Volume 53; Issue 5S2

Japanese Journal of Applied Physics

Volume 53; Issue 5S2

1

Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures

Takeyama, Mayumi B., Sato, Masaru, Nakata, Yoshihiro, Kobayashi, Yasushi, Nakamura, Tomoji, Noya, Atsushi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 426 KB

english, 2014

2

Formation and crystalline structure of Ni silicides on Si(110) substrate

Nakatsuka, Osamu, Hasegawa, Masahiro, Kato, Kimihiko, Taoka, Noriyuki, Zaima, Shigeaki

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.54 MB

english, 2014

3

Novel through silicon via exposure process comprising Si/Cu grinding, electroless Ni–B plating, and wet etching of Si

Watanabe, Naoya, Aoyagi, Masahiro, Katagawa, Daisuke, Bandoh, Tsubasa, Yamamoto, Eiichi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.39 MB

english, 2014

4

Codeposition of Cu/Ni thin films from mixed precursors in supercritical carbon dioxide solutions

Rasadujjaman, Md, Watanabe, Mitsuhiro, Kondoh, Eiichi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.04 MB

english, 2014

5

Advanced Metallization for ULSI Applications

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 44 KB

english, 2014

6

Formation behavior and adhesion property of metallic Mn layer on porous SiOC by chemical vapor deposition

Tsuchiya, Yoshiyuki, Ando, Daisuke, Sutou, Yuji, Koike, Junichi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.42 MB

english, 2014

7

Adsorption behavior of poly(ethylene glycol) in the presence of two different kinds of halide ions, Br − and Cl − revealed using a microfluidic device and a flow cell type electrochemical quartz crystal microbalance

Tsujimoto, Yuichi, Miyamoto, Yutaka, Saito, Takeyasu, Okamoto, Naoki, Kondo, Kazuo

Journal:

Japanese Journal of Applied Physics

Year:

2014

File:

PDF, 1.12 MB

2014

8

Effect of thermal cleaning on formation of epitaxial Ni germanide layer on Ge(110) substrate

Deng, Yunsheng, Nakatsuka, Osamu, Taoka, Noriyuki, Zaima, Shigeaki

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 624 KB

english, 2014

9

A new Cu(TiIrN x ) film with fine thermal conductivity and its application

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 754 KB

english, 2014

10

Cu coating inside small (15 µm) and ultrahigh-aspect-ratio (>130) through-holes using supercritical CO 2 fluid

Watanabe, Mitsuhiro, Takeuchi, Yuto, Ueno, Takahiro, Kondoh, Eiichi, Yamamoto, Satoshi, Kikukawa, Naohiro, Suemasu, Tatsuo

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 425 KB

english, 2014

11

Reflow behavior of Cu–Mn in LSI line patterns

Saito, Tomohiro, Ando, Daisuke, Sutou, Yuji, Koike, Junichi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 967 KB

english, 2014

12

Impact of back-grinding-induced damage on Si wafer thinning for three-dimensional integration

Mizushima, Yoriko, Kim, Youngsuk, Nakamura, Tomoji, Sugie, Ryuichi, Hashimoto, Hideki, Uedono, Akira, Ohba, Takayuki

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.52 MB

english, 2014

13

Primary study on nonlinear viscoelasticity measurement of chemical mechanical polishing pads by applying on-machine compression test

Suzuki, Norikazu, Kato, Akimitsu, Asaba, Masakazu, Shamoto, Eiji

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 467 KB

english, 2014

14

Advanced metallization concepts and impact on reliability

Hauschildt, Meike, Hintze, Bernd, Gall, Martin, Koschinsky, Frank, Preusse, Axel, Bolom, Tibor, Nopper, Markus, Beyer, Armand, Aubel, Oliver, Talut, Georg, Zschech, Ehrenfried

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 222 KB

english, 2014

15

Cu filling of 10 nm trenches by high-magnetic-field magnetron sputtering

Itoh, Masatoshi, Uhara, Yoshio, Saito, Shigeru

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 457 KB

english, 2014

16

Lifetime prediction model of stress-induced voiding in Cu/low-κ interconnects

Yokogawa, Shinji

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 283 KB

english, 2014

17

Room-temperature intermixing for adhesion enhancement of Cu/SiO 2 interface by adopting SiO 2 surface dope and noble metal catalyzation

Watanabe, Mitsuhiro, Teraoka, Akira, Kondoh, Eiichi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 921 KB

english, 2014

18

Integration of multilayer graphene wires onto tungsten plugs for carbon/metal hybrid interconnects

Sato, Motonobu, Takahashi, Makoto, Nihei, Mizuhisa, Sato, Shintaro, Yokoyama, Naoki

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.29 MB

english, 2014

19

Bromine doping of multilayer graphene for low-resistance interconnects

Ueno, Kazuyoshi, Kosugi, Ryosuke, Imazeki, Kazuya, Aozasa, Akihiko, Matsumoto, Yuji, Miyazaki, Hisao, Sakuma, Naoshi, Kajita, Akihiro, Sakai, Tadashi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 54 KB

english, 2014

20

Temperature dependence of resistance of conductive nanofilament formed in Ni/NiO x /Pt resistive switching random access memory

Otsuka, Shintaro, Hamada, Yoshihumi, Shimizu, Tomohiro, Shingubara, Shoso

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 203 KB

english, 2014

21

Observation of lattice spacing fluctuation and strain undulation around through-Si vias in wafer-on-wafer structures using X-ray microbeam diffraction

Taoka, Noriyuki, Nakatsuka, Osamu, Mizushima, Yoriko, Kitada, Hideki, Kim, Young Suk, Nakamura, Tomoji, Ohba, Takayuki, Zaima, Shigeaki

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 659 KB

english, 2014