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1

Photopolymer Materials and Processes for Advanced Technologies

Crivello, James V., Reichmanis, Elsa

Journal:

Chemistry of Materials

Year:

2014

Language:

english

File:

PDF, 1.80 MB

english, 2014

2

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Correlation of the Strength of Photogenerated Acid with the Post-Exposure Delay Effect in Positive-Tone Chemically Amplified Deep-UV Resists

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Year:

1995

Language:

english

File:

PDF, 2.72 MB

english, 1995

3

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Year:

1998

Language:

english

File:

PDF, 1.37 MB

english, 1998

4

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography

Nalamasu, Omkaram, Reichmanis, Elsa, Cheng, May, Pol, Victor, Kometani, Janet M., Houlihan, Francis M., Neenan, Thomas X., Bohrer, M. P., Mixon, David A., Thompson, Larry F., Takemoto, Clifford H., It

Year:

1991

Language:

english

File:

PDF, 1.18 MB

english, 1991

5

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Development of a chemically amplified positive resist material for single-layer deep-UV lithography

Nalamasu, Omkaram, Cheng, May, Kometani, Janet M., Vaidya, Sheila, Reichmanis, Elsa, Thompson, Larry F., Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 1.06 MB

english, 1990

6

Chemically amplified resists: Chemistry and processes

E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan

Journal:

Advanced Functional Materials

Year:

1994

Language:

english

File:

PDF, 845 KB

english, 1994

7

Challenges in Lithographic Materials and Processes

Reichmanis, Elsa, Thompson, Larry F.

Journal:

AT&T Technical Journal

Year:

1990

Language:

english

File:

PDF, 7.46 MB

english, 1990

8

Chemistry and processes for deep-UV resists

E. Reichmanis, L.F. Thompson

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 539 KB

english, 1991

9

Bioelectric Considerations in the Design of High-Voltage Power Lines

Reichmanis, Maria, Marino, Andrew A.

Journal:

Electromagnetic Biology and Medicine

Year:

1982

Language:

english

File:

PDF, 273 KB

english, 1982

10

Anisotropic Assembly of Conjugated Polymer Nanocrystallites for Enhanced Charge Transport

Chang, Mincheol, Lee, Jiho, Chu, Ping-Hsun, Choi, Dalsu, Park, Byoungnam, Reichmanis, Elsa

Journal:

ACS Applied Materials & Interfaces

Year:

2014

Language:

english

File:

PDF, 8.07 MB

english, 2014

11

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Excimer Laser Exposure Characteristics Of Inorganic Resists Based On Peroxo-Polytungstic Acids

Ishikawa, Akira, Okamoto, Hiroshi, Miyauchi, Katsuki, Kudo, Tetsuichi, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 6.46 MB

english, 1989

12

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Novolak Based Thermally Resistant Positive Photoresist: Resin Design and Performance

Zampini, A., Fischer, R. L., Wickman, J. B., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 13.67 MB

english, 1989

13

Control of Molecular Ordering, Alignment, and Charge Transport in Solution-Processed Conjugated Polymer Thin Films

Chang, Mincheol, Lim, Gyun, Park, Byoungnam, Reichmanis, Elsa

Journal:

Year:

2017

Language:

english

File:

PDF, 8.38 MB

english, 2017

14

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Calixarene and Dendrimer as Novel Photoresist Materials

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Year:

1998

Language:

english

File:

PDF, 878 KB

english, 1998

15

Unsubstituted 9-Azabarbaralane; A π-Destabilized Heterocycle

Prof. Dr. A. G. Anastassiou, Dr. E. Reichmanis, A. E. Winston

Journal:

Angewandte Chemie International Edition

Year:

1976

Language:

english

File:

PDF, 241 KB

english, 1976

16

Electrical Correlates of Acupuncture Points

Reichmanis, Maria, Marino, Andrew A., Becker, Robert O.

Journal:

IEEE Transactions on Biomedical Engineering

Year:

1975

Language:

english

File:

PDF, 869 KB

english, 1975

17

Polymer materials for microlithography

Reichmanis, Elsa, Thompson, Larry F.

Journal:

Chemical Reviews

Year:

1989

Language:

english

File:

PDF, 4.46 MB

english, 1989

18

Electrical Contact Properties between the Accumulation Layer and Metal Electrodes in Ultrathin Poly(3-hexylthiophene)(P3HT) Field Effect Transistors

Park, Byoungnam, Aiyar, Avishek, Hong, Jung-il, Reichmanis, Elsa

Journal:

ACS Applied Materials & Interfaces

Year:

2011

Language:

english

File:

PDF, 2.52 MB

english, 2011

19

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - A Chemical Reaction And Influence Of Deep-UV Light Wavelength On REL (Resolution Enhanced Lithography)

Fukumoto, H., Okuda, Y., Takashima, Y., Ohkuma, T., Ueda, S., Inoue, M., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 3.67 MB

english, 1989

20

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Year:

1998

Language:

english

File:

PDF, 1.15 MB

english, 1998

21

Power frequency electric field induces biological changes in successive generations of mice

A. A. Marino, Maria Reichmanis, R. O. Becker, Betsy Ullrich, J. M. Cullen

Journal:

Cellular and Molecular Life Sciences

Year:

1980

Language:

english

File:

PDF, 356 KB

english, 1980

22

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - A Novel Photooxidative Scheme for Imaging at Polymer Surfaces

Nalamasu, Omkaram, Taylor, Gary N., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 15.58 MB

english, 1989

23

High capacity Li-ion battery anodes: Impact of crystallite size, surface chemistry and PEG-coating

Minnici, Krysten, Kwon, Yo Han, Huie, Matthew M., de Simon, Mark V., Zhang, Bingjie, Bock, David C., Wang, Jiajun, Wang, Jun, Takeuchi, Kenneth J., Takeuchi, Esther S., Marschilok, Amy C., Reichmanis,

Journal:

Electrochimica Acta

Year:

2018

Language:

english

File:

PDF, 19.38 MB

english, 2018

24

Photopolymerization of Surface Coatingsby C. G. Roffey

Review by: Elsa Reichmanis

Journal:

American Scientist

Year:

1984

Language:

english

File:

PDF, 336 KB

english, 1984

25

Organic Materials Challenges for 193 nm Imaging

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Frank M.

Journal:

Accounts of Chemical Research

Year:

1999

Language:

english

File:

PDF, 227 KB

english, 1999

26

An overview of resist processing for deep-UV lithography.

NALAMASU, OMKARAM, CHENG, MAY, TIMKO, ALLEN G., POL, VICTOR, REICHMANIS, ELSA, THOMPSON, LARRY F.

Journal:

Journal of Photopolymer Science and Technology

Year:

1991

Language:

english

File:

PDF, 830 KB

english, 1991

27

[ACS Symposium Series] Polymers in Microlithography Volume 412 (Materials and Processes) || Pyrimidine Derivatives as Lithographic Materials

Reichmanis, Elsa, MacDonald, Scott A., Iwayanagi, Takao

Year:

1989

Language:

english

File:

PDF, 1.24 MB

english, 1989

28

Perovskite solar cells with a hybrid electrode structure

Hu, Yinghong, Adhyaksa, Gede W. P., DeLuca, Giovanni, Simonov, Alexandr N., Duffy, Noel W., Reichmanis, Elsa, Bach, Udo, Docampo, Pablo, Bein, Thomas, Garnett, Erik C., Chesman, Anthony S. R., Jumabek

Journal:

Year:

2019

Language:

english

File:

PDF, 2.49 MB

english, 2019

29

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - An I-Line Image Reversal Process For Submicron Lithography

Chu, Ron, Singh, Bhanwar, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 13.77 MB

english, 1989

30

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Deep UV ANR Photoresists For 248 nm Excimer Laser Photolithography

Thackeray, James W., Orsula, George W., Pavelchek, Edward K., Canistro, Dianne, Bogan, Jr., Leonard E., Berry, Amanda K., Graziano, Karen A., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 16.45 MB

english, 1989

31

A unified approach to resists materials design for the advanced lithographic technologies

O. Nalamasu, E. Reichmanis, A.G. Timko, R. Tarascon, A.E. Novembre, S. Slater, H. Holzwarth, P. Falcigno, N. Mu¨nzel

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 548 KB

english, 1995

32

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Water-Soluble Onium Salts: New Class of Acid Generators for Chemical Amplification Positive Resists

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Year:

1995

Language:

english

File:

PDF, 1.66 MB

english, 1995

33

Ring Patterned Perovskite Single Crystals Fabricated by the Combination of Rigid and Flexible Templates

Zhou, Haihua, Liu, Weicai, Chang, Rui, Huang, Zhandong, Sha, Xuzheng, Chen, Guozhu, Reichmanis, Elsa, Song, Yanlin

Journal:

ACS Applied Materials & Interfaces

Year:

2020

File:

PDF, 1.08 MB

2020

34

Barley leaf tip damage resulting from exposure to high electrical fields

C. H. Bachman, M. Reichmanis

Journal:

International Journal of Biometeorology

Year:

1973

Language:

english

File:

PDF, 670 KB

english, 1973

35

Chemical amplification mechanisms for microlithography

Reichmanis, E., Houlihan, F. M., Nalamasu, O., Neenan, T. X.

Journal:

Chemistry of Materials

Year:

1991

Language:

english

File:

PDF, 3.80 MB

english, 1991

36

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Photoacid and Photobase Generators: Arylmethyl Sulfones and Benzhydrylammonium Salts

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Year:

1995

Language:

english

File:

PDF, 1.69 MB

english, 1995

37

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Positive-Working Polyimide Resists Based On Diazonaphthoquinone Photochemistry

Moss, Mary G., Cuzmar, Ruth M., Brewer, Terry, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 3.10 MB

english, 1989

38

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || An Analysis of Process Issues with Chemically Amplified Positive Resists

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Year:

1995

Language:

english

File:

PDF, 2.44 MB

english, 1995

39

Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study

O. Nalamasu, E. Reichmanis, J. E. Hanson, R. S. Kanga, L. A. Heimbrook, A. B. Emerson, F. A. Baiocchi, S. Vaidya

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 600 KB

english, 1992

40

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Chemically Amplified Resists: A Lithographic Comparison of Acid Generating Species.

Neenan, T. X., Houlihan, F. M., Reichmanis, E., Kometani, J. M., Bachman, B. J., Thompson, L. F., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 1.77 MB

english, 1989

41

[ACS Symposium Series] Polymers in Microlithography Volume 412 (Materials and Processes) || New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals

Reichmanis, Elsa, MacDonald, Scott A., Iwayanagi, Takao

Year:

1989

Language:

english

File:

PDF, 1.05 MB

english, 1989

42

[ACS Symposium Series] The Effects of Radiation on High-Technology Polymers Volume 381 || Radiation Durability of Polymeric Matrix Composites

Reichmanis, Elsa, O'Donnell, James H.

Year:

1989

Language:

english

File:

PDF, 1.93 MB

english, 1989

43

Lithographic Materials Technologies: 193 nm Imaging and Beyond

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Francis M., Gabor, Allen H., Neisser, Mark O., Bowden, Murrae J.

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 871 KB

english, 1999

44

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Following the Acid: Effect of Acid Surface Depletion on Phenolic Polymers

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Year:

1995

Language:

english

File:

PDF, 1.84 MB

english, 1995

45

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - The Effect Of Sensitizer Chemistry On Decarboxylation-Type Image Reversal Systems

Grunwald, John J., Gal, Chava, Aronhime, Marc T., Eidelman, Sigalit, Johnson, Donald W., Shalom, Eitan, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 7.64 MB

english, 1989

46

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Improved Thermal Stability Of High Resolution Positive Photoresists Via Elevated Softbake Temperatures

Aronhime, Marc T., Gal, Chava, Silady, Shoshana, Grunwald, John J., Johnson, Donald W., Martin, Jr., Theodore A., Spencer, Allen C., Sawoska, David A., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 805 KB

english, 1989

47

Electron/Ion Transport Enhancer in High Capacity Li-Ion Battery Anodes

Kwon, Yo Han, Minnici, Krysten, Huie, Matthew M., Takeuchi, Kenneth J., Takeuchi, Esther S., Marschilok, Amy C., Reichmanis, Elsa

Journal:

Chemistry of Materials

Year:

2016

Language:

english

File:

PDF, 1.39 MB

english, 2016

48

Wetting of Inkjet Polymer Droplets on Porous Alumina Substrates

Zhou, Haihua, Chang, Rui, Reichmanis, Elsa, Song, Yanlin

Journal:

Year:

2017

Language:

english

File:

PDF, 1.36 MB

english, 2017

49

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Dry Developable Plasma Polymerized Photo-Resist System For Curved Surface Fabrication

Yamada, Hitomi, Nakamura, Makoto, Morita, Shinzo, Hattori, Shuzo, Ishikawa, Norio, Miyazaki, Masao, Katsuragi, Hayato, Mori, Kiyoto, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 2.84 MB

english, 1989

50

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Hydrogen Bonding in Sulfone- and N -Methylmaleimide-Containing Resist Polymers with Hydroxystyrene and Acetoxystyrene

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Year:

1995

Language:

english

File:

PDF, 1.74 MB

english, 1995

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