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51

Application and simulation of low temperature plasma processes in semiconductor manufacturing

P.L.G Ventzek, S Rauf, P.J Stout, D Zhang, W Dauksher, E Hall

Journal:

Applied Surface Science

Year:

2002

Language:

english

File:

PDF, 505 KB

english, 2002

52

Stress in “cathodic” plasma oxides as a function of processing parameters

W. Dauksher, A. Reisman

Journal:

Journal of Electronic Materials

Year:

1991

Language:

english

File:

PDF, 1020 KB

english, 1991

53

Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks

W.J. Dauksher, S.B. Clemens, D.J. Resnick, K.H. Smith, P.J.S. Mangat, S. Rauf, P.L.G. Ventzek, V. Arunachalam, B.N. Ramamurthi, H. Ashraf, L. Lea, S. Hall, I.R. Johnston, J. Hopkins, J.K. Bhardwaj

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 144 KB

english, 2001

54

Template fabrication schemes for step and flash imprint lithography

T.C. Bailey, D.J. Resnick, D. Mancini, K.J. Nordquist, W.J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J.H. Baker, B.J. Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt, C.G. Wil

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 586 KB

english, 2002

55

Modeling and experimental data using a new high rate ICP tool for dry etching 200 mm EPL masks

W.J. Dauksher, S.B. Clemens, D.J. Resnick, K.H. Smith, P.J.S. Mangat, S. Rauf, P. Stout, P.L.G. Ventzek, H. Ashraf, L. Lea, S. Hall, J. Hopkins, A. Chambers

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 478 KB

english, 2002

56

Thermal characteristics of an X-ray mask during pattern transfer

D.J. Resnick, S.V. Pendharkar, W.J. Dauksher, K.D. Cummings, M.F. Laudon, B. Romanowicz, P. Renaud, R.L. Engelstad

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 312 KB

english, 1998

57

[IEEE 2011 37th IEEE Photovoltaic Specialists Conference (PVSC) - Seattle, WA, USA (2011.06.19-2011.06.24)] 2011 37th IEEE Photovoltaic Specialists Conference - Characterization and comparison of silicon nitride films deposited using two novel processes

Sharma, Vivek, Bailey, Adam, Dauksher, Bill, Tracy, Clarence, Bowden, Stuart, O'Brien, Barry

Year:

2011

Language:

english

File:

PDF, 281 KB

english, 2011

58

[IEEE Digest of Papers. 2004 Topical Meeting onSilicon Monolithic Integrated Circuits in RF Systems, 2004. - Atlanta, GA, USA (8-10 Sept. 2004)] Digest of Papers. 2004 Topical Meeting onSilicon Monolithic Integrated Circuits in RF Systems, 2004. - RF MEMS resonator for CMOS back-end-of-line integration

Pacheco, S., Zurcher, P., Young, S., Weston, D., Dauksher, W.

Year:

2004

Language:

english

File:

PDF, 931 KB

english, 2004

59

Manipulation of K center charge states in silicon nitride films to achieve excellent surface passivation for silicon solar cells

Sharma, Vivek, Tracy, Clarence, Schroder, Dieter, Herasimenka, Stanislau, Dauksher, William, Bowden, Stuart

Journal:

Applied Physics Letters

Year:

2014

Language:

english

File:

PDF, 832 KB

english, 2014

60

[IEEE 2009 IEEE 59th Electronic Components and Technology Conference (ECTC 2009) - San Diego, CA, USA (2009.05.26-2009.05.29)] 2009 59th Electronic Components and Technology Conference - Reliability of Sn3wt%Ag0.5wt%Cu0.019wt%Ce (SACC) solder joints

Lau, John H., Tse, Po, Richard, Edward, Dauksher, Walter, Shangguan, Dongkai, Pang, John H.L.

Year:

2009

Language:

english

File:

PDF, 3.03 MB

english, 2009

61

YIG-tuned transistor local oscillators operating to 8 GHz

Dauksher, W.J., Hamilton, J.J.

Journal:

Proceedings of the IEEE

Year:

1965

Language:

english

File:

PDF, 134 KB

english, 1965

62

Three “Low Dt” Options for Planarizing the Pre-metal Dielectric on an Advanced Double Poly BiCMOS Process

Journal:

Journal of The Electrochemical Society

Year:

1992

Language:

english

File:

PDF, 1.28 MB

english, 1992

63

[IEEE 2014 IEEE 40th Photovoltaic Specialists Conference (PVSC) - Denver, CO, USA (2014.6.8-2014.6.13)] 2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) - p+ Emitters on n-Type c-Si dry-etched with nitrogen trifluoride and passivated with ALD aluminum oxide

Reblitz, Tim, Tracy, Clarence, Bailly, Mark, Dauksher, Bill, Bowden, Stuart

Year:

2014

Language:

english

File:

PDF, 249 KB

english, 2014

64

[IEEE 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) - Tampa, FL, USA (2013.06.16-2013.06.21)] 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) - Study and manipulation of charges present in silicon nitride films

Sharma, Vivek, Tracy, Clarence, Schroder, Dieter, Flores, Marco, Dauksher, Bill, Bowden, Stuart

Year:

2013

Language:

english

File:

PDF, 3.22 MB

english, 2013

65

[IEEE 2010 35th IEEE Photovoltaic Specialists Conference (PVSC) - Honolulu, HI, USA (2010.06.20-2010.06.25)] 2010 35th IEEE Photovoltaic Specialists Conference - Determination of charged state density at the interface between amorphous silicon and crystalline silicon by lateral conductance

Ghosh, Kunal, Tracy, Clarence J., Dauksher, Bill

Year:

2010

Language:

english

File:

PDF, 771 KB

english, 2010

66

Model for a multiple-step deep Si etch process

S. Rauf, W. J. Dauksher, S. B. Clemens, K. H. Smith

Year:

2002

Language:

english

File:

PDF, 482 KB

english, 2002

67

[IEEE 2014 IEEE 40th Photovoltaic Specialists Conference (PVSC) - Denver, CO, USA (2014.6.8-2014.6.13)] 2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) - High open-circuit voltages on thin silicon solar cells

Bowden, Stuart, Herasimenka, Stanislau, Dauksher, William, Tracy, Clarence, Honsberg, Christiana

Year:

2014

Language:

english

File:

PDF, 3.43 MB

english, 2014

68

Characterization of plasma enhanced chemical vapor deposited SiC and its application in advanced reticle technology–scattering with angular limitation in projection electron beam lithography membrane

Han, S.-I., Mangat, P. J. S., Smith, S. M., Dauksher, W. J., Convey, D., Gregory, R. B.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2000

Language:

english

File:

PDF, 489 KB

english, 2000

69

Surface modification and cleaning enhancement of TaSi(N) films with dilute hydrofluoric acid

Mangat, P. J. S., Dauksher, W. J., Whig, R., O’Brien, W. L.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2000

Language:

english

File:

PDF, 351 KB

english, 2000

70

Publisher's Note: “Surface passivation of n-type c-Si wafers by a-Si/SiO2/SiNx stack with

Herasimenka, Stanislau Y., Tracy, Clarence J., Sharma, Vivek, Vulic, Natasa, Dauksher, William J., Bowden, Stuart G.

Journal:

Applied Physics Letters

Year:

2013

Language:

english

File:

PDF, 222 KB

english, 2013

71

[IEEE 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) - Tampa, FL, USA (2013.06.16-2013.06.21)] 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) - p+ Emitters on n-type c-Si using rapid thermal annealing of PECVD a-Si films and aluminum metallization

Reblitz, Tim, Tracy, Clarence, Dauksher, Bill, Herasimenka, Stanislau, Bowden, Stuart

Year:

2013

Language:

english

File:

PDF, 613 KB

english, 2013

72

Characterization and comparison of silicon nitride films deposited using two novel processes

Sharma, Vivek, Bailey, Adam, Dauksher, Bill, Tracy, Clarence, Bowden, Stuart, O’Brien, Barry

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2012

Language:

english

File:

PDF, 1.12 MB

english, 2012

73

[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Critical dimension issues for 200 mm electron projection masks

Resnick, D.J., Nordquist, K., Dauksher, W.J., Ainley, E., Lu, B., Mangat, P., Weisbrod, E., Martin, C., Wei, A., Englestad, R., Lovell, E., Ivin, V.

Year:

2000

Language:

english

File:

PDF, 181 KB

english, 2000

74

Effect of brightener concentration on the thermal distortion of gold plated x-ray masks

Dauksher, W. J.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1994

Language:

english

File:

PDF, 632 KB

english, 1994

75

[IEEE 2014 IEEE 40th Photovoltaic Specialists Conference (PVSC) - Denver, CO, USA (2014.6.8-2014.6.13)] 2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) - A simplified process flow for silicon heterojunction interdigitated back contact solar cells: Using shadow masks and tunnel junctions

Herasimenka, Stanislau Y., Tracy, Clarence J., Dauksher, William J., Honsberg, Christiana B., Bowden, Stuart

Year:

2014

Language:

english

File:

PDF, 1016 KB

english, 2014

76

[IEEE 2006 IEEE International Reliability Physics Symposium Proceedings - San Jose, CA, USA (2006.03.26-2006.03.30)] 2006 IEEE International Reliability Physics Symposium Proceedings - Geometry Effects on the Electromigration of Eutectic SN/PB Flip-Chip Solder Bumps

Eaton, Dennis, Rowatt, James, Dauksher, Walter

Year:

2006

Language:

english

File:

PDF, 847 KB

english, 2006

77

[IEEE 2005 55th Electronic Components and Technology Conference - Lake Buena Vista, FL, USA (31 May-3 June 2005)] Proceedings Electronic Components and Technology, 2005. ECTC '05. - Effects of Ramp-Time on the Thermal-Fatigue Life of SnAgCu Lead-Free Solder Joints

Lau, J., Dauksher, W.

Year:

2005

Language:

english

File:

PDF, 622 KB

english, 2005

78

The Effects of Ionizing Radiation and Other Processing Parameters on Stress in Thermal Oxides Grown on Silicon

Journal:

Journal of The Electrochemical Society

Year:

1991

Language:

english

File:

PDF, 1.08 MB

english, 1991

79

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device

Smith, Britain J., Stacey, Nicholas A., Donnelly, J. P., Onsongo, David M., Bailey, Todd C., Mackay, Chris J., Resnick, Douglas J., Dauksher, William J., Mancini, David P., Nordquist, Kevin J., Sreeni

Year:

2003

Language:

english

File:

PDF, 160 KB

english, 2003

80

[IEEE 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) - Tampa, FL, USA (2013.06.16-2013.06.21)] 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) - Correlation between lifetime curve and performance of amorphous silicon/ crystalline silicon heterostructure solar cell

Ghosh, Kunal, Herasimenka, Stanislau, Dauksher, Bill, Bowden, Stuart

Year:

2013

Language:

english

File:

PDF, 2.91 MB

english, 2013

81

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Advances in Step and Flash imprint lithography

Johnson, Stephen C., Bailey, Todd C., Dickey, Michael D., Smith, Britain J., Kim, Eunha K., Jamieson, Andrew T., Stacey, Nicholas A., Ekerdt, John G., Willson, C. Grant, Mancini, David P., Dauksher, W

Year:

2003

Language:

english

File:

PDF, 306 KB

english, 2003

82

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Development of two new positive DUV photoresists for use with direct-write e-beam lithography

Mancini, David P., Resnick, Douglas J., Nordquist, Kevin J., Dauksher, William J., Thackeray, James W., McCord, Mark A., Seeger, David E.

Year:

1996

Language:

english

File:

PDF, 564 KB

english, 1996

83

A novel low-temperature method to fabricate MEMS resonators using PMGI as a sacrificial layer

Young, Steven, Weston, Don, Dauksher, Bill, Mancini, David, Pacheco, Sergio, Zurcher, Peter, Miller, Mel

Journal:

Journal of Micromechanics and Microengineering

Year:

2005

Language:

english

File:

PDF, 1.37 MB

english, 2005

84

Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication

W. J. Dauksher, S. B. Clemens, D. J. Resnick, K. H. Smith, P. J. S. Mangat, S. Rauf, P. L. G. Ventzek, H. Ashraf, L. Lea, S. Hall, I. R. Johnston, J. Hopkins, A. Chambers, J. K. Bhardwaj

Year:

2001

Language:

english

File:

PDF, 613 KB

english, 2001

85

Simulating the mechanical response of electron-beam projection lithography masks

A. F. Jachim, C. Chen, R. L. Engelstad, E. G. Lovell, P. J. S. Mangat, W. J. Dauksher

Year:

2000

Language:

english

File:

PDF, 1003 KB

english, 2000

86

Cr absorber etch process for extreme ultraviolet lithography mask fabrication

K. H. Smith, J. R. Wasson, P. J. S. Mangat, W. J. Dauksher, D. J. Resnick

Year:

2001

Language:

english

File:

PDF, 639 KB

english, 2001

87

Extreme ultraviolet mask fabrication with high inspection contrast TaSiN[sub x] absorber stack

J. R. Wasson, E. J. Weisbrod, B. Lu, P. J. S. Mangat, W. J. Dauksher, D. J. Resnick, J. Sohn, R. Engelstad, D. Pettibone

Year:

2003

Language:

english

File:

PDF, 936 KB

english, 2003

88

Fabrication of a surface acoustic wave-based correlator using step-and-flash imprint lithography

G. F. Cardinale, J. L. Skinner, A. A. Talin, R. W. Brocato, D. W. Palmer, D. P. Mancini, W. J. Dauksher, K. Gehoski, N. Le, K. J. Nordquist, D. J. Resnick

Year:

2004

Language:

english

File:

PDF, 848 KB

english, 2004

89

Direct die-to-database electron beam inspection of fused silica imprint templates

D. J. Resnick, L. J. Myron, E. Thompson, T. Hasebe, T. Tokumoto, C. Yan, M. Yamamoto, H. Wakamori, M. Inoue, E. Ainley, K. J. Nordquist, W. J. Dauksher

Year:

2006

Language:

english

File:

PDF, 1.07 MB

english, 2006

90

TaSiN thin-film pattern transfer optimization for 200 mm SCALPEL and extreme ultraviolet lithography masks

W. J. Dauksher, D. J. Resnick, S. B. Clemens, D. L. Standfast, Z. S. Masnyj, J. R. Wasson, N. M. Bergmann, S. Han, P. J. S. Mangat

Year:

2000

Language:

english

File:

PDF, 945 KB

english, 2000

91

Uniform low stress oxynitride films for application as hardmasks on x-ray masks

Year:

1997

Language:

english

File:

PDF, 991 KB

english, 1997

92

Method for fabricating a low stress x-ray mask using annealable amorphous refractory compounds

Year:

1995

Language:

english

File:

PDF, 2.58 MB

english, 1995

93

Inspection of templates for imprint lithography

H. F. Hess, D. Pettibone, D. Adler, K. Bertsche, K. J. Nordquist, D. P. Mancini, W. J. Dauksher, D. J. Resnick

Year:

2004

Language:

english

File:

PDF, 1.13 MB

english, 2004

94

Imprint lithography for integrated circuit fabrication

D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist, T. C. Bailey, S. Johnson, N. Stacey, J. G. Ekerdt, C. G. Willson, S. V. Sreenivasan, N. Schumaker

Year:

2003

Language:

english

File:

PDF, 2.02 MB

english, 2003

95

Critical Dimension Issues for 200 mm Electron Projection Masks

Resnick, Douglas J., Nordquist, Kevin, Dauksher, William J., Ainley, Eric, Lu, Bing, Mangat, Pawitter, Weisbrod, Eric, Martin, Carl, Chang, J., Englestad, Roxann, Lovell, Ed, Ivin, Vladimir

Journal:

Japanese Journal of Applied Physics

Year:

2000

Language:

english

File:

PDF, 1.06 MB

english, 2000

96

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials

Han, Sang-In, Weisbrod, Eric, Wasson, James R., Gregory, Rich, Xie, Qianghua, Mangat, Pawitter J. S., Hector, Scott D., Dauksher, William J., Rosfjord, Kristine M., Mackay, R. Scott

Year:

2004

Language:

english

File:

PDF, 784 KB

english, 2004

97

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Fabrication process and transmission characteristics of SCALPEL mask blanks with thin SiNx membranes

Han, Sang-In, Mangat, Pawitter J. S., Dauksher, William J., Chor, Michael, Liddle, James A., Novembre, Anthony E., Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 131 KB

english, 2001

98

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Development of an etch-definable lift-off process for use with step and flash imprint lithography

Le, Ngoc V., Mackay, R. Scott, Gehoski, Kathleen A., Dauksher, William J., Baker, Jeffrey H., Resnick, Doug J., Dues, Laura

Year:

2005

Language:

english

File:

PDF, 740 KB

english, 2005

99

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Single-write self-aligned rim-phase-shift process

Garza, Cesar M., Wu, Wei, Roman, Bernard J., Mangat, Pawitter J. S., Nordquist, Kevin J., Dauksher, William J., Yen, Anthony

Year:

2003

Language:

english

File:

PDF, 569 KB

english, 2003

100

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Critical Dimension and Image Placement Issues for Step and Flash Imprint Lithography Templates

Nordquist, Kevin J., Mancini, David P., Dauksher, William J., Ainley, Eric S., Gehoski, Kathleen A., Resnick, Douglas J., Masnyj, Zorian S., Mangat, Pawitter J. S., Grenon, Brian J., Kimmel, Kurt R.

Year:

2002

Language:

english

File:

PDF, 414 KB

english, 2002