Volume 32; Issue 5

IEEE Electron Device Letters

Volume 32; Issue 5
1

Achieving Stable Through-Silicon Via (TSV) Capacitance with Oxide Fixed Charge

Year:
2011
Language:
english
File:
PDF, 154 KB
english, 2011
6

Year:
2011
Language:
english
File:
PDF, 200 KB
english, 2011
11

Year:
2011
Language:
english
File:
PDF, 420 KB
english, 2011
16

Reset Switching Probability of Resistive Switching Devices

Year:
2011
Language:
english
File:
PDF, 228 KB
english, 2011
20

High-Performance Drain-Offset a-IGZO Thin-Film Transistors

Year:
2011
Language:
english
File:
PDF, 319 KB
english, 2011
27

On Gate Capacitance of Nanotube Networks

Year:
2011
Language:
english
File:
PDF, 323 KB
english, 2011