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101

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Study of Cr patch validity for ArF CPL mask and its fabrication

Kim, Chang-Hwan, Smith, Bruce W., Kim, Sung-Hyuk, Lee, Myoung-Soo, Park, Ji-Soong, Shin, In-Gyun, Choi, Sung-Woon, Yoon, Hee-Sun, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 571 KB

english, 2004

102

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Quantitative analysis of develop loading effect and its application

Han, Hak-Seung, Moon, Se-Gun, Yoon, Je-Bum, Kim, Byung-Gook, Moon, Seong-Yong, Choi, Seong-Woon, Han, Woo-Sung, Staud, Wolfgang, Weed, J. Tracy

Year:

2004

Language:

english

File:

PDF, 168 KB

english, 2004

103

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing

Kim, Sook-Kyeong, Komuro, Masanori, Kim, Byung-Gook, Moon, Seong-Yong, Choi, Sung-Woon, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 277 KB

english, 2005

104

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Virtual OPC at hyper NA lithography

Lee, Sook, Flagello, Donis G., Kim, Sang-Wook, Chun, Yong-Jin, Suh, Sung-Soo, Jang, Yun-Kyeong, Lee, Suk-Joo, Choi, Sung-Woon, Han, Woo-Sung

Year:

2007

Language:

english

File:

PDF, 645 KB

english, 2007

105

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Assessments on process parameters' influences to the proximity correction

Lee, Eun-Mi, Silver, Richard M., Lee, Sung-Woo, Lee, Doo-Youl, Choi, Soo-Han, Park, Joo-On, Jung, Sung-Gon, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 126 KB

english, 2004

106

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - The characterization of line-width in mask using spectrophotometry

Bang, Kyoung-Yoon, Hoga, Morihisa, Choi, Yo-Han, Yoon, Han-June, Jeong, Hae-Young, Kim, Yong-Hoon, Choi, Seung-Woon, Yoon, Hee-Sun, Han, Woo-Sung

Year:

2006

Language:

english

File:

PDF, 492 KB

english, 2006

107

SPIE Proceedings [SPIE 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 13 November 2000)] 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Application of e-beam chemically amplified resist to devices below 0.18-μm node

Jeon, Chan-Uk, Kim, Chang-Hwan, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Behringer, Uwe F. W.

Year:

2001

Language:

english

File:

PDF, 884 KB

english, 2001

108

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Kim, Sang-Wook, Smith, Bruce W., Lee, Sung-Woo, Park, Chang-Min, Choi, Soo-Han, Lee, Young-Mi, Kang, Yool, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 815 KB

english, 2004

109

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Measurement of the flare and in-field linewidth variation due to the flare

Jeong, Tae Moon, Choi, Seong-Woon, Woo, Sang-Gyun, Han, Woo-Sung, Sohn, Jung-Min, Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 467 KB

english, 2002

110

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Reduction of MDP time through the improvement of verification method

Noh, Young-Hwa, Hoga, Morihisa, Jang, Sung-Hoon, Ki, Won-Tai, Choi, Ji-Hyeon, Choi, Seong-Woon, Han, Woo-Sung

Year:

2006

Language:

english

File:

PDF, 1.32 MB

english, 2006

111

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Application of multistep quartz etching method to strong PSMs

Kim, Hyoungdo, Kim, Yong-Hoon, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Kawahira, Hiroichi

Year:

2001

Language:

english

File:

PDF, 353 KB

english, 2001

112

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Load balancing using DP management server for commercial MDP software

Kim, Jong-Won, Martin, Patrick M., Naber, Robert J., Ki, Won-Tai, Jang, Sung-Hoon, Choi, Ji-Hyun, Choi, Seong-Woon, Han, Woo-Sung

Year:

2006

Language:

english

File:

PDF, 390 KB

english, 2006

113

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Comparative study on MEEF and dose latitude between attenuated PSM and Cr binary masks

Cho, Hyun J., Kim, Yong-Hoon, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Morimoto, Hiroaki

Year:

2000

Language:

english

File:

PDF, 428 KB

english, 2000

114

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Resolution improvement of chemical-amplification resist using process-induced effect correction

Choi, Ji-Hyeon, Kim, Chang-Hwan, Lee, Jeong-Yun, Moon, Seong-Yong, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Kawahira, Hiroichi

Year:

2001

Language:

english

File:

PDF, 278 KB

english, 2001

115

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Mask fabrication results using new laser writing system: Sigma7300

Lee, Ho-June, Hoga, Morihisa, Nam, Dong-Suk, Lee, Sang-Hee, Kim, Hyun-Soo, Lee, Jung-Hoon, Han, Hak-Seung, Kim, Byung-Gook, Choi, Seong-Woon, Han, Woo-Sung

Year:

2006

Language:

english

File:

PDF, 713 KB

english, 2006

116

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - EUV sensitive photo-acid generator sans chromophore

Mayya, K. Subramanya, Chen, Alek C., Han, Woo-Sung, Kang, Yool, Yasue, Takahiro, Lin, Burn J., Yen, Anthony, Oh, Seok-Hwan, Choi, Seong-Woon, Park, Chan-Hoon

Year:

2009

Language:

english

File:

PDF, 3.51 MB

english, 2009

117

Full Donor Chimerism Using Stem-Cell Transplantation for Tolerance Induction in the Human Leukocyte Antigen-Matched Liver Transplant Setting

Kim, Sung-Yong, Kim, Dong-Wook, Choi, Jong-Young, Kim, Dong-Goo, Min, Woo-Sung, Lee, Jong-Wook, Kim, Chun-Choo

Journal:

Transplantation Journal

Year:

2009

Language:

english

File:

PDF, 157 KB

english, 2009

118

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Improved process control of photomask fabrication in e-beam lithography

Cha, Byung-Cheol, Park, Jin-Hong, Choi, Yo-Han, Kim, Jin-Min, Han, Woo-Sung, Yoon, Hee-Sun, Sohn, Jung-Min, Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 121 KB

english, 2001

119

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Optical proximity correction considering mask manufacturability and its application to 0.25-μm DRAM for enhanced device performance

Park, Chul-Hong, Rhie, Sang-Uhk, Choi, Ji-Hyeon, Park, Ji-Soong, Seo, Hyeong-Weon, Kim, Yoo-Hyon, Park, Young-Kwan, Han, Woo-Sung, Lee, Won-Seong, Kong, Jeong-Taek, Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 504 KB

english, 2000

120

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Mask considerations for manufacturing assist features

Choi, Ji-Hyeon, Cho, Won-Il, Kim, Byeongsoo, Yang, Seung-Hune, Moon, Seong-Yong, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 455 KB

english, 2001

121

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Flare-induced CD variation correction using transmittance controlled mask

Nam, Dong-Seok, Yeo, Gi-Sung, Park, Jong Rak, Choi, Sung-Woon, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Yen, Anthony

Year:

2003

Language:

english

File:

PDF, 1.51 MB

english, 2003

122

SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Optimized distributed computing environment for mask data preparation

Ahn, Byoung-Sup, Weed, J. Tracy, Martin, Patrick M., Bang, Ju-Mi, Ji, Min-Kyu, Kang, Sun, Jang, Sung-Hoon, Choi, Yo-Han, Ki, Won-Tai, Choi, Seong-Woon, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 624 KB

english, 2005

123

SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - A study of Cr to Mosi in-situ dry etching process to reduce plasma induced defect

Jang, Il-Yong, Weed, J. Tracy, Martin, Patrick M., Park, Young-Ju, Kwon, Hyuk-Joo, Moon, Seong-Yong, Choi, Seong-Woon, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 163 KB

english, 2005

124

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Qualitative analysis of haze defects

Choi, Jaehyuck, Martin, Patrick M., Naber, Robert J., Koh, Soowan, Ji, Sunghun, Cha, Byung-Cheol, Choi, Seong-Woon, Han, Woo-Sung

Year:

2006

Language:

english

File:

PDF, 690 KB

english, 2006

125

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Application of chemically amplified resist to 10-keV e-beam system

Ahn, Sung-Hee, Kim, Chang-Hwan, Yang, Seung-Hune, Moon, Seong-Yong, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Kawahira, Hiroichi

Year:

2001

Language:

english

File:

PDF, 871 KB

english, 2001

126

The Activating Killer Cell Immunoglobulin-Like Receptors as Important Determinants of Acute Graft-Versus Host Disease in Hematopoietic Stem Cell Transplantation for Acute Myelogenous Leukemia

Kim, Hee-Je, Choi, Young, Min, Woo-Sung, Kim, Tai-Gyu, Cho, Byung-Sik, Kim, Sung-Yong, Eom, Ki-Sung, Lee, Seok, Min, Chang-Ki, Cho, Seok-Goo, Kim, Dong-Wook, Lee, Jong-Wook, Kim, Chun-Choo

Journal:

Transplantation Journal

Year:

2007

Language:

english

File:

PDF, 388 KB

english, 2007

127

Ankyloglossia Correction

Choi, Yun-Seok, Lim, Jin-Soo, Han, Ki-Taik, Lee, Woo-Sung, Kim, Min-Cheol

Journal:

Journal of Craniofacial Surgery

Year:

2011

Language:

english

File:

PDF, 271 KB

english, 2011

128

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system

Jang, Sung-Hoon, Tanabe, Hiroyoshi, Yang, Seung-Hune, Ahn, Byoung-Sup, Ki, Won-Tai, Choi, Ji-Hyeon, Choi, Sung-Woon, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 390 KB

english, 2004

129

SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Reduction of MDP complexity through the application of OASIS based data flow

Jang, Sung-Hoon, Weed, J. Tracy, Martin, Patrick M., Choi, Ji-Hyeon, Park, Ji-Soong, Choi, Seong-Woon, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 348 KB

english, 2005

130

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Effect of mask reduction ratio in alternating phase-shift masks

Shin, In-Gyun, Lee, Sung-Ho, Kim, Yong-Hoon, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Lim, Tong-Kun, Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 248 KB

english, 2001

131

SPIE Proceedings [SPIE 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 13 November 2000)] 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Doubly exposed patterning characteristics using two alternating phase-shift masks

Lee, Sung-Woo, Shin, In-Gyun, Kim, Yonghoon, Choi, Seong-Woon, Han, Woo-Sung, Yoon, Hee-Sun, Sohn, Jung-Min, Behringer, Uwe F. W.

Year:

2001

Language:

english

File:

PDF, 321 KB

english, 2001

132

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Lee, Sung-Woo, Chung, Dong-Hoon, Shin, In-Gyun, Kim, Yong-Hoon, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 641 KB

english, 2001

133

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Repair simulation with image processing and artificial intelligence

Choi, Yo-Han, Silver, Richard M., Sung, Moon-Kyu, Lee, Sang-Hyun, Lee, Ji-Hyung, Park, Jin-Hong, Choi, Ji-Hyun, Moon, Seong-Yong, Choi, Sung-Woon, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 198 KB

english, 2005

134

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Analysis of dry etch loading effect in mask fabrication

Lee, Jeong-Yun, Cho, Sung-Yong, Kim, Chang-Hwan, Lee, Sung-Woo, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Dao, Giang T., Grenon, Brian J.

Year:

2002

Language:

english

File:

PDF, 469 KB

english, 2002

135

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - What an antishrinkage coating method can surmount among stumbling block of ArF resists

Kim, Hyung-Do, Fedynyshyn, Theodore H., Lee, Si-Hyeung, Choi, Sang-Jun, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae

Year:

2003

Language:

english

File:

PDF, 466 KB

english, 2003

136

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Development and evaluation of new MRC parameter for aggressive mask optimization

Shim, Seong-bo, Chen, Alek C., Han, Woo-Sung, Kim, Young-chang, Jang, Seong-hoon, Lin, Burn J., Yen, Anthony, Kim, Hee-bom, Lee, Sung-woo, Choi, Seong-woon, Cho, Han-ku, Park, Chan-hoon

Year:

2009

Language:

english

File:

PDF, 413 KB

english, 2009

137

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Effect of beam blur in mask fabrication

Yang, Seung-Hune, Grenon, Brian J., Dao, Giang T., Ki, Won-Tai, Moon, Seong-Yong, Jeong, Tae Moon, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min

Year:

2000

Language:

english

File:

PDF, 245 KB

english, 2000

138

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Prediction of MEEF using a simple model and MEEF enhancement parameters

Chung, Dong-Hoon, Kawahira, Hiroichi, Yang, Seung-Hune, Kim, Hyung-Do, Shin, In-Gyun, Kim, Yong-Hoon, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min

Year:

2001

Language:

english

File:

PDF, 615 KB

english, 2001

139

SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - The study on causes and control methods of haze contamination

Han, Sung-Jae, Wang, Yangyuan, Yao, Jun-en, Kim, Bo-Hye, Park, Jin-Hong, Progler, Christopher J., Kim, Yong-Hoon, Choi, Seong-Woon, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 658 KB

english, 2004

140

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Real-time monitoring based on comprehensive analysis of the haze environment under the pellicle film

Choi, Jaehyuck, Martin, Patrick M., Naber, Robert J., Lee, Seungyeon, Kim, Eunjung, Nam, Il-woo, Cha, Byung-Cheol, Choi, Seong-Woon, Han, Woo-Sung

Year:

2006

Language:

english

File:

PDF, 786 KB

english, 2006

141

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Study of the mask topography effect on the OPC modeling of hole patterns

Shim, Seong-bo, Kim, Young-chang, Lee, Suk-joo, Choi, Seong-woon, Han, Woo-sung

Year:

2008

Language:

english

File:

PDF, 409 KB

english, 2008

142

SPIE Proceedings [SPIE IS&T/SPIE Electronic Imaging - San Jose, CA (Sunday 18 January 2009)] Visual Communications and Image Processing 2009 - Novel context template design scheme for lossless color halftone image compression

Park, Sung-Bum, Rabbani, Majid, Stevenson, Robert L., Choi, Dai-Woong, Yoon, Jae-Won, Moon, Young-Ho, Choi, Jong-Bum, Shim, Woo-Sung

Year:

2009

Language:

english

File:

PDF, 1.94 MB

english, 2009

143

Preliminary Study to Determine the Reference Plane of Patients With a Unilateral Cleft Lip and Palate

Kim, Na-Ri, Park, Soo-Byung, Shin, Sang Min, Choi, Yong-Seok, Kim, Seong-Sik, Son, Woo-Sung, Kim, Yong-Il

Journal:

The Cleft Palate-Craniofacial Journal

Year:

2016

Language:

english

File:

PDF, 716 KB

english, 2016

144

Microporous sponge structure with copper–cobalt oxide hybrid nanobranches

Choi, Woo-Sung, Shin, Heon-Cheol

Journal:

Journal of Alloys and Compounds

Year:

2016

Language:

english

File:

PDF, 3.46 MB

english, 2016

145

Mutations of Arginine 222 in Pre-transmembrane Domain I of Mouse 5-HT3A Receptor Abolish 20(R)- But Not 20(S)-Ginsenoside Rg3 Inhibition of 5-HT-Mediated Ion Currents

Lee, Byung-Hwan, Lee, Jun-Ho, Yoon, In-Soo, Lee, Joon-Hee, Choi, Sun-Hye, Shin, Tae-Joon, Pyo, Mi Kyung, Choi, Woo-Sung, Lee, Sang-Mok, Lim, Yoongho, Rhim, Hyewhon, Nah, Seung-Yeol

Journal:

Biological & Pharmaceutical Bulletin

Year:

2007

Language:

english

File:

PDF, 197 KB

english, 2007

146

Life Assessment of Steam Turbine Components Based on Viscoplastic Analysis

CHOI, Woo-Sung, FLEURY, Eric, KIM, Bum-Shin, HYUN, Jung-Seob

Journal:

Journal of Solid Mechanics and Materials Engineering

Year:

2008

Language:

english

File:

PDF, 716 KB

english, 2008

147

Medication-related osteonecrosis of the jaw: a preliminary retrospective study of 130 patients with multiple myeloma

Choi, Woo-Sung, Lee, Jae-Il, Yoon, Hyun-Joong, Min, Chang-Ki, Lee, Sang-Hwa

Journal:

Maxillofacial Plastic and Reconstructive Surgery

Year:

2017

Language:

english

File:

PDF, 627 KB

english, 2017

148

Suppressed neural complexity during ketamine- and propofol-induced unconsciousness

Wang, Jisung, Noh, Gyu-Jeong, Choi, Byung-Moon, Ku, Seung-Woo, Jung, Woo-Sung, Lee, Heonsoo

Journal:

Neuroscience Letters

Year:

2017

Language:

english

File:

PDF, 639 KB

english, 2017

149

Diversity of functional connectivity patterns is reduced in propofol-induced unconsciousness

Lee, Heonsoo, Noh, Gyu-Jeong, Joo, Pangyu, Choi, Byung-Moon, Silverstein, Brian Henry, Kim, Minkyung, Wang, Jisung, Jung, Woo-Sung, Kim, Seunghwan

Journal:

Human Brain Mapping

Year:

2017

Language:

english

File:

PDF, 930 KB

english, 2017

150

Angiomyofibroblastoma of the vagina in a breast cancer patient

Lee, Ho, Jang, Kyu-Yun, Park, Ho-Sung, Hwang, Sung-Ho, Park, Shin-Young, Choi, Keum-Ha, Kim, Jong-Hyun, Moon, Woo-Sung

Journal:

Year:

2008

Language:

english

File:

PDF, 597 KB

english, 2008