, Yuko Hirohata, Tomoaki Hino

Journal:

Year:

2002

Language:

english

File:

PDF, 178 KB

english, 2002

46

Dependence of dielectric and ferroelectric behaviors on growth orientation in epitaxial BaTiO3/SrTiO3 superlattices

O Nakagawara, T Shimuta, T Makino, S Arai, H Tabata, T Kawai

Journal:

Year:

2002

Language:

english

File:

PDF, 124 KB

english, 2002

47

Limited reaction growth of YSZ (ZrO2:Y2O3) thin films for gate insulator

Kimihiro Sasaki, Tatsuhiro Hasu, Kenji Sasaki, Tomonobu Hata

Journal:

Year:

2002

Language:

english

File:

PDF, 310 KB

english, 2002

48

Dependence on substrate temperature of the film structure of μc-Si:H prepared by RF magnetron sputtering

J. Kondo, A. Tabata, T. Kawamura, T. Mizutani

Journal:

Year:

2002

Language:

english

File:

PDF, 170 KB

english, 2002

49

Blue shift of photoluminescence spectrum of porous silicon by helium ion irradiation

Y Yamauchi, T Sakurai, Y Hirohata, T Hino, M Nishikawa

Journal:

Year:

2002

Language:

english

File:

PDF, 146 KB

english, 2002

50

Frontier of transparent conductive oxide thin films

H Hosono, H Ohta, M Orita, K Ueda, M Hirano

Journal:

Year:

2002

Language:

english

File:

PDF, 403 KB

english, 2002

51

Ferroelectric properties of epitaxial Bi4Ti3O12 films deposited on epitaxial (1 0 0) Ir and (1 0 0) Pt films on Si by sputtering

S Horita, S Sasaki, O Kitagawa, S Horii

Journal:

Year:

2002

Language:

english

File:

PDF, 218 KB

english, 2002

52

The structure of TiN films deposited by arc ion plating

Tatsuya Matsue, Takao Hanabusa, Yasukazu Ikeuchi

Journal:

Year:

2002

Language:

english

File:

PDF, 157 KB

english, 2002

53

Effect of sputtering gas pressure and nitrogen concentration on crystal orientation and residual stress in sputtered AlN films

K Kusaka, D Taniguchi, T Hanabusa, K Tominaga

Journal:

Year:

2002

Language:

english

File:

PDF, 154 KB

english, 2002

54

Structural and electrical properties of Cu films deposited on glass by DC magnetron sputtering

Hong Qiu, Fengping Wang, Ping Wu, Liqing Pan, Yue Tian

Journal:

Year:

2002

Language:

english

File:

PDF, 201 KB

english, 2002

55

Effects of argon and hydrogen plasmas on the surface of silicon

I Umezu, K Kohno, K Aoki, Y Kohama, A Sugimura, M Inada

Journal:

Year:

2002

Language:

english

File:

PDF, 81 KB

english, 2002

56

Fabrication of Silicon/Germanium superlattice by ion-beam sputtering

K Sasaki, Y Takahashi, T Ikeda, T Hata

Journal:

Year:

2002

Language:

english

File:

PDF, 362 KB

english, 2002

57

Volume Contents for Volume 66

Journal:

Year:

2002

Language:

english

File:

PDF, 117 KB

english, 2002

58

Author Index for Volume 66

Journal:

Year:

2002

File:

PDF, 48 KB

2002