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1

Etching of polysilicon in inductively coupled Cl[sub 2] and HBr discharges. I. Experimental characterization of polysilicon profiles

Mahorowala, Arpan P., Sawin, Herbert H., Jones, Richard, Labun, Andrew H.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2002

Language:

english

File:

PDF, 1.21 MB

english, 2002

2

[IEEE IEEE International Electron Devices Meeting 2003 - Washington, DC, USA (8-10 Dec. 2003)] IEEE International Electron Devices Meeting 2003 - A novel graded antireflective coating with built-in hardmask properties enabling 65nm and below CMOS device patterning

Babich, K., Fukiage, N., Mahorowala, A., Halle, S., Bunner, T., Pfeiffer, D., Mochiki, H., Ashigaki, S., Xia, A., Angelopoulos, M.

Year:

2003

Language:

english

File:

PDF, 248 KB

english, 2003

3

Etching of polysilicon in inductively coupled Cl[sub 2] and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching

A. P. Mahorowala, H. H. Sawin

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2002

Language:

english

File:

PDF, 970 KB

english, 2002

4

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

Goldfarb, Dario L., Mahorowala, Arpan P., Gallatin, Gregg M., Petrillo, Karen E., Temple, Karen, Angelopoulos, Marie, Rasgon, Stacy, Sawin, Herbert H., Allen, Scott D., Lawson, Margaret C., Kwong, Ran

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2004

Language:

english

File:

PDF, 931 KB

english, 2004

5

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Hardmask technology for sub-100 nm lithographic imaging

Babich, Katherina, Mahorowala, Arpan P., Medeiros, David R., Pfeiffer, Dirk, Petrillo, Karen E., Angelopoulos, Marie, Grill, Alfred, Patel, Vishnubhai, Halle, Scott, Brunner, Timothy A., Conti, Richar

Year:

2003

Language:

english

File:

PDF, 1.24 MB

english, 2003

6

Etching of polysilicon in inductively coupled Cl[sub 2] and HBr discharges. IV. Calculation of feature charging in profile evolution

A. P. Mahorowala, H. H. Sawin

Year:

2002

Language:

english

File:

PDF, 884 KB

english, 2002

7

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - 193 lithography and RELACS processing for BEOL lithography

DellaGuardia, Ronald, Petrillo, Karen E., Chen, Jia, Rabidoux, Paul, Dalton, Timothy J., Holmes, Steven J., Hadel, Linda M., Malone, K., Mahorowala, Arpan P., Greco, S., Ferguson, Richard A., Progler,

Year:

2001

Language:

english

File:

PDF, 1.34 MB

english, 2001

8

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - High-resolution 248-nm bilayer resist

Lin, Qinghuang, Petrillo, Karen E., Babich, Katherina, LaTulipe, Douglas C., Medeiros, David R., Mahorowala, Arpan P., Simons, John P., Angelopoulos, Marie, Wallraff, Gregory M., Larson, Carl E., Fenz

Year:

1999

Language:

english

File:

PDF, 1.92 MB

english, 1999

9

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Impact of thin resist processes on post-etch LER

Mahorowala, Arpan P., Goldfarb, Dario L., Temple, Karen, Petrillo, Karen E., Pfeiffer, Dirk, Babich, Katherina, Angelopoulos, Marie, Gallatin, Gregg M., Rasgon, Stacy, Sawin, Herbert H., Allen, Scott

Year:

2003

Language:

english

File:

PDF, 1.29 MB

english, 2003

10

Brillouin scattering studies of polymeric nanostructures

R. Hartschuh, Y. Ding, J. H. Roh, A. Kisliuk, A. P. Sokolov, C. L. Soles, R. L. Jones, T. J. Hu, W. L. Wu, A. P. Mahorowala

Journal:

Journal of Polymer Science Part B: Polymer Physics

Year:

2004

Language:

english

File:

PDF, 320 KB

english, 2004

11

Recent progress in electron-beam resists for advanced mask-making

Medeiros, D. R., Aviram, A., Guarnieri, C. R., Huang, W.-S., Kwong, R., Magg, C. K., Mahorowala, A. P., Moreau, W. M., Petrillo, K. E., Angelopoulos, M.

Journal:

IBM Journal of Research and Development

Year:

2001

Language:

english

File:

PDF, 1.88 MB

english, 2001

12

Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists

Mahorowala, A. P., Medeiros, D. R.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2001

Language:

english

File:

PDF, 372 KB

english, 2001

13

Controlling line-edge roughness and reactive ion etch lag in sub-150 nm features in borophosphosilicate glass

Bhatnagar, Parijat, Panda, Siddhartha, Edleman, Nikki L., Allen, Scott D., Wise, Richard, Mahorowala, Arpan

Journal:

Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 480 KB

english, 2007

14

Transfer etching of bilayer resists in oxygen-based plasmas

A. P. Mahorowala, K. Babich, Q. Lin, D. R. Medeiros, K. Petrillo, J. Simons, M. Angelopoulos, R. Sooriyakumaran, D. Hofer, G. W. Reynolds, J. W. Taylor

Year:

2000

Language:

english

File:

PDF, 1.50 MB

english, 2000

15

Integrated non-SO[sub 2] underlayer and improved line-edge-roughness dielectric etch process using 193 nm bilayer resist

Bhatnagar, Parijat, Panda, Siddhartha, Edleman, Nikki L., Allen, Scott D., Wise, Richard, Mahorowala, Arpan

Journal:

Applied Physics Letters

Year:

2006

Language:

english

File:

PDF, 320 KB

english, 2006

16

Etching of polysilicon in inductively coupled Cl[sub 2] and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo computation of flux and surface kinetics

Mahorowala, Arpan P., Sawin, Herbert H.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2002

Language:

english

File:

PDF, 1.28 MB

english, 2002

17

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing

Mahorowala, Arpan P., Babich, Katherina, Petrillo, Karen E., Simons, John P., Angelopoulos, Marie, Patel, Vishnubhai, Grill, Alfred, Halle, Scott, Conti, Richard, Wu, ChungHsi J., Wise, Richard, Chen,

Year:

2001

Language:

english

File:

PDF, 880 KB

english, 2001

18

Development of 157 nm positive resists

H. Ito, G. M. Wallraff, N. Fender, P. J. Brock, W. D. Hinsberg, A. Mahorowala, C. E. Larson, H. D. Truong, G. Breyta, R. D. Allen

Year:

2001

Language:

english

File:

PDF, 586 KB

english, 2001

19

Etching silicon-containing bilayer resists in ammonia-based plasmas

S. Panda, R. Wise, A. Mahorowala, V. Balasubramanium, K. Sugiyama

Year:

2005

Language:

english

File:

PDF, 1.32 MB

english, 2005

20

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Line edge roughness reduction by plasma curing photoresists

Mahorowala, Arpan P., Chen, Kuang-Jung, Sooriyakumaran, Ratnam, Clancy, Aleksandra, Murthy, Dakshi, Rasgon, Stacy, Sturtevant, John L.

Year:

2005

Language:

english

File:

PDF, 3.30 MB

english, 2005

21

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - IBM 193-nm bilayer resist: materials, lithographic performance, and optimization

Kwong, Ranee W., Varanasi, Pushkara R., Lawson, Margaret C., Hughes, Timothy, Jordhamo, George M., Khojasteh, Mahmoud, Mahorowala, Arpan P., Sooriyakumaran, Ratnam, Brock, Phillip J., Larson, Carl E.,

Year:

2001

Language:

english

File:

PDF, 778 KB

english, 2001

22

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Preliminary evaluation of line-edge roughness metrology based on CD-SAXS

Jones, Ronald L., Hu, Tengjiao, Soles, Christopher L., Lin, Eric K., Wu, Wen-li, Casa, Diego M., Mahorowala, Arpan, Silver, Richard M.

Year:

2004

Language:

english

File:

PDF, 436 KB

english, 2004

23

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Current developments of a high-performance CA resist for mask-making application

Huang, Wu-Song, Tanabe, Hiroyoshi, He, Wei, Li, Wenjie, Moreau, Wayne M., Lang, Robert, Medeiros, David R., Petrillo, Karen E., Mahorowala, Arpan P., Angelopoulos, Marie, Deverich, Christina, Huang, C

Year:

2003

Language:

english

File:

PDF, 359 KB

english, 2003

24

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Design for Manufacturability through Design-Process Integration - Improving the power-performance of multicore processors through optimization of lithography and thermal processing

Gabor, A. H., Wong, Alfred K. K., Singh, Vivek K., Brunner, T., Bukofsky, S., Butt, S., Clougherty, F., Deshpande, S., Faure, T., Gluschenkov, O., Greene, K., Johnson, J., Le, N, Lindo, P., Mahorowala

Year:

2007

Language:

english

File:

PDF, 394 KB

english, 2007

25

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making

Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Lang, Robert, Robinson, Christopher F., Medeiros, David R., Petrillo, Karen E., Aviram, Ari, Mahorowala, Arpan P., Angelopoulos, Marie, Magg, Christo

Year:

2001

Language:

english

File:

PDF, 993 KB

english, 2001

26

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond

Pfeiffer, Dirk, Mahorowala, Arpan P., Babich, Katherina, Medeiros, David R., Petrillo, Karen E., Angelopoulos, Marie, Huang, Wu-Song, Halle, Scott, Brodsky, Colin, Allen, Scott D., Holmes, Steven J.,

Year:

2003

Language:

english

File:

PDF, 1.22 MB

english, 2003

27

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists

Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Lang, Robert, Medeiros, David R., Petrillo, Karen E., Mahorowala, Arpan P., Angelopoulos, Marie, Lin, Qinghuang, Dai, Junyan, Ober, Christopher K., F

Year:

2002

Language:

english

File:

PDF, 505 KB

english, 2002

28

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making

Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Lang, Robert, Robinson, Christopher F., Medeiros, David R., Petrillo, Karen E., Aviram, Ari, Mahorowala, Arpan P., Angelopoulos, Marie, Magg, Christo

Year:

2001

Language:

english

File:

PDF, 808 KB

english, 2001

29

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Characterization of new aromatic polymers for 157-nm photoresist applications

Fender, Nicolette, Brock, Phillip J., Chau, W., Bangsaruntip, S., Mahorowala, Arpan P., Wallraff, Gregory M., Hinsberg, William D., Larson, Carl E., Ito, Hiroshi, Breyta, Gregory, Burnham, Kikue, Truo

Year:

2001

Language:

english

File:

PDF, 1023 KB

english, 2001

30

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Fabrication challenges for next-generation devices: MEMS for rf wireless communications

Seeger, David E., Lund, Jennifer, Jahnes, Christopher, Deligianni, Lili, Buchwalter, Paivikki, Andricacos, Panayotis C., Acosta, Raul E., Babich, Inna V., Mahorowala, Arpan P., Rosner, Joanna, Cotte,

Year:

2002

Language:

english

File:

PDF, 1.43 MB

english, 2002

31

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Meeting critical gate linewidth control needs at the 65 nm node

Mahorowala, Arpan, Wong, Alfred K. K., Singh, Vivek K., Halle, Scott, Gabor, Allen, Chu, William, Barberet, Alexandra, Samuels, Donald, Abdo, Amr, Tsou, Len, Yan, Wendy, Iseda, Seiji, Patel, Kaushal,

Year:

2006

Language:

english

File:

PDF, 329 KB

english, 2006

32

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Mastering double exposure process window aware OPC by means of virtual targets

Haffner, Henning, Martin, Patrick M., Naber, Robert J., Baum, Zachary, Fonseca, Carlos, Halle, Scott, Liebmann, Lars, Mahorowala, Arpan

Year:

2006

Language:

english

File:

PDF, 510 KB

english, 2006

33

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers

Sooriyakumaran, Ratnam, Houlihan, Francis M., Fenzel-Alexander, Debra, Brock, Phillip J., Larson, Carl E., Di Pietro, Richard A., Wallraff, Gregory M., Hofer, Donald C., Dawson, Dan J., Mahorowala, Ar

Year:

2000

Language:

english

File:

PDF, 1.54 MB

english, 2000

34

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Silicon containing polymer in applications for 193 nm high NA lithography processes

Burns, Sean, Lin, Qinghuang, Pfeiffer, Dirk, Mahorowala, Arpan, Petrillo, Karen, Clancy, Alexandera, Babich, Katherina, Medeiros, David, Allen, Scott, Holmes, Steven, Crouse, Michael, Brodsky, Colin,

Year:

2006

Language:

english

File:

PDF, 634 KB

english, 2006

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