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1

Process and Resist Parameters Influencing the MEEF Values for Sub-90nm Cntact Hole Patterns

Mortini, Bénédicte, Monget, Cédric, Baron, Fabrice, Faure, Romuald, Martinelli, Catherine, Robert, Fédéric, Serrand, Jérome, Kimura, Toru, Steenbergen, Jan Van

Journal:

Journal of Photopolymer Science and Technology

Year:

2008

File:

PDF, 1.63 MB

2008

2

Investigating 248 and 193 nm resist degradation during reactive ion oxide etching

Michael J. May, Bénédicte Mortini, Michel Heitzmann, Pauline Gautier, Claire Sourd, Cyril Brochon, Georges Hadziioannou

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 651 KB

english, 2006

3

Photosensitive resists for optical lithography

Bénédicte Mortini

Journal:

Comptes Rendus Physique

Year:

2006

Language:

english

File:

PDF, 474 KB

english, 2006

4

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Study of 193-nm resist degradation under various etch chemistries

Bazin, Arnaud, May, Michael, Pargon, Erwine, Mortini, Benedicte, Joubert, Olivier, Lin, Qinghuang

Year:

2007

Language:

english

File:

PDF, 329 KB

english, 2007

5

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Study of bake mechanisms by real-time in-situ ellipsometry

Paniez, Patrick J., Vareille, Aime, Ballet, Patrice, Mortini, Benedicte P.

Year:

1998

Language:

english

File:

PDF, 494 KB

english, 1998

6

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Processing of acrylate-based 193-nm resists: influence of physico-chemical properties

Mortini, Benedicte P., Rosilio, Charles, Prola, Alain, Paniez, Patrick J.

Year:

1998

Language:

english

File:

PDF, 873 KB

english, 1998

7

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers

Kavanagh, Robert J., Orsula, George W., Hellion, Marie, Barclay, George G., Caporale, Stefan, Pugliano, Nick, Thackeray, James W., Mortini, Benedicte P., Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 2.12 MB

english, 2002

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Impact of HBr and Ar cure plasma treatments on 193nm photoresists

Henderson, Clifford L., Bazin, Arnaud, Pargon, Erwine, Mellhaoui, Xavier, Perret, Damien, Mortini, Bénédicte, Joubert, Olivier

Year:

2008

Language:

english

File:

PDF, 364 KB

english, 2008

9

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Investigation of 193-nm resist and plasma interactions during an oxide etching process

Mortini, Benedicte P., Spinelli, Philippe, Leverd, Francois, Dejonghe, Veronique, Braspenning, Richard, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 915 KB

english, 2003

10

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Minimization of the iso-dense bias in chemically amplified 193-nm positive resists: influence and monitoring of the diffusion well

Mortini, Benedicte P., Gally, Severine, Sassoulas, Pierre-Olivier, Prola, Alain, Paniez, Patrick J., Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 849 KB

english, 2000

11

SPIE Proceedings [SPIE Microelectronic Manufacturing Technologies - Edinburgh, United Kingdom (Wednesday 19 May 1999)] Lithography for Semiconductor Manufacturing - Understanding advanced lithographic materials: challenges and new characterization techniques

Paniez, Patrick J., Mortini, Benedicte P., Gally, Severine, Prola, Alain, Rosilio, Charles, Sassoulas, Pierre-Olivier, Mack, Chris A., Stevenson, Tom

Year:

1999

Language:

english

File:

PDF, 564 KB

english, 1999

12

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Physico-chemical properties of polymers for 193-nm lithography incorporating alicyclic norbornene-alt-maleic anhydride structures

Paniez, Patrick J., Perrier, Franck, Mortini, Benedicte P., Gally, Severine, Sassoulas, Pierre-Olivier, Rosilio, Charles, Conley, Will

Year:

1999

Language:

english

File:

PDF, 491 KB

english, 1999

13

SPIE Proceedings [SPIE European Mask and Lithography Conf 2007 - Grenoble, France (Monday 22 January 2007)] 23rd European Mask and Lithography Conference - Resist and BARC outgassing measured by TD-GCMS: investigation during the exposure or the bake steps of the lithographic process

Tiron, Raluca, Sourd, Claire, Fontaine, Hervé, Cetre, Sylviane, Mortini, Bénédicte

Year:

2007

Language:

english

File:

PDF, 2.29 MB

english, 2007

14

Study of advanced 193nm resists. Material properties and lithographic performance.

Mortini, Benedicte, Gally, Severine, Sassoulas, Pierre-Olivier, Prola, Alain, Paniez, Patrick J.

Journal:

Journal of Photopolymer Science and Technology

Year:

1999

Language:

english

File:

PDF, 643 KB

english, 1999

15

Evaluation of a Negative 193nm DUV Resist for the 45nm Node: Lithography, Degradation Kinetics during Etch and Implant.

May, Michael J., Derrough, Semir, Bazin, Arnaud, Mortini, Bénédicte, Brochon, Cyril, Hodziioannou, Georges

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 643 KB

english, 2007