Volume 282

Solid State Phenomena

Volume 282

1

Cleaning of High Aspect Ratio STI Structures for Advanced Logic Devices by Implementation of a Surface Modification Drying Technique

Sebaai, Farid, Vereecke, Guy, Xu, Xiu Mei, Baudot, Sylvain, Amemiya, Fumihiro, Komori, Kana, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 763 KB

english, 2018

2

AlCu Pitting Prevention in Post Etch Cleaning

Votta, Annamaria, Morandi, Roberto, Ravasio, Marcello, Tagliabue, Giovanni, Pipia, Francesco, Alessandri, Mauro

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.20 MB

english, 2018

3

Process Parameter Control for BEOL TiN Hard Mask Etch-Back

Okorn-Schmidt, Harald, Engesser, Philipp, Linder, Manuel, Hofer-Moser, Jörg

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 702 KB

english, 2018

4

BEOL Post-Etch Clean Robustness Improvement with Ultra-Diluted Hf for 28nm Node

Broussous, Lucile, Fabre, Remy, Massin, Thomas, Ishikawa, Hiwadezu, Buisine, Fabrice, Lamaury, Alain

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 975 KB

english, 2018

5

Corrosion of Co in BEOL interconnects in dilute HF solution

Akanishi, Yuya, Kesters, Els, Le, Quoc Toan, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 3.24 MB

english, 2018

6

Effect of Cleaning Chemistries on Cobalt: Surface Chemistries and Electrical Characterization

Le, Quoc Toan, Kesters, Els, Akanishi, Yuya, van der Veen, Marleen H., Mizutani, Atsushi, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.18 MB

english, 2018

7

Optimization of Post Etch Cobalt Compatible Clean by pH and Oxidizer

Iino, Hideaki, Ogawa, Yuichi, Masaoka, Toru, Le, Quoc Toan, Kesters, Els, Rip, Jens, Oniki, Yusuke, Akanishi, Yuya, Iwasaki, Akihisa, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.00 MB

english, 2018

8

Developing Integrated Solutions and Wet Cleans to Eliminate Tungsten Contact Attack in Sub 0x nm Nodes

Sehgal, Akshey, DeVre, Michael, Balu, Elango

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 403 KB

english, 2018

9

Post-CMP Cleaners for Tungsten Advanced Nodes: 10nm and 7nm

Lieten, Ruben R., White, Daniela, Parson, Thomas, White, Michael

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.42 MB

english, 2018

10

Industry Context for Semiconductor Wet Etch and Surface Preparation

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.64 MB

english, 2018

11

Nanoscale Etching of GaAs and InP in Acidic H2O2 Solution: A Striking Contrast in Kinetics and Surface Chemistry

van Dorp, Dennis H., Arnauts, Sophia, Laitinen, Mikko, Sajavaara, Timo, Meersschaut, Johan, Conard, Thierry, Holsteyns, Frank, Kelly, John

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 703 KB

english, 2018

12

An Observation Method of Real Contact Area during PVA Brush Scrubbing

Sanada, Toshiyuki, Hanai, Masanao, Fukunaga, Akira, Hiyama, Hirokuni

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.75 MB

english, 2018

13

Is Highly Selective Si3N4/SiO2 Etching Feasible without Phosphoric Acid?

Son, Chang Jin, Kim, Taeh Yeon, Park, Tae Gun, Lim, Sang Woo

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.24 MB

english, 2018

14

Surface Recombination Velocity Imaging of HF-Etched Si Wafers Using Dynamic Heterodyne Lock-In Carrierography

Sun, Qi Ming, Melnikov, Alexander, Mandelis, Andreas, Pagliaro, Robert

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.40 MB

english, 2018

15

300 mm Wafer Development for Pattern Collapse Evaluations

Xu, Xiu Mei, Zheng, Tao, Saib, Mohamed, Sebaai, Farid, van de Kerkhove, Jeroen, Vrancken, Nandi, Vereecke, Guy, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 843 KB

english, 2018

16

Low Temperature SiGe Steam Oxide - Aqueous Hf and NH3/NF3 Remote Plasma Etching and its Implementation as Si GAA Inner Spacer

Wostyn, Kurt, Kenis, Karine, Mertens, Hans, Vaisman Chasin, Adrian, Hikavyy, Andriy, Holsteyns, Frank, Horiguchi, Naoto

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 571 KB

english, 2018

17

Wet Etchants Penetration through Photoresist during Wet Patterning

Garnier, Philippe

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 2.14 MB

english, 2018

18

Damage-Free Cleaning of Advanced Structure Using Timely Energized Bubble Oscillation Megasonic Technology

Wang, David H., Chen, Fu Ping, Zhang, Xiao Yan, Wang, Xi, Chen, Fu Fa, Henry, Sally Ann, Chae, Kwang Kee, Chu, Zhen Ming, Liu, Feng, Chen, Yang, Lei, Hai Bo, Ni, Li Hua, Zhang, Yu, Zhu, Ye Fang, Li, F

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.81 MB

english, 2018

19

Study of the Anisotropic Wet Etching of Nanoscale Structures in Alkaline Solutions

Pacco, Antoine, Aabdin, Zainul, Anand, Utkarsh, Rip, Jens, Mirsaidov, Utkur, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 3.23 MB

english, 2018

20

Wet Processing in State-of-the-Art Cu(In,Ga)(S,Se)2 Thin Film Solar Cells

Buldu, Dilara Gokcen, de Wild, Jessica, Kohl, Thierry, Suresh, Sunil, Birant, Gizem, Brammertz, Guy, Meuris, Marc, Poortmans, Jef, Vermang, Bart

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 2.05 MB

english, 2018

21

Wet-Chemical Etching of Ruthenium in Acidic Ce4+ Solution

Philipsen, Harold, Teck, Sander, Mouwen, Nils, Monnens, Wouter, Le, Quoc Toan

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 2.10 MB

english, 2018

22

Selective Wet Etching in Fabricating SiGe and Ge Nanowires for Gate-all-Around MOSFETs

Liu, Wen Dar, Lee, Yi Chia, Sekiguchi, Ryo, Yoshida, Yukifumi, Komori, Kana, Wostyn, Kurt, Sebaai, Farid, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.86 MB

english, 2018

23

Removal of CrN Contamination from EUV Mask Backside Using Dry Cleaning

Kim, Hyun Tae, Yerriboina, Nagendra Prasad, Song, Hee Jin, Park, Jin Goo

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 2.51 MB

english, 2018

24

A New Method to Fabricate Ge Nanowires: Selective Lateral Etching of Gesn:P/Ge Multi-Stacks

Porret, Clement, Vohra, Anurag, Sebaai, Farid, Douhard, Bastien, Hikavyy, Andriy, Loo, Roger

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 2.38 MB

english, 2018

25

Behavior Analysis of Si Etching Process with HF/HNO3 Mixture in Single-Spin Wafer Process

Oinoue, Takashi, Saito, Suguru, Okuyama, Atsushi, Hagimoto, Yoshiya, Iwamoto, Hayato

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.93 MB

english, 2018

26

SiGe vs. Si Selective Wet Etching for Si Gate-all-Around

Komori, Kana, Rip, Jens, Yoshida, Yukifumi, Wostyn, Kurt, Sebaai, Farid, Liu, Wen Dar, Lee, Yi Chia, Sekiguchi, Ryo, Mertens, Hans, Hikavyy, Andriy, Holsteyns, Frank, Horiguchi, Naoto

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.61 MB

english, 2018

27

Drying Stability and Critical Height of Repeating Line/Space Structures

Bassett, Derek W.

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 261 KB

english, 2018

28

Yield Enhancement due to Addition of Bevel Cleans at Middle of Line(MOL) Zone

Tharchin, Tsultrim, Balu, Elango, Singh, Sherjang

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 693 KB

2018

29

Effect of WET treatment on Group III-V Compound Semiconductor Surface

Nishio, Kenya, Saito, Suguru, Hagimoto, Yoshiya, Iwamoto, Hayato

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 2.45 MB

english, 2018

30

Yield Enhancement due to Addition of Bevel Cleans at Middle of Line(MOL) Zone

Tharchin, Tsultrim, Balu, Elango, Singh, Sherjang

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 693 KB

english, 2018

31

Exploring Wetting Dynamics on Superhydrophobic Nanopatterned Surfaces Using ATR-FTIR

Vrancken, Nandi, Sergeant, Stefanie, Vereecke, Guy, Holsteyns, Frank, Terryn, Herman, de Gendt, Stefan, Xu, Xiu Mei

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.05 MB

english, 2018

32

Organic Material Removal by Thermally Activated Ozone Gas

Sotoku, Kota, Inaba, Masaki, Takahashi, Hiroaki

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1.26 MB

2018

33

Carbon Removal and Native Oxide Cleaning on Si and SiGe Surfaces in Previum Chamber

Wang, Fei, Jotheeswaran, Bubesh, Tolle, John, Lin, Xing, Gao, Pei Pei, Demos, Alex

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1.64 MB

2018

34

Aluminum Cleaning on Single Wafer Tool: A Case Study with Diluted HF

Broussous, Lucile

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 3.58 MB

english, 2018

35

Influence of VPT Treatment on Microscopic Distribution of Trace Metal Contaminants and its Effect on TXRF Measurement

Ohno, Rikiichi, Saga, Koichiro

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.40 MB

english, 2018

36

Toward the Surface Preparation of InGaAs for the Future CMOS Integration

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 340 KB

2018

37

Aluminum Cleaning on Single Wafer Tool: A Case Study with Diluted HF

Broussous, Lucile

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 3.58 MB

2018

38

Influence of VPT Treatment on Microscopic Distribution of Trace Metal Contaminants and its Effect on TXRF Measurement

Ohno, Rikiichi, Saga, Koichiro

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1.40 MB

2018

39

Vapor-Phase Deposition of N3-Containing Monolayers on SiO2 and Si3N4 for Wafer Scale Biofunctionalization

Vos, Rita, Steylaerts, Tim, Franquet, Alexis, Moussa, Alain, Stakenborg, Tim, Jans, Karolien

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1016 KB

2018

40

Pattern Collapse-Free Drying with Sacrificial Gap Fill Polymers

Varaprasad, Desaraju, Xie, Songyuan, Kennedy, Evelyn, Gebrebrhan, Amanuel, Huang, Hongmin, Kennedy, Joseph

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.16 MB

english, 2018

41

Advanced Data Analysis Strategies for Understanding Particle Contamination in Chemical Distribution Systems

Green, David, Rodier, Dan

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.73 MB

english, 2018

42

Determination of HCl Transport Coefficients in Real FOUP Polymers for HCl Cross-Contamination Assessment from FOUP to Wafer

Tran, Minh-Phuong, González-Aguirre, Paola, Beitia, Carlos, Lungren, Jorgen, Moon, Sung In, Fontaine, Hervé

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 2.62 MB

english, 2018

43

Electrostatic Discharge Control and Visualization in Spray Nozzle

Cha, Ji Hoon, Kim, Tae Hong, Kim, Young Hoo, Lee, Kun Tack, Koh, Yong Sun

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 677 KB

english, 2018

44

Self-Aligned Contacting Processes for the 80 nm p-MTJ Device Fabrication by Wet Approach

Cui, Hu Shan, Cao, Kai Hua, Zhang, You Guang, Xiong, Hua Gang, Wei, Jia Qi, Li, Jun Jie, Bai, Guo Bin, Li, Jun Feng, Zhao, Chao, Zhao, Wei Sheng

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.20 MB

english, 2018

45

Factors Influencing Drying Induced Pattern Collapse

Mui, David S.L., Musselwhite, Nathan, Kawaguchi, Mark

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 692 KB

english, 2018

46

Investigation of Defectivity Coming from the Back Side of Wafers during AlCu Polymer Removal Processes Performed in a Batch Spray Tool

Venegoni, Ivan, Brazzelli, Silvia, Gomarasca, Roberta, Pipia, Francesco, Alessandri, Mauro

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.23 MB

english, 2018

47

Ion Implanted Photoresist Removal by Material Loss-Free Organic Solvent

Oh, Eunseok, Lim, Sang Woo

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.69 MB

english, 2018

48

Pattern Collapse-Free Drying with Sacrificial Gap Fill Polymers

Varaprasad, Desaraju, Xie, Songyuan, Kennedy, Evelyn, Gebrebrhan, Amanuel, Huang, Hongmin, Kennedy, Joseph

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1.16 MB

2018

49

Advanced Data Analysis Strategies for Understanding Particle Contamination in Chemical Distribution Systems

Green, David, Rodier, Dan

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1.73 MB

2018

50

Determination of HCl Transport Coefficients in Real FOUP Polymers for HCl Cross-Contamination Assessment from FOUP to Wafer

Tran, Minh-Phuong, González-Aguirre, Paola, Beitia, Carlos, Lungren, Jorgen, Moon, Sung In, Fontaine, Hervé

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 2.62 MB

2018

51

Electrostatic Discharge Control and Visualization in Spray Nozzle

Cha, Ji Hoon, Kim, Tae Hong, Kim, Young Hoo, Lee, Kun Tack, Koh, Yong Sun

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 677 KB

2018

52

Fixed Charge Control of Silylated Surface for Stiction-Free Drying with Surface Energy Reduction Process

Koide, Tatsuhiko, Kimura, Shinsuke, Kobayashi, Takashi, Iimori, Hiroyasu, Tomohiko, Sugita, Sato, Katsuhiro, Ogawa, Yoshihiro

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 1.07 MB

english, 2018

53

Self-Aligned Contacting Processes for the 80 nm p-MTJ Device Fabrication by Wet Approach

Cui, Hu Shan, Cao, Kai Hua, Zhang, You Guang, Xiong, Hua Gang, Wei, Jia Qi, Li, Jun Jie, Bai, Guo Bin, Li, Jun Feng, Zhao, Chao, Zhao, Wei Sheng

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1.20 MB

2018

54

Factors Influencing Drying Induced Pattern Collapse

Mui, David S.L., Musselwhite, Nathan, Kawaguchi, Mark

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 692 KB

2018

55

Investigation of Defectivity Coming from the Back Side of Wafers during AlCu Polymer Removal Processes Performed in a Batch Spray Tool

Venegoni, Ivan, Brazzelli, Silvia, Gomarasca, Roberta, Pipia, Francesco, Alessandri, Mauro

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1.23 MB

2018

56

Ion Implanted Photoresist Removal by Material Loss-Free Organic Solvent

Oh, Eunseok, Lim, Sang Woo

Journal:

Solid State Phenomena

Year:

2018

File:

PDF, 1.69 MB

2018

57

Effect of 1-D Nano-Confinement on the Kinetics of a Click-Chemistry Surface Reaction Used in Biosensors

Vereecke, Guy, Debruyn, Haroen, de Keyser, Quinten, Vos, Rita, Dutta, Abhishek, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 795 KB

english, 2018

58

Impact of Controlled Ni Contamination on Silicon Solar Wafer Material

Gocyla, Mateusz, Haslinger, Michael, Mertens, Paul W., John, Joachim

Journal:

Solid State Phenomena

Year:

2018

Language:

english

File:

PDF, 994 KB

english, 2018