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101

Atomic layer deposition of tantalum nitride for ultrathin liner applications in advanced copper metallization schemes

van der Straten, Oscar, Zhu, Yu, Dunn, Kathleen, Eisenbraun, Eric T., Kaloyeros, Alain E.

Journal:

Journal of Materials Research

Year:

2004

Language:

english

File:

PDF, 1.92 MB

english, 2004

102

Chemical Vapor Deposition Route to the Fabrication of thin Films of High Temperature Oxide Superconductors

Kaloyeros, Alain E., Brooks, Kenneth C., Feng, Aiguo, Garhart, Jonathan

Journal:

MRS Proceedings

Year:

1989

Language:

english

File:

PDF, 229 KB

english, 1989

103

The Distribution of Phosphorus in Romano-British Ironwork

Kaloyeros, Alain E., Ehrenreich, Robert M.

Journal:

MRS Proceedings

Year:

1990

Language:

english

File:

PDF, 1.25 MB

english, 1990

104

Blanket and Selective Copper CVD from Cu (Fod)2 For Multilevel Metallization

Kaloyeros, Alain E., Saxena, Arjun N., Brooks, Kenneth, Ghosh, Sumanta, Eisenbraun, Eric

Journal:

MRS Proceedings

Year:

1990

Language:

english

File:

PDF, 1.47 MB

english, 1990

105

The Effect of Grain Boundaries and Substrate Interactions with Hydrogen on the CVD Growth of Device-Quality Copper.

Kaloyeros, A. E., Dettelbacher, C., Eisenbraun, E. T., Lanford, W. A., Li, H., Olowolafe, J. F., Murarka, S., Pintchovski, F., Shy, Y. -T., Toscano, P. J.

Journal:

MRS Proceedings

Year:

1991

Language:

english

File:

PDF, 357 KB

english, 1991

106

Ultra Thin Sacrificial Diffusion Barriers - Control of Diffusion Across the Cu-SiO2 Interface

Kirchner, Eric, Murarka, S.P., Eisenbraun, E., Kaloyeros, A.

Journal:

MRS Proceedings

Year:

1993

Language:

english

File:

PDF, 210 KB

english, 1993

107

Heteroepitaxial Si-ZrO2-Si by MOCVD

Greenwald, Anton C., Kalkhoran, Nader M., Namavar, Fereydoon, Kaloyeros, Alain E., Stathakos, Ioannis

Journal:

MRS Proceedings

Year:

1993

Language:

english

File:

PDF, 1.19 MB

english, 1993

108

Copper Metallization Manufacturing Issues for Future ICs

Gutmann, Ronald J., Paul Chow, T., Gill, William N., Kaloyeros, Alain E., Lanford, William A., Murarka, Shyam P.

Journal:

MRS Proceedings

Year:

1994

Language:

english

File:

PDF, 2.85 MB

english, 1994

109

MOCVD of Yttria Stabilized Zirconia on Co-Cr

Greenwald, Anton C., Loges, Peter G., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

1994

Language:

english

File:

PDF, 886 KB

english, 1994

110

Wheel Abrasion Experiment Metals Selection for Mars Pathfinder Mission

Hepp, Aloysius F., Fatemi, Navid S., Wilt, David M., Ferguson, Dale C., Hoffman, Richard W., Hill, Maria M., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

1996

Language:

english

File:

PDF, 2.08 MB

english, 1996

111

Mocvd SrS:Ce for Applications in Electroluminescent Devices

Endisch, D., Barth, K., Lau, J., Peterson, G., Kaloyeros, A. E., Tuenge, D., King, C. N.

Journal:

MRS Proceedings

Year:

1997

Language:

english

File:

PDF, 1.16 MB

english, 1997

112

Silicon Nitride Films Deposited by Atmospheric Pressure Chemical Vapor Deposition

Lin, Xian, Endisch, Denis, Chen, Xiaomeng, Kaloyeros, Alain

Journal:

MRS Proceedings

Year:

1997

Language:

english

File:

PDF, 620 KB

english, 1997

113

Adhesion Energy Measurements of Multilayer Low-K Dielectric Materials for ULSI Applications

Shaffer, E. O., Mills, M. E., Hawn, D., Van Gestel, M., Knorr, A., Gundlach, H., Kumar, K., Kaloyeros, A. E., Geer, R. E.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 338 KB

english, 1998

114

Low Temperature CVD Route to Binary and Ternary Diffusion Barrier Nitrides for Cu Metallization

Kaloyeros, Alain E., Kelsey, Jean, Goldberg, Cindy, Anjum, Dalaver, Chen, Xiaomeng, Mirza, Jawid, Kumar, Kaushik, Arkles, Barry, Han, Bin, Sullivan, John J.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 432 KB

english, 1998

115

Integration of PECVD Tungsten Nitride as a Barrier Layer for Copper Metallization

Ivanova, A. R., Galewski, C. J., Sans, C. A., Seidel, T. E., Grunow, S., Kumar, K., Kaloyeros, A. E.

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 1.17 MB

english, 1999

116

Study of Electrochemical Deposition of Copper and Microstructure Evolution in Fine Lines

Grunow, Stephan, Diatezual, Deda, Seo, Soon-Cheon, Stoner, Timothy, Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 2.61 MB

english, 1999

117

Low Temperature Thermal Chemical Vapor Deposition of Silicon Nitride Thin Films for Microelectronics Applications

Skordas, Spyridon, Sirinakis, George, Yu, Wen, Wu, Di, Efstathiadis, Haralabos, Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 384 KB

english, 1999

118

The 2,2,6,6-Tetramethyl-2-Sila-3,5-Heptanedione Route to the Chemical Vapor Deposition of Copper for Gigascale Interconnect Applications

Claessen, Rolf U., Welch, John T., Toscano, Paul J., Banger, Kulbinder K., Kornilov, Andrei M., Eisenbraun, Eric T., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

2000

Language:

english

File:

PDF, 974 KB

english, 2000

119

Ion beam radiation effects on InAs semiconductor quantum dots

Zhu, J., Thaik, M., Yakimov, M., Oktyabrsky, S., Kaloyeros, A. E., Huang, M. B.

Journal:

MRS Proceedings

Year:

2000

Language:

english

File:

PDF, 825 KB

english, 2000

120

MOCVD ZnS:Mn Films: Grain Size Distribution and Crystal Structure as a Function of the Growth Parameters

Dunn, Kathleen A., Dovidenko, Katharine, Topol, Anna W., Oktyabrsky, Serge R., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

2001

Language:

english

File:

PDF, 2.69 MB

english, 2001

121

MOCVD ZnS:Mn Films: Crystal Structure and Defect Microstructure as a Function of the Growth Parameters

Dunn, Kathleen A., Dovidenko, Katharine, Topol, Anna W., Shekhawat, Gajendra S., Geer, Robert E., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

2001

Language:

english

File:

PDF, 2.82 MB

english, 2001

122

A Novel Silicon-Carbon Precursor for Oligomer Chemical Vapor Deposition of Silicon Carbide for Harsh Environmental Applications

Futschik, Ulrike, Efstathiadis, Harry, Castracane, James, Kaloyeros, Alain E., Macdonald, Leo, Hayes, Susan, Fountzoulas, Costas

Journal:

MRS Proceedings

Year:

2001

Language:

english

File:

PDF, 209 KB

english, 2001

123

Physical Properties and Diffusion Characteristics of CVD-Grown TiSiN Films

Anjum, Dalaver, Dovidenko, Katharine, Oktyabrsky, Serge, Eisenbraun, Eric, Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

2001

Language:

english

File:

PDF, 857 KB

english, 2001

124

Thermal Chemical Vapor Deposition of Silicon Carbide Films as Protective Coatings for Microfluidic Structures

Gallis, Spyros, Futschik, Ulrike, Castracane, James, Kaloyeros, Alain E., Efstathiadis, Harry, Sherwood, Walter, Hayes, Susan, Fountzoulas, Costas G.

Journal:

MRS Proceedings

Year:

2002

Language:

english

File:

PDF, 323 KB

english, 2002

125

Characterization of Ruthenium and Ruthenium Oxide Thin Films deposited by Chemical Vapor Deposition for CMOS Gate Electrode Applications

Papadatos, Filippos, Skordas, Spyridon, Consiglio, Steve, Kaloyeros, Alain E., Eisenbraun, Eric

Journal:

MRS Proceedings

Year:

2002

Language:

english

File:

PDF, 98 KB

english, 2002

126

Interface Quality and Electrical Performance of Low-Temperature Metal Organic Chemical Vapor Deposition Aluminum Oxide Thin Films for Advanced CMOS Gate Dielectric Applications

Skordas, Spyridon, Papadatos, Filippos, Consiglio, Steven, Eisenbraun, Eric, Kaloyeros, Alain

Journal:

MRS Proceedings

Year:

2002

Language:

english

File:

PDF, 53 KB

english, 2002

127

The Low-Temperature Metal-Organic Chemical Vapor Deposition (Ltmocvd) Route to Amorphous Silicon Semiconductors

Kaloyeros, Aain E., Corbett, James W., Tobcano, Paul J., Rizk, Richard B.

Journal:

MRS Proceedings

Year:

1990

Language:

english

File:

PDF, 344 KB

english, 1990

128

Low Temperature Metal Organic Chemical Vapor Deposition (LTMOCVD) of Electronic Materials

Kaloyeros, Alain E., Toscano, Paul J., Rizk, Richard B., Tulchinsky, Victor, Greene, Alex

Journal:

MRS Proceedings

Year:

1989

Language:

english

File:

PDF, 871 KB

english, 1989

129

SPIE Proceedings [SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 10 August 2008)] Nanophotonic Materials V - Strong photoluminescence at 1540 nm from Er-doped amorphous silicon oxycarbide: a novel silicon material for photonic applications

Gallis, Spyros, Gaburro, Zeno, Cabrini, Stefano, Nikas, Vasileios, Suhag, Himani, Talapin, Dmitri, Huang, Mengbing, Kaloyeros, Alain E.

Year:

2008

Language:

english

File:

PDF, 294 KB

english, 2008

130

SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, California, USA (Sunday 21 August 2011)] Eleventh International Conference on Solid State Lighting - Intense blue-white luminescence from amorphous silicon oxycarbide (a-SiC x O y ) thin films

Nikas, Vasileios, Kane, Matthew H., Wetzel, Christian, Gallis, Spyros, Suhag, Himani, Huang, Jian-Jang, Huang, Mengbing, Kaloyeros, Alain E.

Year:

2011

Language:

english

File:

PDF, 256 KB

english, 2011

131

ChemInform Abstract: Electrochemical Characteristics of Amorphous Titanium Carbide Films Produced by Low-Temperature Metal-Organic Chemical Vapor Deposition (MOCVD).

ALLOCA, C. M., WILLIAMS, W. S., KALOYEROS, A. E.

Journal:

Year:

1988

File:

PDF, 142 KB

1988

132

ChemInform Abstract: Study by Extended X-Ray Absorption Fine Structure Technique and Microscopy of the Amorphous State of Titanium Diboride Thin Films.

KALOYEROS, A. E., WILLIAMS, W. S., RIZK, R. B., BROWN, F. C., GREENE, A. E.

Journal:

Year:

1989

File:

PDF, 145 KB

1989

133

SPIE Proceedings [SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 10 August 2008)] Nanoengineering: Fabrication, Properties, Optics, and Devices V - A comparative study of a-SiC x O y H z thin films grown via chemical vapor deposition for silicon photonics

Gallis, Spyros, Dobisz, Elizabeth A., Eldada, Louay A., Nikas, Vasileios, Suhag, Himani, Huang, Mengbing, Kaloyeros, Alain E.

Year:

2008

Language:

english

File:

PDF, 330 KB

english, 2008

134

ChemInform Abstract: Organometallic Route to the Chemical Vapor Deposition of Titanium Carbide Films at Exceptionally Low Temperatures.

GIROLAMI, G. S., JENSEN, J. A., POLLINA, D. M., WILLIAMS, W. S., KALOYEROS, A. E., ALLOCCA, C. M.

Journal:

Year:

1987

File:

PDF, 133 KB

1987

135

SPIE Proceedings [SPIE Symposium on Integrated Optoelectronic Devices - San Jose, CA (Friday 18 January 2002)] Optoelectronic Interconnects, Integrated Circuits, and Packaging - Emerging technologies for chip-level optical interconnects

Oktyabrsky, Serge, Castracane, James, Kaloyeros, Alain E., Eldada, Louay A., Heyler, Randy A., Rowlette, Sr., John R.

Year:

2002

Language:

english

File:

PDF, 902 KB

english, 2002

136

Chaotic behavior of channeling particles

Chen, Ling, Kaloyeros, Alain E., Wang, Guang‐hou

Journal:

Chaos An Interdisciplinary Journal of Nonlinear Science

Year:

1994

Language:

english

File:

PDF, 248 KB

english, 1994

137

[AIP Superconductivity and its applications - Buffalo, New York (USA) (18−20 Sep 1990)] AIP Conference Proceedings - Metal-organic chemical vapor deposition (MOCVD) of high temperature superconductors with enhanced critical current

Kaloyeros, Alain E., Feng, Aiguo, Jahn, Elke, Brooks, Kennethy C.

Year:

1991

Language:

english

File:

PDF, 364 KB

english, 1991

138

Time-resolved analysis of the white photoluminescence from chemically synthesized SiC x O y thin films and nanowires

Tabassum, Natasha, Nikas, Vasileios, Ford, Brian, Huang, Mengbing, Kaloyeros, Alain E., Gallis, Spyros

Journal:

Applied Physics Letters

Year:

2016

Language:

english

File:

PDF, 1.21 MB

english, 2016

139

Microstructure and Optical Properties of Au–Y2O3-stabilized ZrO2 Nanocomposite Films

Sirinakis, George, Siddique, Rezina, Monokroussos, Christos, Carpenter, Michael A., Kaloyeros, Alain E.

Journal:

Journal of Materials Research

Year:

2005

Language:

english

File:

PDF, 248 KB

english, 2005

140

Review—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: Trends in Deposition Techniques and Related Applications

Kaloyeros, Alain E., Jové, Fernando A., Goff, Jonathan, Arkles, Barry

Journal:

ECS Journal of Solid State Science and Technology

Year:

2017

Language:

english

File:

PDF, 437 KB

english, 2017

141

[AIP Superconductivity and its applications - Buffalo, New York (USA) (24−26 Sep 1991)] AIP Conference Proceedings - Vapor phase processing of HTS films for technological application

Chen, Ling, Piazza, Timothy W., Kelsey, Jean E., Li, Hongwen, Kaloyeros, Alain E.

Year:

1992

Language:

english

File:

PDF, 764 KB

english, 1992

142

[AIP Superconductivity and its applications - Buffalo, New York (USA) (24−26 Sep 1991)] AIP Conference Proceedings - Vapor phase processing of HTS films for technological application

Chen, Ling, Piazza, Timothy W., Kelsey, Jean E., Li, Hongwen, Kaloyeros, Alain E.

Year:

1992

File:

PDF, 764 KB

1992

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