Volume 46; Issue 11

Solid-State Electronics

Volume 46; Issue 11
5

Breakdown and stress-induced oxide degradation mechanisms in MOSFETs

Year:
2002
Language:
english
File:
PDF, 534 KB
english, 2002
8

A numerical study of ballistic transport in a nanoscale MOSFET

Year:
2002
Language:
english
File:
PDF, 388 KB
english, 2002
9

Device and circuit performance of SiGe/Si MOSFETs

Year:
2002
Language:
english
File:
PDF, 163 KB
english, 2002
11

Electron emission yield of induced photoemission effect in thin ITO layers

Year:
2002
Language:
english
File:
PDF, 156 KB
english, 2002
13

Analysis of thermal noise in scaled MOS devices and RF circuits

Year:
2002
Language:
english
File:
PDF, 186 KB
english, 2002
15

High temperature characteristics of Ti/Al and Cr/Al ohmic contacts to n-type GaN

Year:
2002
Language:
english
File:
PDF, 469 KB
english, 2002
17

Foreword

Year:
2002
Language:
english
File:
PDF, 20 KB
english, 2002
20

A new high injection efficiency non-volatile memory cell: BipFlash

Year:
2002
Language:
english
File:
PDF, 276 KB
english, 2002
22

NROMTM––a new technology for non-volatile memory products

Year:
2002
Language:
english
File:
PDF, 582 KB
english, 2002
31

Proton trapping in SiO2 layers thermally grown on Si and SiC

Year:
2002
Language:
english
File:
PDF, 187 KB
english, 2002
32

Quantitative two-step hydrogen model of SiO2 gate oxide breakdown

Year:
2002
Language:
english
File:
PDF, 543 KB
english, 2002
35

Non-radiative recombination at reconstructed Si surfaces

Year:
2002
Language:
english
File:
PDF, 424 KB
english, 2002
38

Mist deposited high-k dielectrics for next generation MOS gates

Year:
2002
Language:
english
File:
PDF, 622 KB
english, 2002