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101

4578587 Error-corrected corpuscular beam lithography

Uwe Behringer, Harald Bohlen, Peter Nehmiz, Werner Zapka

Journal:

Microelectronics Reliability

Year:

1987

Language:

english

File:

PDF, 183 KB

english, 1987

102

Physical and biological properties of barium cross-linked alginate membranes

Heiko Zimmermann, Felix Wählisch, Claudia Baier, Markus Westhoff, Randolph Reuss, Dirk Zimmermann, Marcus Behringer, Friederike Ehrhart, Alisa Katsen-Globa, Christoph Giese, Uwe Marx, Vladimir L. Sukh

Journal:

Year:

2007

Language:

english

File:

PDF, 1.77 MB

english, 2007

103

Preface

Olaf Fortagne, Dieter P. Kern, Uwe Behringer

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 23 KB

english, 2001

104

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - Novel fabrication process for 3D meander-shaped microcoils in SU-8 dielectric and their application to linear micromotors

Seidemann, Volker, Buettgenbach, Stephanus, Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 666 KB

english, 2001

105

SPIE Proceedings [SPIE 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 15 November 1999)] 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Mask fabrication by nanoimprint lithography using antisticking layers

Schulz, Hubert, Osenberg, Frank, Engemann, J., Scheer, Hella-Christin, Behringer, Uwe F. W.

Year:

2000

Language:

english

File:

PDF, 1.67 MB

english, 2000

106

SPIE Proceedings [SPIE 28th European Mask and Lithography Conference (EMLC 2012) - Dresden, Germany (Tuesday 17 January 2012)] 28th European Mask and Lithography Conference - Pointwise process proximity function calibration: PPFexplorer application results

Krueger, M., Banasch, M., Galler, R., Melzer, D., Ramos, L. E., Suelzle, M., Weidenmueller, U., Zeitner, U., Behringer, Uwe F.W., Maurer, Wilhelm

Year:

2012

Language:

english

File:

PDF, 1.12 MB

english, 2012

107

SPIE Proceedings [SPIE 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 13 November 2000)] 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Electron-beam lithography data preparation based on multithreading MGS/PROXECCO

Eichhorn, Hans, Lemke, Melchior, Gramss, Juergen, Buerger, B., Baetz, Uwe, Belic, Nikola, Eisenmann, Hans, Behringer, Uwe F. W.

Year:

2001

Language:

english

File:

PDF, 480 KB

english, 2001

108

SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - MSB for ILT masks

Gramss, Juergen, Weidenmueller, Ulf, Stoeckel, Arnd, Jaritz, Renate, Doering, Hans-Joachim, Boettcher, Monika, Behringer, Uwe F.W.

Year:

2011

Language:

english

File:

PDF, 1.24 MB

english, 2011

109

SPIE Proceedings [SPIE 22nd European Mask and Lithography Conference - Dresden, Germany (Monday 23 January 2006)] 22nd European Mask and Lithography Conference - Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Lee, Sung-Woo, Leunissen, Leonardus H. A., Van de Kerkhove, Jeroen, Philipsen, Vicky, Jonckheere, Rik, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae, Behringer, Uwe F. W.

Year:

2006

Language:

english

File:

PDF, 417 KB

english, 2006

110

SPIE Proceedings [SPIE 26th European Mask and Lithography Conference - Grenoble, France (Monday 18 January 2010)] 26th European Mask and Lithography Conference - Mask industry assessment trend analysis: 2010

Hughes, Greg, Yun, Henry, Behringer, Uwe F.W., Maurer, Wilhelm

Year:

2010

File:

PDF, 174 KB

2010

111

SPIE Proceedings [SPIE 28th European Mask and Lithography Conference (EMLC 2012) - Dresden, Germany (Tuesday 17 January 2012)] 28th European Mask and Lithography Conference - Mask industry assessment trend analysis: 2012

Chan, Y. David, Behringer, Uwe F.W., Maurer, Wilhelm

Year:

2012

Language:

english

File:

PDF, 2.27 MB

english, 2012

112

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - Characterization and optimization of deep dry etching for MEMS applications

Rickard, Alexandra L., McNie, Mark E., Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 490 KB

english, 2001

113

SPIE Proceedings [SPIE 28th European Mask and Lithography Conference (EMLC 2012) - Dresden, Germany (Tuesday 17 January 2012)] 28th European Mask and Lithography Conference - Lithographic aspects for the fabrication of BiCMOS embedded bio-MEMS and RF-MEMS

Kulse, P., Birkholz, M., Ehwald, K.-E., Kaynak, M., Wietstruck, M., Bauer, J., Drews, J., Schulz, K., Behringer, Uwe F.W., Maurer, Wilhelm

Year:

2012

Language:

english

File:

PDF, 760 KB

english, 2012

114

SPIE Proceedings [SPIE Photonics Fabrication Europe - Brugge, Belgium (Monday 28 October 2002)] MEMS/MOEMS: Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly - Lithographic performance of an ASML i-line step-and-repeat system by using photosensitive Durimides

Pellens, Rudy J. M., van Klaveren, Angelique, Voets, Rutger, van den Heuvel, Jean-Paul, Misat, Sylvain, Waterson, Pamela J., Peterson, Laurie J., Behringer, Uwe F. W., Courtois, Bernard, Khounsary, Al

Year:

2003

Language:

english

File:

PDF, 710 KB

english, 2003

115

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - Suspended substrate stripline structures evaluation for millimeter-wave circuits application

Fu, Jeffrey S., Lu, Chao, Kwok, Boon C., Lee, Wendy Y., Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 231 KB

english, 2001

116

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - SEM image contrast modeling for mask and wafer metrology

Frase, C. G., Gnieser, D., Johnsen, K.-P., Häßler-Grohne, W., Tutsch, R., Bosse, H., Behringer, Uwe F. W.

Year:

2009

Language:

english

File:

PDF, 958 KB

english, 2009

117

SPIE Proceedings [SPIE Dresden, Germany - Dresden (Tuesday 5 January 2027)] 21st European Mask and Lithography Conference - ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam

Allen, Paul C., Bohan, Mike, Christenson, Eric R., Dai, H., Duane, M., Hamaker, H. C., Howells, Sam C., Kenan, Boaz, Pirogovsky, Peter, Sadiq, Malik K., Teitzel, Robin, White, Michael, Behringer, Uwe

Year:

2005

Language:

english

File:

PDF, 558 KB

english, 2005

118

SPIE Proceedings [SPIE 30th European Mask and Lithography Conference - Dresden, Germany (Tuesday 24 June 2014)] 30th European Mask and Lithography Conference - Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances

Behringer, Uwe F. W., Fenger, Germain, Torres, J. Andres, Ma, Yuansheng, Granik, Yuri, Krasnova, Polina, Fouquet, Antoine, Belledent, Jérôme, Gharbi, Ahmed, Tiron, Raluca

Year:

2014

Language:

english

File:

PDF, 1.64 MB

english, 2014

119

SPIE Proceedings [SPIE Photonics Fabrication Europe - Brugge, Belgium (Monday 28 October 2002)] MEMS/MOEMS: Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly - Highly thermally conductive substrates with adjustable CTE for diode laser bar packaging

Lorenzen, Dirk, Hennig, Petra, Behringer, Uwe F. W., Courtois, Bernard, Khounsary, Ali M., Uttamchandani, Deepak G.

Year:

2003

Language:

english

File:

PDF, 1.04 MB

english, 2003

120

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - Electrothermal modeling of silicon PCR chips

Cui, Zheng, Zhao, Zhan, Xia, Shanhong, Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 1.40 MB

english, 2001

121

SPIE Proceedings [SPIE 29th European Mask and Lithography Conference - Dresden, Germany (Tuesday 25 June 2013)] 29th European Mask and Lithography Conference - Chemical Semi-Amplified positive E-beam Resist (CSAR 62) for highest resolution

Schirmer, M., Büttner, B., Syrowatka, F., Schmidt, G., Köpnick, T., Kaiser, C., Behringer, Uwe F. W., Maurer, Wilhelm

Year:

2013

Language:

english

File:

PDF, 2.42 MB

english, 2013

122

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - MEMS technologies for rf communications

Wu, Qun, Kim, B. K., Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 170 KB

english, 2001

123

SPIE Proceedings [SPIE 30th European Mask and Lithography Conference - Dresden, Germany (Tuesday 24 June 2014)] 30th European Mask and Lithography Conference - New LEEPL technology

Behringer, Uwe F. W., Utsumi, Takao

Year:

2014

Language:

english

File:

PDF, 2.80 MB

english, 2014

124

SPIE Proceedings [SPIE 30th European Mask and Lithography Conference - Dresden, Germany (Tuesday 24 June 2014)] 30th European Mask and Lithography Conference - Imaging performance and challenges of 10nm and 7nm logic nodes with 0.33 NA EUV

Behringer, Uwe F. W., van Setten, Eelco, Schiffelers, Guido, Psara, Eleni, Oorschot, Dorothe, Davydova, Natalia, Finders, Jo, Depre, Laurent, Farys, Vincent

Year:

2014

Language:

english

File:

PDF, 5.74 MB

english, 2014

125

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surface

Ganesan, Ramakrishnan, Youn, Seul Ki, Yun, Jei-Moon, Kim, Jin-Baek, Behringer, Uwe F.

Year:

2008

Language:

english

File:

PDF, 408 KB

english, 2008

126

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - High-resolution and high-precision pattern placement metrology for the 45 nm node and beyond

Klose, G., Buttgereit, U., Arnz, M., Rosenkranz, N., Behringer, Uwe F.

Year:

2008

Language:

english

File:

PDF, 940 KB

english, 2008

127

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - Design of a micro-Wankel rotary engine for MEMS fabrication

Jiang, Kyle C., Prewett, Philip D., Ward, M. C. L., Tian, Y., Yang, H., Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 335 KB

english, 2001

128

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - MEMS and mil/aero: technology push and market pull

Clifford, Thomas H., Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 648 KB

english, 2001

129

SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - Multilayer reticles: advantages and challenges for 28nm chip making

Hotzel, Arthur, Seltmann, Rolf, Busch, Jens, Cotte, Eric, Behringer, Uwe F.W.

Year:

2011

Language:

english

File:

PDF, 6.16 MB

english, 2011

130

SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z

Plontke, Rainer, Bettin, Lutz, Beyer, Dirk, Butschke, Joerg, Irmscher, Mathias, Koepernik, Corinna, Leibold, Bernd, Vix, Armelle B. E., Voehringer, Peter, Behringer, Uwe F. W.

Year:

2004

Language:

english

File:

PDF, 872 KB

english, 2004

131

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Skeleton-based OPC application for DSA full chip mask correction

Behringer, Uwe F.W., Finders, Jo, Schneider, L., Farys, V., Serret, E., Fenouillet-Beranger, C.

Year:

2015

Language:

english

File:

PDF, 477 KB

english, 2015

132

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses

Haessler-Grohne, Wolfgang, Hahm, K, Mirande, Werner, Bosse, Harald, Arnz, Michael, Behringer, Uwe F. W.

Year:

2002

Language:

english

File:

PDF, 979 KB

english, 2002

133

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Simulation study of 193-nm phase-shifting masks: analysis of distributed defects of embeded attenuated phase mask (EAPSM)

Karklin, Linard, Behringer, Uwe F. W.

Year:

2002

Language:

english

File:

PDF, 351 KB

english, 2002

134

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - New alignment marks for improved measurement maturity

Weidenmueller, U., Alves, H., Schnabel, B., Icard, B., Pain, L., Le Denmat, J.-C., Manakli, S., Pradelles, J., Behringer, Uwe F.

Year:

2008

Language:

english

File:

PDF, 203 KB

english, 2008

135

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - Advances in silicon-to-glass bonding with laser

Wild, Michael J., Gillner, Arnold, Poprawe, Reinhart, Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 274 KB

english, 2001

136

SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - Determination of residual stress and elastic constants of silicon open stencil masks for ion projection lithography

Degen, Artur, Shi, Feng, Sossna, Eva, Sunyk, R., Voigt, Joachim, Volland, Burkhard E., Reinker, B., Rangelow, Ivo W., Behringer, Uwe F. W.

Year:

1999

Language:

english

File:

PDF, 2.00 MB

english, 1999

137

SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - Mask 3D effects: impact on imaging and placement

Finders, Jo, Hollink, Thijs, Behringer, Uwe F.W.

Year:

2011

Language:

english

File:

PDF, 1.15 MB

english, 2011

138

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - Micro stereo lithography for fabrication of 3D polymeric and ceramic MEMS

Varadan, Vijay K., Varadan, Vasundara V., Behringer, Uwe F. W., Uttamchandani, Deepak G.

Year:

2001

Language:

english

File:

PDF, 2.00 MB

english, 2001

139

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - Improving yield and cycle time at the inspection process by means of a new defects disposition technique

Villa, Ernesto, Sartelli, Luca, Miyashita, Hiroyuki, Sundermann, Frank, Gough, Stuart, Dufaye, Felix, Sippel, Astrid, Behringer, Uwe F. W.

Year:

2009

Language:

english

File:

PDF, 4.61 MB

english, 2009

140

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Measuring contact hole corner rounding uniformity using optical scatterometry

Lam, John C., Gray, Alexander, Chen, Stanley, Richter, Jan, Behringer, Uwe F.

Year:

2008

Language:

english

File:

PDF, 354 KB

english, 2008

141

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique

Shao, Feng, Evanschitzky, Peter, Reibold, David, Erdmann, Andreas, Behringer, Uwe F.

Year:

2008

Language:

english

File:

PDF, 1.47 MB

english, 2008

142

SPIE Proceedings [SPIE 22nd European Mask and Lithography Conference - Dresden, Germany (Monday 23 January 2006)] 22nd European Mask and Lithography Conference - Advanced processes for photomask damage-free cleaning and photoresist removal

Papanu, James S., Gouk, Roman, Chen, Han-Wen, Boelen, Pieter, Peters, Phillip, Belisle, Michael, Verhaverbeke, Steven, Ko, Alexander, Child, Kent, Martinez, Elias, Behringer, Uwe F. W.

Year:

2006

Language:

english

File:

PDF, 195 KB

english, 2006

143

SPIE Proceedings [SPIE 28th European Mask and Lithography Conference (EMLC 2012) - Dresden, Germany (Tuesday 17 January 2012)] 28th European Mask and Lithography Conference - Enhanced e-beam pattern writing for nano-optics based on character projection

Kley, E.-Bernhard, Schmidt, Holger, Zeitner, Uwe, Banasch, Michael, Schnabel, Bernd, Behringer, Uwe F.W., Maurer, Wilhelm

Year:

2012

Language:

english

File:

PDF, 3.80 MB

english, 2012

144

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Product layout induced topography effects on intrafield levelling

Behringer, Uwe F.W., Finders, Jo, Simiz, J.-G., Hasan, T., Staals, F., Le-Gratiet, B., Tel, W. T., Prentice, C., Tishchenko, A.

Year:

2015

Language:

english

File:

PDF, 4.09 MB

english, 2015

145

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - YieldStar based reticle 3D measurements and its application

Behringer, Uwe F.W., Finders, Jo, Vaenkatesan, Vidya, Schellekens, Twan, Davydova, Natalia, Dillen, Harm, van Dijk, Joep

Year:

2015

Language:

english

File:

PDF, 1.99 MB

english, 2015

146

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Experimental validation of novel EUV mask technology to reduce mask 3D effects

Behringer, Uwe F.W., Finders, Jo, Van Look, Lieve, Philipsen, Vicky, Hendrickx, Eric, Davydova, Natalia, Wittebrood, Friso, de Kruif, Robert, van Oosten, Anton, Miyazaki, Junji, Fliervoet, Timon, van

Year:

2015

Language:

english

File:

PDF, 1.22 MB

english, 2015

147

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Investigations for an alternative to contact angle measurement after Hexamethyldisilazane deposition

Behringer, Uwe F.W., Finders, Jo, Aßmann, H., Krause, A., Maurer, R., Dankelmann, M., Specht, M., Usry, W., Newcomb, R.

Year:

2015

Language:

english

File:

PDF, 430 KB

english, 2015

148

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - OPC verification considering CMP induced topography

Behringer, Uwe F.W., Finders, Jo, Kuncha, Rakesh Kumar, Narayana Samy, Aravind, Katakamsetty, Ushasree

Year:

2015

Language:

english

File:

PDF, 674 KB

english, 2015

149

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Increasing efficiency and effectiveness of processes related to airborne particles in reticle mask environments

Behringer, Uwe F.W., Finders, Jo, Jackson, Allyn

Year:

2015

Language:

english

File:

PDF, 661 KB

english, 2015

150

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Patterning options for N7 logic: prospects and challenges for EUV

Behringer, Uwe F.W., Finders, Jo, van Setten, Eelco, Wittebrood, Friso, Psara, Eleni, Oorschot, Dorothe, Philipsen, Vicky

Year:

2015

Language:

english

File:

PDF, 1.29 MB

english, 2015