7

Aerial image formation of quantum lithography for diffraction limit

Year:
2012
Language:
english
File:
PDF, 1.49 MB
english, 2012
9

Pattern interactions of post exposure bake in litho-cure-litho-etch process

Year:
2012
Language:
english
File:
PDF, 786 KB
english, 2012
20

Optical lithography simulation for the whole resist process

Year:
2006
Language:
english
File:
PDF, 383 KB
english, 2006
22

Exposure Simulation Model for Chemically Amplified Resists

Year:
2003
Language:
english
File:
PDF, 389 KB
english, 2003
24

Thermal treatment for optical proximity correction

Year:
2007
Language:
english
File:
PDF, 132 KB
english, 2007
39

A novel secure architecture of the virtualized server system

Year:
2016
Language:
english
File:
PDF, 321 KB
english, 2016
41

Modeling and analyzing for contact hole shrinkage by directed self-assembly

Year:
2014
Language:
english
File:
PDF, 633 KB
english, 2014
43

Model-Based Optical Proximity Correction for Resist Reflow Process

Year:
2006
Language:
english
File:
PDF, 127 KB
english, 2006
44

Sensitivity of Simulation Parameter for Critical Dimension

Year:
2002
Language:
english
File:
PDF, 258 KB
english, 2002