Volume 395; Issue 1-2

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Thin Solid Films
Volume 395; Issue 1-2

Thin Solid Films

Volume 395; Issue 1-2

1

Preface

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 45 KB

english, 2001

2

Summary of research in NEDO Cat-CVD project in Japan

Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 698 KB

english, 2001

3

Status of Cat-CVD (Hot Wire CVD) research in the United States

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 282 KB

english, 2001

4

Status of Cat-CVD (Hot-Wire CVD) research in Europe

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 218 KB

english, 2001

5

Some physics and chemistry of hot-wire deposition

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 60 KB

english, 2001

6

Gas phase and surface kinetic processes in polycrystalline silicon hot-wire chemical vapor deposition

J.K Holt, M Swiatek, D.G Goodwin, R.P Muller, W.A Goddard III, Harry A Atwater

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 236 KB

english, 2001

7

The effect of filament temperature on the gaseous radicals in the hot wire decomposition of silane

H.L Duan, G.A Zaharias, Stacey F Bent

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 102 KB

english, 2001

8

Catalytic decomposition of SiH4 on a hot filament

Shinya Tange, Keisuke Inoue, Kenichi Tonokura, Mitsuo Koshi

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 126 KB

english, 2001

9

Identification and gas phase kinetics of radical species in Cat-CVD processes of SiH4

Yoshitaka Nozaki, Makiko Kitazoe, Katsuhiko Horii, Hironobu Umemoto, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 87 KB

english, 2001

10

Effect of hot filament on preparation of YBCO superconducting films by pulsed laser ablation in nitrous oxide gas

A Morimoto, K Asada, T Minamikawa, Y Yonezawa, T Shimizu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 431 KB

english, 2001

11

Development of the Cat-CVD apparatus and its feasibility for mass production

Keiji Ishibashi

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 256 KB

english, 2001

12

Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD

Andrea Ledermann, Urban Weber, Chandrachur Mukherjee, Bernd Schroeder

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 563 KB

english, 2001

13

Hot-wire CVD growth simulation for thickness uniformity

Jaydeep V. Sali, S.B. Patil, S.R. Jadkar, M.G. Takwale

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 136 KB

english, 2001

14

Development of Cat-CVD apparatus — a method to control wafer temperatures under thermal influence of heated catalyzer

Minoru Karasawa, Atsushi Masuda, Keiji Ishibashi, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 387 KB

english, 2001

15

Novel chamber cleaning method using atomic hydrogen generated by hot catalyzer

Kenji Uchida, Akira Izumi, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 210 KB

english, 2001

16

Elastic properties of amorphous and nanocrystalline silicon

Richard S Crandall, Xiao Liu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 119 KB

english, 2001

17

Photo-induced volume changes in a-Si:H films prepared by Cat-CVD method

Takashi Hatano, Yoshiaki Nakae, Hiromi Mori, Kaori Ohkado, Norimitsu Yoshida, Shuichi Nonomura, Masaya Itoh, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 133 KB

english, 2001

18

Hot-wire produced atomic hydrogen: effects during and after amorphous-silicon deposition

A.M Brockhoff, W.F van der Weg, F.H.P.M Habraken

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 142 KB

english, 2001

19

Hydrogenation of laser-crystallized poly-silicon thin films and characterization of defects using a catalytic method

Kuninori Kitahara, Hiroyuki Nogi, Akihiro Moritani

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 188 KB

english, 2001

20

Electrical transport properties of microcrystalline silicon thin films prepared by Cat-CVD

F Liu, M Zhu, Y Feng, Y Han, J Liu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 103 KB

english, 2001

21

Hydrogen-induced electronic states and vibrational modes in hydrogenated amorphous silicon nitride

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 247 KB

english, 2001

22

Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

J.P Conde, P Alpuim, M Boucinha, J Gaspar, V Chu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 504 KB

english, 2001

23

Guiding principles for device-grade hydrogenated amorphous silicon films and design of catalytic chemical vapor deposition apparatus

Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 91 KB

english, 2001

24

Influence of atomic hydrogen on the growth kinetics of a-Si:H films and on the properties of silicon substrates

H Seitz, S Bauer, R.O Dusane, B Schröder

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 95 KB

english, 2001

25

Is the nucleation and coalescence behavior in the growth of a-Si:H films prepared by the CAT-CVD different?

R.O Dusane, S Bauer, B Schröder, H Oechsner

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 92 KB

english, 2001

26

Investigations on doping of amorphous and nanocrystalline silicon films deposited by catalytic chemical vapour deposition

M Fonrodona, D Soler, J Bertomeu, J Andreu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 85 KB

english, 2001

27

Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments

S.K Persheyev, D.M Goldie, R.A.G Gibson, M.J Rose, S Anthony, D.J Keeble, K Robb, C Main, S Reynolds, I Zrinscak

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 101 KB

english, 2001

28

Electronic states and the light-induced metastability in hydrogenated amorphous silicon prepared by hot-wire CVD

Daxing Han, Guozhen Yue, H Habuchi, Eugene Iwaniczko, Qi Wang

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 107 KB

english, 2001

29

High-stability hydrogenated amorphous silicon films for light-soaking prepared by catalytic CVD at high deposition rates

Masaya Itoh, Yoriko Ishibashi, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 195 KB

english, 2001

30

Hot-wire deposition of photonic-grade amorphous silicon

C.M Fortmann, E.L Jaen, N Hata, W.A Anderson, A.H Mahan

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 569 KB

english, 2001

31

Influence of a-Si:H deposition by catalytic CVD on transparent conducting oxides

Kensaku Imamori, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 230 KB

english, 2001

32

High-rate deposition of silicon thin-film solar cells by the hot-wire cell method

Makoto Konagai, Takeshi Tsushima, Myoung-Kyu Kim, Koichi Asakusa, Akira Yamada, Yuriy Kudriavtsev, Antonio Villegas, Rene Asomoza

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 130 KB

english, 2001

33

Growth mechanisms and structural properties of microcrystalline silicon films deposited by catalytic CVD

C. Niikura, S.Y. Kim, B. Drévillon, Y. Poissant, P. Roca i Cabarrocas, J.E. Bourée

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 293 KB

english, 2001

34

Correlated structural and electronic properties of microcrystalline silicon films deposited at low temperature by catalytic CVD

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 128 KB

english, 2001

35

Hot-wire CVD-grown microcrystalline silicon films with and without initial growing layer modification by transformer-coupled plasma

D.Y Kim, B.J Ahn, S.I Moon, J Yi

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 302 KB

english, 2001

36

Nanocrystalline silicon from hot-wire deposition — a photovoltaic material?

K. Brühne, M.B. Schubert, C. Köhler, J.H. Werner

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 136 KB

english, 2001

37

The influence of filament temperature on crystallographic properties of poly-Si films prepared by the hot-wire CVD method

Jeong Chul Lee, Ki Hwan Kang, Seok Ki Kim, Kyung Hoon Yoon, Jinsoo Song, I Jun Park

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 913 KB

english, 2001

38

Proposal of catalytic chemical sputtering method and its application to prepare large grain size poly-Si

Koji Kamesaki, Atsushi Masuda, Akira Izumi, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 290 KB

english, 2001

39

The influence of different catalyzers in hot-wire CVD for the deposition of polycrystalline silicon thin films

P.A.T.T van Veenendaal, O.L.J Gijzeman, J.K Rath, R.E.I Schropp

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 89 KB

english, 2001

40

Fundamental considerations regarding the growth of amorphous and microcrystalline silicon and alloy films

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 73 KB

english, 2001

41

Formation of silicon films for solar cells by the Cat-CVD method

Manabu Komoda, Koji Kamesaki, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 274 KB

english, 2001

42

Preparation of silicon–carbon alloy films by hot-wire CVD and their properties

Takashi Itoh, Yoshiaki Katoh, Takao Fujiwara, Kazunori Fukunaga, Shuichi Nonomura, Shoji Nitta

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 100 KB

english, 2001

43

Photoluminescent, wide-bandgap a-SiC:H alloy films deposited by Cat-CVD using acetylene

Alka Kumbhar, Samadhan B Patil, Sanjay Kumar, R Lal, R.O Dusane

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 92 KB

english, 2001

44

Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition

Haruo Yokomichi, Atsushi Masuda, Naoki Kishimoto

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 95 KB

english, 2001

45

Attempt to synthesize carbon nanotubes by hot-wire chemical vapor deposition

H Yokomichi, F Sakai, M Ichihara, N Kishimoto

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 1.07 MB

english, 2001

46

Surface chemical reactions of diamond (100) by Cat-CVD

Xuemei Song, Mei Wang, Bo Wang, Guanghua Chen, Hui Yan

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 212 KB

english, 2001

47

Surface modification of silicon related materials using a catalytic CVD system for ULSI applications

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 252 KB

english, 2001

48

The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon (μc-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

S.R Jadkar, J.V Sali, M.G Takwale, D.V Musale, S.T Kshirsagar

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 152 KB

english, 2001

49

Structural evaluation of polycrystalline silicon thin films by hot-wire-assisted PECVD

Y Feng, M Zhu, F Liu, J Liu, H Han, Y Han

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 101 KB

english, 2001

50

Effect of r.f.-plasma assistance in hot-wire CVD on properties of μc-Si:H

Takashi Itoh, Hiroki Inouchi, Kaori Ohkado, Kenji Chikusa, Naoki Nakamura, Hiroaki Kondo, Norimitsu Yoshida, Shuichi Nonomura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 159 KB

english, 2001

51

Low temperature epitaxial growth of Si and Si1−yCy films by hot wire cell method

Tatsuro Watahiki, Katsuya Abe, Hajime Tamura, Shinsuke Miyajima, Akira Yamada, Makoto Konagai

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 185 KB

english, 2001

52

Highly conducting doped microcrystalline silicon (μc-Si:H) at very low substrate temperature by Cat-CVD

R.O Dusane, Frank Diehl, U Weber, B Schröder

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 71 KB

english, 2001

53

High-deposition rate a-Si:H n–i–p solar cells grown by HWCVD

Brent P Nelson, Eugene Iwaniczko, A.Harv Mahan, Qi Wang, Yueqin Xu, Richard S Crandall, Howard M Branz

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 131 KB

english, 2001

54

Fundamental properties of ECR plasma CVD and hydrogen-induced low temperature Si epitaxy

Kimihiro Sasaki

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 309 KB

english, 2001

55

Photo-thermal excitation gas-source MBE growth of super-doped Si:Mn for spin-photonics applications

H Nakayama, H Ohta, E Kulatov

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 197 KB

english, 2001

56

Current status of the thermo-catalytic (hot-wire) CVD of thin silicon films for photovoltaic applications

Bernd Schroeder, Urban Weber, Holger Seitz, Andrea Ledermann, Chandrachur Mukherjee

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 283 KB

english, 2001

57

Single adatom diffusion in homo- and heteroepitaxies of Si and Ge on (100)-2×1 surfaces modeled by MEAM

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 770 KB

english, 2001

58

Charge-trapping defects in Cat-CVD silicon nitride films

T Umeda, Y Mochizuki, Y Miyoshi, Y Nashimoto

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 211 KB

english, 2001

59

Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications

Stefan Klein, Friedhelm Finger, Reinhard Carius, Heribert Wagner, Martin Stutzmann

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 150 KB

english, 2001

60

Low temperature silicon nitride deposited by Cat-CVD for deep sub-micron metal–oxide–semiconductor devices

Samadhan B Patil, Alka Kumbhar, Parag Waghmare, V Ramgopal Rao, R.O Dusane

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 119 KB

english, 2001

61

A Cat-CVD Si3N4 film study and its application to the ULSI process

Yuji Uchiyama, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 384 KB

english, 2001

62

Growth of device quality p-type μc-Si:H films by hot-wire CVD for a-Si pin and c-Si heterojunction solar cells

C Mukherjee, U Weber, H Seitz, B Schröder

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 82 KB

english, 2001

63

Low-k silicon nitride film for copper interconnects process prepared by catalytic chemical vapor deposition method at low temperature

Hidekazu Sato, Akira Izumi, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 472 KB

english, 2001

64

Preparation of SiNx passivation films for PZT ferroelectric capacitors at low substrate temperatures by catalytic CVD

Toshiharu Minamikawa, Yasuto Yonezawa, Akira Heya, Yoshikazu Fujimori, Takashi Nakamura, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 153 KB

english, 2001

65

Thin film poly-Si formation by Cat-CVD method and its application for solar cells

K Niira, H Senta, H Hakuma, M Komoda, H Okui, K Fukui, H Arimune, K Shirasawa

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 980 KB

english, 2001

66

Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films

K.K.S Lau, H.G Pryce Lewis, S.J Limb, M.C Kwan, K.K Gleason

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 415 KB

english, 2001

67

Application of hot-wire chemical vapor-deposited Si:H films in thin film transistors and solar cells

Jatindra K Rath, Bernd Stannowski, Patrick A.T.T van Veenendaal, Marieke K van Veen, Ruud E.I Schropp

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 869 KB

english, 2001

68

High performance amorphous-silicon thin film transistors prepared by catalytic chemical vapor deposition with high deposition rate

Masahiro Sakai, Takayuki Tsutsumi, Tatsuo Yoshioka, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 189 KB

english, 2001

69

Stability of hydrogenated nanocrystalline silicon thin-film transistors

A Orpella, C Voz, J Puigdollers, D Dosev, M Fonrodona, D Soler, J Bertomeu, J.M Asensi, J Andreu, R Alcubilla

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 133 KB

english, 2001

70

Hot-wire silicon nitride for thin-film transistors

B Stannowski, J.K Rath, R.E.I Schropp

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 103 KB

english, 2001

71

Subject Index of Volume 395

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 76 KB

english, 2001

72

Author Index of Volume 395

Journal:

Thin Solid Films

Year:

2001

File:

PDF, 40 KB

2001