Volume 85; Issue 9

Vacuum

Volume 85; Issue 9
2

Reactive DC magnetron sputter deposited Ti–Cu–N nano-composite thin films at nitrogen ambient

A. Rahmati
Journal:
Vacuum
Year:
2011
Language:
english
File:
PDF, 1.06 MB
english, 2011
4

A single target RF magnetron co-sputtered iron doped tin oxide films with pillars

M. Kormunda, J. Pavlik
Journal:
Vacuum
Year:
2011
Language:
english
File:
PDF, 717 KB
english, 2011
6

Optical and electrical properties of Sn-doped CdO thin films obtained by pulse laser deposition

B.J. Zheng, J.S. Lian, L. Zhao, Q. Jiang
Journal:
Vacuum
Year:
2011
Language:
english
File:
PDF, 932 KB
english, 2011
7

AlN codoping and fabrication of ZnO homojunction by RF sputtering

L. Balakrishnan, P. Premchander, T. Balasubramanian, N. Gopalakrishnan
Journal:
Vacuum
Year:
2011
Language:
english
File:
PDF, 688 KB
english, 2011
11

Effect of NH3 plasma treatment on the device performance of ZnO based thin film transistors

R. Navamathavan, R. Nirmala, Cheul Ro Lee
Journal:
Vacuum
Year:
2011
Language:
english
File:
PDF, 289 KB
english, 2011
13

Editorial Board & Publication Information

Journal:
Vacuum
Year:
2011
Language:
english
File:
PDF, 49 KB
english, 2011
14

Diary

Journal:
Vacuum
Year:
2011
Language:
english
File:
PDF, 89 KB
english, 2011